Abstract

We consider an optical nonlinear interferometric setup based on Young’s double-slit configuration where a nonlinear material is placed exactly after one of the two slits. We examine the effects of Kerr nonlinearity and multiphoton absorption in the resulting interference pattern. The presence of nonlinearity breaks the transverse spatial symmetry of the system, resulting in a modified intensity pattern at the observation plane as a function of the incident intensity. Our theoretical model, based on the modification of the optical path due to the presence of nonlinearity, is surprisingly accurate in predicting the intensity profile of the main lobes for a wide range of parameters. We discuss potential applications of our model in nonlinear interferometry. Specifically, we show that it is possible to measure both the multiphoton and Kerr coefficients of a nonlinear material based on the spatial translation of the interference pattern as a function of the incident intensity.

© 2017 Optical Society of America

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