Abstract

We demonstrate a compact interferometric lithography nanopatterning tool based on an amplitude division interferometer (ADI) and a 46.9nm wavelength desktop size capillary discharge laser. The system is designed to print arrays of lines, holes, and dots with sizes below 100nm on high resolution photoresists for the fabrication of arrays of nanostructures with physical and biological applications. The future combination of this ADI with high repetition rate tabletop lasers operating at shorter wavelengths should allow the printing of arrays of sub-10nm size features with a tabletop setup.

© 2008 Optical Society of America

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  1. F. B. Mancoff, N. D. Rizzo, B. N. Engel, and S. Tehrani, “Phase-locking in double-point-contact spin-transfer devices,” Nature 437, 393-395 (2005).
    [Crossref] [PubMed]
  2. A. N. Slavin and V. S. Tiberkevich, “Nonlinear self-phase-locking effect in an array of current-driven magnetic nanocontacts,” Phys. Rev. B 72, 092407 (2005).
    [Crossref]
  3. F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
    [Crossref]
  4. M. J. Kim, M. Wanunu, D. C. Bell, and A. Meller, “Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis,” Adv. Mater. (Weinheim, Ger.) 18, 3149-3153 (2006).
    [Crossref]
  5. S. Y. Chou, “Nanoimprint lithography and lithographically induced self-assembly,” MRS Bull. 26, 512-517 (2001).
    [Crossref]
  6. H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
    [Crossref]
  7. E. H. Anderson, “Specialized electron beam nanolithography for EUV and x-ray diffractive optics,” IEEE J. Quantum Electron. 42, 27-35 (2006).
    [Crossref]
  8. S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
    [Crossref]
  9. S. Y. Chou and P. R. Krauss, “Imprint lithography with sub-10nm feature size and high throughput,” Microelectron. Eng. 35, 237-240 (1997).
    [Crossref]
  10. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint lithography,” J. Vac. Sci. Technol. B 14, 4129-4133 (1996).
    [Crossref]
  11. S. R. J. Brueck, “Optical and interferometric lithography--nanotechnology enablers,” Proc. IEEE 93, 1704-1721 (2005).
    [Crossref]
  12. A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
    [Crossref]
  13. W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
    [Crossref]
  14. J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, “Liquid immersion deep-ultraviolet interferometric lithography,” J. Vac. Sci. Technol. B 17, 3306-3309 (1999).
    [Crossref]
  15. H. H. Solak and C. David, “Patterning of circular structure arrays with interference lithography,” J. Vac. Sci. Technol. B 21, 2883-2887 (2003).
    [Crossref]
  16. H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
    [Crossref]
  17. H. H. Solak, D. He, W. Li, and F. Cerrina, “Nanolithography using extreme ultraviolet lithography interferometry: 19nm lines and spaces,” J. Vac. Sci. Technol. B 17, 3052-3057 (1999).
    [Crossref]
  18. H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
    [Crossref]
  19. M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
    [Crossref]
  20. P. W. Wachulak, M. G. Capeluto, M. C. Marconi, C. S. Menoni, and J. J. Rocca, “Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography,” Opt. Express 15, 3465-3469 (2007).
    [Crossref] [PubMed]
  21. B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, “Demonstration of a high average power tabletop soft x-ray laser,” Phys. Rev. Lett. 81, 5804-5807 (1998).
    [Crossref]
  22. C. D. Macchietto, B. R. Benware, and J. J. Rocca, “Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier,” Opt. Lett. 24, 1115-1117 (1999).
    [Crossref]
  23. S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13, 4050-4055 (2005).
    [Crossref] [PubMed]
  24. D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
    [Crossref]
  25. Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
    [Crossref]

2007 (1)

2006 (3)

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

M. J. Kim, M. Wanunu, D. C. Bell, and A. Meller, “Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis,” Adv. Mater. (Weinheim, Ger.) 18, 3149-3153 (2006).
[Crossref]

E. H. Anderson, “Specialized electron beam nanolithography for EUV and x-ray diffractive optics,” IEEE J. Quantum Electron. 42, 27-35 (2006).
[Crossref]

2005 (5)

F. B. Mancoff, N. D. Rizzo, B. N. Engel, and S. Tehrani, “Phase-locking in double-point-contact spin-transfer devices,” Nature 437, 393-395 (2005).
[Crossref] [PubMed]

