Abstract
It is very important to analyze effectively the tolerance of an optical system with high
resolution as the projection lens of photolithography or as the objective lens of a microscope. We
would like to find an effective assembly structure and compensators to correct aberrations through
global wavefront sensitivity analysis using Zernike polynomial expansion from the field and pupil
coordinates rather than from only pupil coordinates. In this paper, we introduce global wavefront
coefficients by small perturbations of the optical system, and analyze the optical performance with
these coefficients. From this analysis, it is possible to see how we can enlarge the tolerance
through the proper assembly structure and compensators.
© 2012 Optical Society of Korea
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