Abstract

The complex optical and dielectric functions of the energy of an electromagnetic wave are calculated for a film of tantalum (V) oxide in the short-wavelength region, including the fundamental-absorption region. An additive combination of the Forouhi–Bloomer and Lorentz models is constructed to compute these functions. Versions of the Forouhi–Bloomer model with a dipole-transition matrix element that is independent of the wave energy are considered, along with a modified model. It is established that the modified model has an advantage when describing broad-band dielectric amorphous media. The optical band gap computed from the Forouhi–Bloomer and Lorentz models is compared with the value determined from the Tautz extrapolation.

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  1. K. von Rottkay and M. Rubin, “Optical indexes of pyrolitic tin-oxide glass,” Mater. Res. Soc. Symp. Proc. 426, 449 (1996).
    [CrossRef]
  2. J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
    [CrossRef]
  3. A. R. Forouhi and I. Bloomer, “Optical dispersion relation for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B 34, 7018 (1986).
    [CrossRef]
  4. A. R. Forouhi and I. Bloomer, “Calculation of optical constants n and k in the interband region,” in Handbook of Optical Constants of Solids II, E. D. Palic, ed. (Academic Press, New York, 1991), pp. 151–175.
  5. L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
    [CrossRef]
  6. V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
    [CrossRef]
  7. D. Davazoglou, M. A. Vasilopoulou, and P. Argitis, “Optical characterization of thin organic films by analyzing transmission measurements with the Forouhi–Bloomer model,” Microelec. Eng. 41/42, 619 (1998).
    [CrossRef]
  8. P. Cheyssac, N. Laidani, and M. Andere, “Optical absorption in ZrO2?x–C nanocomposite films on polymer substrates: application of an effective-medium theory,” Phys. Status Solidi C 10, 3376 (2008).
    [CrossRef]
  9. E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
    [CrossRef]
  10. A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
    [CrossRef]
  11. N. Kalfaginnis and S. Logothtis, “Color dependency on optical and electronic properties of TiNx thin film,” Rev. Adv. Mater. Sci. 15, 167 (2007).
  12. F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
    [CrossRef]
  13. O. D. Vol’pyan, P. P. Yakovlev, B. B. Meshkov, and O. A. Obod, “Optical properties of Ta2O5 films obtained by reactive magnetron sputtering,” Opt. Zh. 70, No. 9, 56 (2003). [J. Opt. Technol. 70, 669 (2003)].
  14. O. D. Vol’pyan, O. A. Obod, and P. P. Yakovlev, “Investigation of SiO2 optical films produced by reactive ac magnetron sputtering,” Opt. Zh. 71, No. 7, 81 (2004). [J. Opt. Technol. 71, 487 (2004)].
  15. O. D. Vol’pyan and A. I. Kuz’michev, “Magnetron deposition of optical coatings from variable-voltage, medium-frequency magnetrons,” Prikl. Fiz. No. 3, 34 (2008).
  16. O. D. Vol’pyan and P. P. Yakovlev, “On the problem of calculating the optical film parameters from the measured transmission spectra,” Opt. Spektrosk. 92, 116 (2002). [Opt. Spectrosc. 92, 109 (2002)].
    [CrossRef]
  17. G. E. Jellison, F. A. Modin, P. Doshi, and A. Rohahgi, “Spectroscopic ellipsometry characterisation of thin-film silicon nitride,” Preprint of Oak Ridge National Laboratory, 1997, pp. 1–15.

2009

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

2008

P. Cheyssac, N. Laidani, and M. Andere, “Optical absorption in ZrO2?x–C nanocomposite films on polymer substrates: application of an effective-medium theory,” Phys. Status Solidi C 10, 3376 (2008).
[CrossRef]

O. D. Vol’pyan and A. I. Kuz’michev, “Magnetron deposition of optical coatings from variable-voltage, medium-frequency magnetrons,” Prikl. Fiz. No. 3, 34 (2008).

2007

N. Kalfaginnis and S. Logothtis, “Color dependency on optical and electronic properties of TiNx thin film,” Rev. Adv. Mater. Sci. 15, 167 (2007).

F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
[CrossRef]

E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
[CrossRef]

2006

J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
[CrossRef]

2005

L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
[CrossRef]

2004

O. D. Vol’pyan, O. A. Obod, and P. P. Yakovlev, “Investigation of SiO2 optical films produced by reactive ac magnetron sputtering,” Opt. Zh. 71, No. 7, 81 (2004). [J. Opt. Technol. 71, 487 (2004)].

2003

O. D. Vol’pyan, P. P. Yakovlev, B. B. Meshkov, and O. A. Obod, “Optical properties of Ta2O5 films obtained by reactive magnetron sputtering,” Opt. Zh. 70, No. 9, 56 (2003). [J. Opt. Technol. 70, 669 (2003)].

