Abstract
This paper discusses an approach to the search for the starting approximations
when inverse optical problems are to be solved to determine the refractive indices and
thicknesses of dielectric films on substrates. It is proposed to use reflection spectra
obtained at different angles of incidence of light on the sample, from which the
refractive indices and thickness of the film are computed from the location of the
intensity extrema. In monochromatic null ellipsometry, the measurement of the
polarization parameters of light at different angles of incidence makes it possible to
determine the refractive index and ellipsometric thickness for each angle. The starting
approximation for the thickness for solving the inverse problem in ellipsometry, based
on the data for all the angles of incidence used for light on the sample, is obtained
from the optical thickness of the film, determined from the reflection spectra at small
angles of incidence.
© 2011 OSA
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