A. N. Slavin and V. S. Tiberkevich, “Nonlinear self-phase-locking effect in an array of current-driven magnetic nanocontacts,” Phys. Rev. B 72, 092407 (2005).
[Crossref]

S. R. J. Brueck, “Optical and interferometric lithography--nanotechnology enablers,” Proc. IEEE 93, 1704-1721 (2005).
[Crossref]

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13, 4050-4055 (2005).
[Crossref] [PubMed]

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

2004 (1)

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

2003 (2)

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

H. H. Solak and C. David, “Patterning of circular structure arrays with interference lithography,” J. Vac. Sci. Technol. B 21, 2883-2887 (2003).
[Crossref]

2002 (2)

H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
[Crossref]

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

2001 (1)

S. Y. Chou, “Nanoimprint lithography and lithographically induced self-assembly,” MRS Bull. 26, 512-517 (2001).
[Crossref]

2000 (1)

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

1999 (4)

H. H. Solak, D. He, W. Li, and F. Cerrina, “Nanolithography using extreme ultraviolet lithography interferometry: 19nm lines and spaces,” J. Vac. Sci. Technol. B 17, 3052-3057 (1999).
[Crossref]

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, “Liquid immersion deep-ultraviolet interferometric lithography,” J. Vac. Sci. Technol. B 17, 3306-3309 (1999).
[Crossref]

C. D. Macchietto, B. R. Benware, and J. J. Rocca, “Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier,” Opt. Lett. 24, 1115-1117 (1999).
[Crossref]

1998 (2)

B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, “Demonstration of a high average power tabletop soft x-ray laser,” Phys. Rev. Lett. 81, 5804-5807 (1998).
[Crossref]

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

1997 (2)

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

S. Y. Chou and P. R. Krauss, “Imprint lithography with sub-10nm feature size and high throughput,” Microelectron. Eng. 35, 237-240 (1997).
[Crossref]

1996 (1)

S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint lithography,” J. Vac. Sci. Technol. B 14, 4129-4133 (1996).
[Crossref]

Ahopelto, J.

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

Ainley, E.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Alessi, D.

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

Anderson, E. H.

E. H. Anderson, “Specialized electron beam nanolithography for EUV and x-ray diffractive optics,” IEEE J. Quantum Electron. 42, 27-35 (2006).
[Crossref]

Bailey, T. C.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Bell, D. C.

M. J. Kim, M. Wanunu, D. C. Bell, and A. Meller, “Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis,” Adv. Mater. (Weinheim, Ger.) 18, 3149-3153 (2006).
[Crossref]

Benware, B. R.

C. D. Macchietto, B. R. Benware, and J. J. Rocca, “Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier,” Opt. Lett. 24, 1115-1117 (1999).
[Crossref]

B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, “Demonstration of a high average power tabletop soft x-ray laser,” Phys. Rev. Lett. 81, 5804-5807 (1998).
[Crossref]

Berrill, M.

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

Bleidiessel, G.

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

Brueck, S. R. J.

S. R. J. Brueck, “Optical and interferometric lithography--nanotechnology enablers,” Proc. IEEE 93, 1704-1721 (2005).
[Crossref]

Cammarata, R. C.

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

Capeluto, M. G.

P. W. Wachulak, M. G. Capeluto, M. C. Marconi, C. S. Menoni, and J. J. Rocca, “Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography,” Opt. Express 15, 3465-3469 (2007).
[Crossref] [PubMed]

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Cerrina, F.

H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
[Crossref]

H. H. Solak, D. He, W. Li, and F. Cerrina, “Nanolithography using extreme ultraviolet lithography interferometry: 19nm lines and spaces,” J. Vac. Sci. Technol. B 17, 3052-3057 (1999).
[Crossref]

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

Chien, C. L.

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

Chou, S. Y.

S. Y. Chou, “Nanoimprint lithography and lithographically induced self-assembly,” MRS Bull. 26, 512-517 (2001).
[Crossref]

S. Y. Chou and P. R. Krauss, “Imprint lithography with sub-10nm feature size and high throughput,” Microelectron. Eng. 35, 237-240 (1997).
[Crossref]

S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint lithography,” J. Vac. Sci. Technol. B 14, 4129-4133 (1996).
[Crossref]

David, C.