2002

O. D. Vol’pyan and P. P. Yakovlev, “On the problem of calculating the optical film parameters from the measured transmission spectra,” Opt. Spektrosk. 92, 116 (2002). [Opt. Spectrosc. 92, 109 (2002)].
[CrossRef]

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

1998

D. Davazoglou, M. A. Vasilopoulou, and P. Argitis, “Optical characterization of thin organic films by analyzing transmission measurements with the Forouhi–Bloomer model,” Microelec. Eng. 41/42, 619 (1998).
[CrossRef]

1996

K. von Rottkay and M. Rubin, “Optical indexes of pyrolitic tin-oxide glass,” Mater. Res. Soc. Symp. Proc. 426, 449 (1996).
[CrossRef]

1986

A. R. Forouhi and I. Bloomer, “Optical dispersion relation for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B 34, 7018 (1986).
[CrossRef]

Aliev, V. Sh.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

Andere, M.

P. Cheyssac, N. Laidani, and M. Andere, “Optical absorption in ZrO2?x–C nanocomposite films on polymer substrates: application of an effective-medium theory,” Phys. Status Solidi C 10, 3376 (2008).
[CrossRef]

Argitis, P.

D. Davazoglou, M. A. Vasilopoulou, and P. Argitis, “Optical characterization of thin organic films by analyzing transmission measurements with the Forouhi–Bloomer model,” Microelec. Eng. 41/42, 619 (1998).
[CrossRef]

Atuchin, V. V.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

Bloomer, I.

A. R. Forouhi and I. Bloomer, “Optical dispersion relation for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B 34, 7018 (1986).
[CrossRef]

A. R. Forouhi and I. Bloomer, “Calculation of optical constants n and k in the interband region,” in Handbook of Optical Constants of Solids II, E. D. Palic, ed. (Academic Press, New York, 1991), pp. 151–175.

Cain, J. P.

J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
[CrossRef]

Chen, T. P.

L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
[CrossRef]

Cheyssac, P.

P. Cheyssac, N. Laidani, and M. Andere, “Optical absorption in ZrO2?x–C nanocomposite films on polymer substrates: application of an effective-medium theory,” Phys. Status Solidi C 10, 3376 (2008).
[CrossRef]

Collins, R. W.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Davazoglou, D.

D. Davazoglou, M. A. Vasilopoulou, and P. Argitis, “Optical characterization of thin organic films by analyzing transmission measurements with the Forouhi–Bloomer model,” Microelec. Eng. 41/42, 619 (1998).
[CrossRef]

Deng, X.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Ding, L.

L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
[CrossRef]

Doshi, P.

G. E. Jellison, F. A. Modin, P. Doshi, and A. Rohahgi, “Spectroscopic ellipsometry characterisation of thin-film silicon nitride,” Preprint of Oak Ridge National Laboratory, 1997, pp. 1–15.

Emami, I.

J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
[CrossRef]

Ferlauto, A. S.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Ferreira, G. M.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Forouhi, A. R.

A. R. Forouhi and I. Bloomer, “Optical dispersion relation for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B 34, 7018 (1986).
[CrossRef]

A. R. Forouhi and I. Bloomer, “Calculation of optical constants n and k in the interband region,” in Handbook of Optical Constants of Solids II, E. D. Palic, ed. (Academic Press, New York, 1991), pp. 151–175.

Fung, S.

L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
[CrossRef]

Gai, R.

F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
[CrossRef]

Ganguly, G.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Hadjisavvas, G. C.

E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
[CrossRef]

Huang, Z.

F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
[CrossRef]

Jellison, G. E.

G. E. Jellison, F. A. Modin, P. Doshi, and A. Rohahgi, “Spectroscopic ellipsometry characterisation of thin-film silicon nitride,” Preprint of Oak Ridge National Laboratory, 1997, pp. 1–15.

Kalfaginnis, N.

N. Kalfaginnis and S. Logothtis, “Color dependency on optical and electronic properties of TiNx thin film,” Rev. Adv. Mater. Sci. 15, 167 (2007).

Kalinkin, A. V.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

Kelires, P. C.

E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
[CrossRef]

Kruchinin, V. N.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

Kuz’michev, A. I.

O. D. Vol’pyan and A. I. Kuz’michev, “Magnetron deposition of optical coatings from variable-voltage, medium-frequency magnetrons,” Prikl. Fiz. No. 3, 34 (2008).

Lai, F.

F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
[CrossRef]

Laidani, N.

P. Cheyssac, N. Laidani, and M. Andere, “Optical absorption in ZrO2?x–C nanocomposite films on polymer substrates: application of an effective-medium theory,” Phys. Status Solidi C 10, 3376 (2008).
[CrossRef]

Lin, L.

F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
[CrossRef]

Lin, Y.

F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
[CrossRef]

Lioudakis, E.

E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
[CrossRef]

Liu, Y.

L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
[CrossRef]

Logothtis, S.

N. Kalfaginnis and S. Logothtis, “Color dependency on optical and electronic properties of TiNx thin film,” Rev. Adv. Mater. Sci. 15, 167 (2007).

Meshkov, B. B.

O. D. Vol’pyan, P. P. Yakovlev, B. B. Meshkov, and O. A. Obod, “Optical properties of Ta2O5 films obtained by reactive magnetron sputtering,” Opt. Zh. 70, No. 9, 56 (2003). [J. Opt. Technol. 70, 669 (2003)].

Modin, F. A.

G. E. Jellison, F. A. Modin, P. Doshi, and A. Rohahgi, “Spectroscopic ellipsometry characterisation of thin-film silicon nitride,” Preprint of Oak Ridge National Laboratory, 1997, pp. 1–15.

Nassiopolou, A. G.

E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
[CrossRef]

Nig, C. Y.

L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
[CrossRef]

Obod, O. A.

O. D. Vol’pyan, O. A. Obod, and P. P. Yakovlev, “Investigation of SiO2 optical films produced by reactive ac magnetron sputtering,” Opt. Zh. 71, No. 7, 81 (2004). [J. Opt. Technol. 71, 487 (2004)].

O. D. Vol’pyan, P. P. Yakovlev, B. B. Meshkov, and O. A. Obod, “Optical properties of Ta2O5 films obtained by reactive magnetron sputtering,” Opt. Zh. 70, No. 9, 56 (2003). [J. Opt. Technol. 70, 669 (2003)].

Othonos, A.

E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
[CrossRef]

Pearce, J. M.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Robie, S.

J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
[CrossRef]

Rohahgi, A.

G. E. Jellison, F. A. Modin, P. Doshi, and A. Rohahgi, “Spectroscopic ellipsometry characterisation of thin-film silicon nitride,” Preprint of Oak Ridge National Laboratory, 1997, pp. 1–15.

Rubin, M.

K. von Rottkay and M. Rubin, “Optical indexes of pyrolitic tin-oxide glass,” Mater. Res. Soc. Symp. Proc. 426, 449 (1996).
[CrossRef]

Rykhlitskii, S. V.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

Shvets, V. A.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

Sing, B.

J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
[CrossRef]

Spesivtsev, E. V.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

Vasilopoulou, M. A.

D. Davazoglou, M. A. Vasilopoulou, and P. Argitis, “Optical characterization of thin organic films by analyzing transmission measurements with the Forouhi–Bloomer model,” Microelec. Eng. 41/42, 619 (1998).
[CrossRef]

Vol’pyan, O. D.

O. D. Vol’pyan and A. I. Kuz’michev, “Magnetron deposition of optical coatings from variable-voltage, medium-frequency magnetrons,” Prikl. Fiz. No. 3, 34 (2008).

O. D. Vol’pyan, O. A. Obod, and P. P. Yakovlev, “Investigation of SiO2 optical films produced by reactive ac magnetron sputtering,” Opt. Zh. 71, No. 7, 81 (2004). [J. Opt. Technol. 71, 487 (2004)].

O. D. Vol’pyan, P. P. Yakovlev, B. B. Meshkov, and O. A. Obod, “Optical properties of Ta2O5 films obtained by reactive magnetron sputtering,” Opt. Zh. 70, No. 9, 56 (2003). [J. Opt. Technol. 70, 669 (2003)].

O. D. Vol’pyan and P. P. Yakovlev, “On the problem of calculating the optical film parameters from the measured transmission spectra,” Opt. Spektrosk. 92, 116 (2002). [Opt. Spectrosc. 92, 109 (2002)].
[CrossRef]

von Rottkay, K.

K. von Rottkay and M. Rubin, “Optical indexes of pyrolitic tin-oxide glass,” Mater. Res. Soc. Symp. Proc. 426, 449 (1996).
[CrossRef]

Wronski, C. R.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Yakovlev, P. P.

O. D. Vol’pyan, O. A. Obod, and P. P. Yakovlev, “Investigation of SiO2 optical films produced by reactive ac magnetron sputtering,” Opt. Zh. 71, No. 7, 81 (2004). [J. Opt. Technol. 71, 487 (2004)].

O. D. Vol’pyan, P. P. Yakovlev, B. B. Meshkov, and O. A. Obod, “Optical properties of Ta2O5 films obtained by reactive magnetron sputtering,” Opt. Zh. 70, No. 9, 56 (2003). [J. Opt. Technol. 70, 669 (2003)].

O. D. Vol’pyan and P. P. Yakovlev, “On the problem of calculating the optical film parameters from the measured transmission spectra,” Opt. Spektrosk. 92, 116 (2002). [Opt. Spectrosc. 92, 109 (2002)].
[CrossRef]

Zhang, Q.

J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
[CrossRef]

J. Appl. Phys.

A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R. Wronski, R. W. Collins, X. Deng, and G. Ganguly, “Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin-film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
[CrossRef]

Mater. Res. Soc. Symp. Proc.

K. von Rottkay and M. Rubin, “Optical indexes of pyrolitic tin-oxide glass,” Mater. Res. Soc. Symp. Proc. 426, 449 (1996).
[CrossRef]

Microelec. Eng.

D. Davazoglou, M. A. Vasilopoulou, and P. Argitis, “Optical characterization of thin organic films by analyzing transmission measurements with the Forouhi–Bloomer model,” Microelec. Eng. 41/42, 619 (1998).
[CrossRef]

Opt. Spektrosk.

V. V. Atuchin, V. N. Kruchinin, A. V. Kalinkin, V. Sh. Aliev, S. V. Rykhlitski?, V. A. Shvets, and E. V. Spesivtsev, “Optical properties of the HfO(2?x)Nx and TiO(2?x)Nx films prepared by ion-beam sputtering,” Opt. Spektrosk. 106, 77 (2009). [Opt. Spectrosc. 106, 72 (2009)].
[CrossRef]

O. D. Vol’pyan and P. P. Yakovlev, “On the problem of calculating the optical film parameters from the measured transmission spectra,” Opt. Spektrosk. 92, 116 (2002). [Opt. Spectrosc. 92, 109 (2002)].
[CrossRef]

Opt. Zh.

O. D. Vol’pyan, O. A. Obod, and P. P. Yakovlev, “Investigation of SiO2 optical films produced by reactive ac magnetron sputtering,” Opt. Zh. 71, No. 7, 81 (2004). [J. Opt. Technol. 71, 487 (2004)].

Opt. Zh.

O. D. Vol’pyan, P. P. Yakovlev, B. B. Meshkov, and O. A. Obod, “Optical properties of Ta2O5 films obtained by reactive magnetron sputtering,” Opt. Zh. 70, No. 9, 56 (2003). [J. Opt. Technol. 70, 669 (2003)].

Phys. Rev. B

L. Ding, T. P. Chen, Y. Liu, C. Y. Nig, and S. Fung, “Optical properties of silicon nanocrystals embedded in SiO2 matrix,” Phys. Rev. B 72, 125419 (2005).
[CrossRef]

Phys. Rev. B

A. R. Forouhi and I. Bloomer, “Optical dispersion relation for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B 34, 7018 (1986).
[CrossRef]

Phys. Status Solidi C

P. Cheyssac, N. Laidani, and M. Andere, “Optical absorption in ZrO2?x–C nanocomposite films on polymer substrates: application of an effective-medium theory,” Phys. Status Solidi C 10, 3376 (2008).
[CrossRef]

Physica E

E. Lioudakis, A. Othonos, G. C. Hadjisavvas, P. C. Kelires, and A. G. Nassiopolou, “Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in α-SiO2,” Physica E 38, 128 (2007).
[CrossRef]

Prikl. Fiz.

O. D. Vol’pyan and A. I. Kuz’michev, “Magnetron deposition of optical coatings from variable-voltage, medium-frequency magnetrons,” Prikl. Fiz. No. 3, 34 (2008).

Proc. SPIE

J. P. Cain, S. Robie, Q. Zhang, B. Sing, and I. Emami, “Combined use of X-ray reflectometry and ellipsometry for characterisation of thin-film optical properties,” Proc. SPIE 6155, 61550P (2006).
[CrossRef]

Rev. Adv. Mater. Sci.

N. Kalfaginnis and S. Logothtis, “Color dependency on optical and electronic properties of TiNx thin film,” Rev. Adv. Mater. Sci. 15, 167 (2007).

Thin Solid Films

F. Lai, L. Lin, R. Gai, Y. Lin, and Z. Huang, “Determination of optical constant and thicknesses of In2O3: Sn films from transmittance data,” Thin Solid Films 515, 7387 (2007).
[CrossRef]

Other

G. E. Jellison, F. A. Modin, P. Doshi, and A. Rohahgi, “Spectroscopic ellipsometry characterisation of thin-film silicon nitride,” Preprint of Oak Ridge National Laboratory, 1997, pp. 1–15.

A. R. Forouhi and I. Bloomer, “Calculation of optical constants n and k in the interband region,” in Handbook of Optical Constants of Solids II, E. D. Palic, ed. (Academic Press, New York, 1991), pp. 151–175.

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