This paper discusses the problem of increasing the resolving power of synthesized Fresnel hologram-projectors and increasing the depth of field of the images reconstructed by them. This work was applied to the case of the holograms of a two-dimensional object—for example, a photolithographic photomask or the working zone of optical pincers. The efficiency of the method used in traditional projection photolithography to increase the resolving power of a synthesized Fresnel hologram-projector by phase correction of the proximity effect is established. A method of increasing the depth of field of the images reconstructed by means of a synthesized Fresnel hologram-projector is proposed, based on representing the complex amplitude of the object wave when the hologram is synthesized as the sum of the complex amplitudes of several object waves formed by an object at various distances from the hologram that differ by an amount that does not exceed the depth of field of the image of a single object.
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