H. H. Solak and C. David, “Patterning of circular structure arrays with interference lithography,” J. Vac. Sci. Technol. B 21, 2883-2887 (2003).
[Crossref]

H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
[Crossref]

de Pablo, J. J.

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

Decker, J. Y.

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

Ekerdt, J. G.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Engel, B. N.

F. B. Mancoff, N. D. Rizzo, B. N. Engel, and S. Tehrani, “Phase-locking in double-point-contact spin-transfer devices,” Nature 437, 393-395 (2005).
[Crossref] [PubMed]

Fan, D. L.

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

Fernandez, A.

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

Ferrier, N. J.

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

Frank, S.

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

Gehoski, K. A.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Gobrecht, J.

H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
[Crossref]

Grisham, M.

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13, 4050-4055 (2005).
[Crossref] [PubMed]

Grutzner, G.

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

He, D.

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

H. H. Solak, D. He, W. Li, and F. Cerrina, “Nanolithography using extreme ultraviolet lithography interferometry: 19nm lines and spaces,” J. Vac. Sci. Technol. B 17, 3052-3057 (1999).
[Crossref]

Heinbuch, S.

Herman, S. M.

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

Hinsberg, W.

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

Hinsberg, W. D.

J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, “Liquid immersion deep-ultraviolet interferometric lithography,” J. Vac. Sci. Technol. B 17, 3306-3309 (1999).
[Crossref]

Hoffnagle, J.

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

Hoffnagle, J. A.

J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, “Liquid immersion deep-ultraviolet interferometric lithography,” J. Vac. Sci. Technol. B 17, 3306-3309 (1999).
[Crossref]

Houle, F. A.

J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, “Liquid immersion deep-ultraviolet interferometric lithography,” J. Vac. Sci. Technol. B 17, 3306-3309 (1999).
[Crossref]

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

Kim, M. J.

M. J. Kim, M. Wanunu, D. C. Bell, and A. Meller, “Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis,” Adv. Mater. (Weinheim, Ger.) 18, 3149-3153 (2006).
[Crossref]

Kim, S. O.

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

Krauss, P. R.

S. Y. Chou and P. R. Krauss, “Imprint lithography with sub-10nm feature size and high throughput,” Microelectron. Eng. 35, 237-240 (1997).
[Crossref]

S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint lithography,” J. Vac. Sci. Technol. B 14, 4129-4133 (1996).
[Crossref]

Larotonda, M. A.

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

Li, W.

H. H. Solak, D. He, W. Li, and F. Cerrina, “Nanolithography using extreme ultraviolet lithography interferometry: 19nm lines and spaces,” J. Vac. Sci. Technol. B 17, 3052-3057 (1999).
[Crossref]

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

Lu, Y. F.

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Luduena, S.

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Luther, B. M.

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

Lyebyedyev, D.

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

Macchietto, C. D.

C. D. Macchietto, B. R. Benware, and J. J. Rocca, “Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier,” Opt. Lett. 24, 1115-1117 (1999).
[Crossref]

B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, “Demonstration of a high average power tabletop soft x-ray laser,” Phys. Rev. Lett. 81, 5804-5807 (1998).
[Crossref]

Mancini, D. P.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Mancoff, F. B.

F. B. Mancoff, N. D. Rizzo, B. N. Engel, and S. Tehrani, “Phase-locking in double-point-contact spin-transfer devices,” Nature 437, 393-395 (2005).
[Crossref] [PubMed]

Marconi, M. C.

P. W. Wachulak, M. G. Capeluto, M. C. Marconi, C. S. Menoni, and J. J. Rocca, “Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography,” Opt. Express 15, 3465-3469 (2007).
[Crossref] [PubMed]

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Martz, D.

Meller, A.

M. J. Kim, M. Wanunu, D. C. Bell, and A. Meller, “Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis,” Adv. Mater. (Weinheim, Ger.) 18, 3149-3153 (2006).
[Crossref]

Menoni, C. S.

P. W. Wachulak, M. G. Capeluto, M. C. Marconi, C. S. Menoni, and J. J. Rocca, “Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography,” Opt. Express 15, 3465-3469 (2007).
[Crossref] [PubMed]

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Moreno, C. H.

B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, “Demonstration of a high average power tabletop soft x-ray laser,” Phys. Rev. Lett. 81, 5804-5807 (1998).
[Crossref]

Morrison, M.

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

Nealey, P.

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

Nealey, P. F.

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

Nordquist, K. J.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Parkinson, B.

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Perry, M. D.

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

Pfeiffer, K.

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

Phillion, D. W.

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

Pietrasanta, L.

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Renstrom, P. J.

S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint lithography,” J. Vac. Sci. Technol. B 14, 4129-4133 (1996).
[Crossref]

Resnick, D. J.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Rizzo, N. D.

F. B. Mancoff, N. D. Rizzo, B. N. Engel, and S. Tehrani, “Phase-locking in double-point-contact spin-transfer devices,” Nature 437, 393-395 (2005).
[Crossref] [PubMed]

Rocca, J. J.

P. W. Wachulak, M. G. Capeluto, M. C. Marconi, C. S. Menoni, and J. J. Rocca, “Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography,” Opt. Express 15, 3465-3469 (2007).
[Crossref] [PubMed]

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13, 4050-4055 (2005).
[Crossref] [PubMed]

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

C. D. Macchietto, B. R. Benware, and J. J. Rocca, “Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier,” Opt. Lett. 24, 1115-1117 (1999).
[Crossref]

B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, “Demonstration of a high average power tabletop soft x-ray laser,” Phys. Rev. Lett. 81, 5804-5807 (1998).
[Crossref]

Sanchez, M.

J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, “Liquid immersion deep-ultraviolet interferometric lithography,” J. Vac. Sci. Technol. B 17, 3306-3309 (1999).
[Crossref]

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

Scheer, H. C.

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

Schulz, H.

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

Shlyaptsev, V. N.

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

Singh-Gasson, S.

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

Slavin, A. N.

A. N. Slavin and V. S. Tiberkevich, “Nonlinear self-phase-locking effect in an array of current-driven magnetic nanocontacts,” Phys. Rev. B 72, 092407 (2005).
[Crossref]

Sohn, B. H.

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

Solak, H. H.

H. H. Solak and C. David, “Patterning of circular structure arrays with interference lithography,” J. Vac. Sci. Technol. B 21, 2883-2887 (2003).
[Crossref]

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
[Crossref]

H. H. Solak, D. He, W. Li, and F. Cerrina, “Nanolithography using extreme ultraviolet lithography interferometry: 19nm lines and spaces,” J. Vac. Sci. Technol. B 17, 3052-3057 (1999).
[Crossref]

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

Sreenivasan, S. V.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Stoykovich, M. P.

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

Sweeney, D. W.

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

Tehrani, S.

F. B. Mancoff, N. D. Rizzo, B. N. Engel, and S. Tehrani, “Phase-locking in double-point-contact spin-transfer devices,” Nature 437, 393-395 (2005).
[Crossref] [PubMed]

Tiberkevich, V. S.

A. N. Slavin and V. S. Tiberkevich, “Nonlinear self-phase-locking effect in an array of current-driven magnetic nanocontacts,” Phys. Rev. B 72, 092407 (2005).
[Crossref]

Vaschenko, G.

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

Wachulak, P. W.

Wallraff, G.

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

Wang, L.

H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
[Crossref]

Wang, Y.

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

Wanunu, M.

M. J. Kim, M. Wanunu, D. C. Bell, and A. Meller, “Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis,” Adv. Mater. (Weinheim, Ger.) 18, 3149-3153 (2006).
[Crossref]

Willson, C. G.

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Yang, X. M.

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

Zhu, F. Q.

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

Zhu, J. G.

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

Zhu, X. C.

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

Adv. Mater. (Weinheim, Ger.) (2)

F. Q. Zhu, D. L. Fan, X. C. Zhu, J. G. Zhu, R. C. Cammarata, and C. L. Chien, “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas,” Adv. Mater. (Weinheim, Ger.) 16, 2155-2159 (2004).
[Crossref]

M. J. Kim, M. Wanunu, D. C. Bell, and A. Meller, “Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis,” Adv. Mater. (Weinheim, Ger.) 18, 3149-3153 (2006).
[Crossref]

Appl. Phys. Lett. (1)

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, “Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography,” Appl. Phys. Lett. 75, 2328-2330 (1999).
[Crossref]

IEEE J. Quantum Electron. (1)

E. H. Anderson, “Specialized electron beam nanolithography for EUV and x-ray diffractive optics,” IEEE J. Quantum Electron. 42, 27-35 (2006).
[Crossref]

IEEE Trans. Nanotechnol. (1)

M. G. Capeluto, G. Vaschenko, M. Grisham, M. C. Marconi, S. Luduena, L. Pietrasanta, Y. F. Lu, B. Parkinson, C. S. Menoni, and J. J. Rocca, “Nanopatterning with interferometric lithography using a compact lambda=46.9-nm laser,” IEEE Trans. Nanotechnol. 5, 3-7 (2006).
[Crossref]

J. Vac. Sci. Technol. B (9)

A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating arrays of holes using interference lithography,” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
[Crossref]

W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, “Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance,” J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
[Crossref]

J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, “Liquid immersion deep-ultraviolet interferometric lithography,” J. Vac. Sci. Technol. B 17, 3306-3309 (1999).
[Crossref]

H. H. Solak and C. David, “Patterning of circular structure arrays with interference lithography,” J. Vac. Sci. Technol. B 21, 2883-2887 (2003).
[Crossref]

H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, “Multiple-beam interference lithography with electron beam written gratings,” J. Vac. Sci. Technol. B 20, 2844-2848 (2002).
[Crossref]

H. H. Solak, D. He, W. Li, and F. Cerrina, “Nanolithography using extreme ultraviolet lithography interferometry: 19nm lines and spaces,” J. Vac. Sci. Technol. B 17, 3052-3057 (1999).
[Crossref]

H. Schulz, D. Lyebyedyev, H. C. Scheer, K. Pfeiffer, G. Bleidiessel, G. Grutzner, and J. Ahopelto, “Master replication into thermosetting polymers for nanoimprinting,” J. Vac. Sci. Technol. B 18, 3582-3585 (2000).
[Crossref]

S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint lithography,” J. Vac. Sci. Technol. B 14, 4129-4133 (1996).
[Crossref]

D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick, T. C. Bailey, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, “Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates,” J. Vac. Sci. Technol. B 20, 2896-2901 (2002).
[Crossref]

Microelectron. Eng. (1)

S. Y. Chou and P. R. Krauss, “Imprint lithography with sub-10nm feature size and high throughput,” Microelectron. Eng. 35, 237-240 (1997).
[Crossref]

MRS Bull. (1)

S. Y. Chou, “Nanoimprint lithography and lithographically induced self-assembly,” MRS Bull. 26, 512-517 (2001).
[Crossref]

Nature (2)

F. B. Mancoff, N. D. Rizzo, B. N. Engel, and S. Tehrani, “Phase-locking in double-point-contact spin-transfer devices,” Nature 437, 393-395 (2005).
[Crossref] [PubMed]

S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature 424, 411-414 (2003).
[Crossref]

Opt. Express (2)

Opt. Lett. (1)

Phys. Rev. A (1)

Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berrill, V. N. Shlyaptsev, and J. J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9nm and gain down to 10.9nm,” Phys. Rev. A 72, 053807 (2005).
[Crossref]

Phys. Rev. B (1)

A. N. Slavin and V. S. Tiberkevich, “Nonlinear self-phase-locking effect in an array of current-driven magnetic nanocontacts,” Phys. Rev. B 72, 092407 (2005).
[Crossref]

Phys. Rev. Lett. (1)

B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, “Demonstration of a high average power tabletop soft x-ray laser,” Phys. Rev. Lett. 81, 5804-5807 (1998).
[Crossref]

Proc. IEEE (1)

S. R. J. Brueck, “Optical and interferometric lithography--nanotechnology enablers,” Proc. IEEE 93, 1704-1721 (2005).
[Crossref]

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Figures (3)

Fig. 1
Fig. 1

(a) Schematic of the EUV ADI composed of a transmission diffraction grating beam splitter and a pair of grazing incidence mirrors. (b) Photograph of the setup. The dotted curves illustrate the optical paths of the two beams.

Fig. 2
Fig. 2

(a) Sequence of steps for the fabrication of the transmission diffraction grating using electron beam lithography in a photoresist layer deposited on top of a 100 nm Si membrane. (b) AFM image of the transmission diffraction grating.

Fig. 3
Fig. 3

(a) AFM image of a 145 nm period grating printed by IL using an EUV laser. (b) AFM image of a 95 nm period grating. Both images were obtained with the AFM working in the tapping mode over a small section of the printed grating.

Metrics