This paper proposes an optimal-choice criterion for the relative position of the stop and the optical element during electron-beam evaporation to provide a given reflectance distribution over the surface of an optical element.

PDF Article

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription