R. W. Boyd and S. J. Bentley, "Recent progress in quantum and nonlinear optical lithography," J. Mod. Opt. 53, 713-718 (2006).

[Crossref]

H. J. Chang, H. Shin, M. N. O'Sullivan-Hale, and R. W. Boyd, "Implementation of sub-Rayleigh lithography using an N-photon absorber," J. Mod. Opt. 53, 2271-2277 (2006).

[Crossref]

B. Dayan, A. Peer, A. A. Friesem, and Y. Silberberg, "Nonlinear interactions with an ultrahigh flux of broadband entangled photons," Phys. Rev. Lett. 94, 043602 (2005).

[Crossref]
[PubMed]

P. S. Westbrook, S. Wielandy, and M. Fishteyn, "Two-photon fourth-order polarimetery," Opt. Lett. 30, 655-657 (2005).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Parametric downconversion vs optical parametric amplification: a comparison of their quantum statistics," J. Mod. Opt. 49, 529-537 (2002).

[Crossref]

D. V. Korobkin and E. Yablonovitch, "Two-fold spatial resolution enhancement by two-photon exposure of photographic film," Opt. Eng. 41, 1729-17322002).

[Crossref]

J. M. Roth, T. E. Murphy, and C. Xu, "Ultrasensitive and high-dynamic-range two-photon absorption in a GaAs photomultiplier tube," Opt. Lett. 27, 2076-2078 (2002).

[Crossref]

M. D'Angelo, M. V. Chekhova, and Y. Shih, "Two-photon diffraction and quantum lithography," Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]
[PubMed]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, "Comment on 'Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit,"' Phys. Rev. Lett. 86, 1389-1389 (2001).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Nonclassical two-photon interferometry and lithography with high-gain parametric amplifiers," Phys. Rev. A 64, 043802 (2001).

[Crossref]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

E. Yablonovitch and R. B. Vrijen, "Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure," Opt. Eng. 38, 334-338 (1999).

[Crossref]

J. Perina, B. E. A. Saleh, and M. C. Teich, "Multiphoton absorption cross section and virtual-state spectroscopy for the entangled n-photon state," Phys. Rev. A 57, 3972-3986 (1998).

[Crossref]

N. P. Georgiades, E. S. Polzik, K. Edamatsu, and H. J. Kimble, "Nonclassical excitation for atoms in a squeezed vacuum," Phys. Rev. Lett. 75, 3426-3429 (1995).

[Crossref]
[PubMed]

J. Javanainen and P. L. Gould, "Linear intensity dependence of a two-photon transition rate," Phys. Rev. A 41, 5088-5091 (1990).

[Crossref]
[PubMed]

J. Gea-Banacloche, "Two-photon absorption of nonclassical light," Phys. Rev. Lett. 62, 1603-1606 (1989).

[Crossref]
[PubMed]

C. K. Hong, Z. Y. Ou, and L. Mandel, "Measurement of subpicosecond time intervals between two photons by interference," Phys. Rev. Lett. 59, 2044-2046 (1987).

[Crossref]
[PubMed]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Parametric downconversion vs optical parametric amplification: a comparison of their quantum statistics," J. Mod. Opt. 49, 529-537 (2002).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, "Comment on 'Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit,"' Phys. Rev. Lett. 86, 1389-1389 (2001).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Nonclassical two-photon interferometry and lithography with high-gain parametric amplifiers," Phys. Rev. A 64, 043802 (2001).

[Crossref]

R. W. Boyd and S. J. Bentley, "Recent progress in quantum and nonlinear optical lithography," J. Mod. Opt. 53, 713-718 (2006).

[Crossref]

S. J. Bentley and R. W. Boyd, "Nonlinear optical lithography with ultra-high sub-Rayleigh resolution," Opt. Express 12, 5735-5740 (2004).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Parametric downconversion vs optical parametric amplification: a comparison of their quantum statistics," J. Mod. Opt. 49, 529-537 (2002).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, "Comment on 'Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit,"' Phys. Rev. Lett. 86, 1389-1389 (2001).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Nonclassical two-photon interferometry and lithography with high-gain parametric amplifiers," Phys. Rev. A 64, 043802 (2001).

[Crossref]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

R. W. Boyd and S. J. Bentley, "Recent progress in quantum and nonlinear optical lithography," J. Mod. Opt. 53, 713-718 (2006).

[Crossref]

H. J. Chang, H. Shin, M. N. O'Sullivan-Hale, and R. W. Boyd, "Implementation of sub-Rayleigh lithography using an N-photon absorber," J. Mod. Opt. 53, 2271-2277 (2006).

[Crossref]

S. J. Bentley and R. W. Boyd, "Nonlinear optical lithography with ultra-high sub-Rayleigh resolution," Opt. Express 12, 5735-5740 (2004).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Parametric downconversion vs optical parametric amplification: a comparison of their quantum statistics," J. Mod. Opt. 49, 529-537 (2002).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, "Comment on 'Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit,"' Phys. Rev. Lett. 86, 1389-1389 (2001).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Nonclassical two-photon interferometry and lithography with high-gain parametric amplifiers," Phys. Rev. A 64, 043802 (2001).

[Crossref]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

H. J. Chang, H. Shin, M. N. O'Sullivan-Hale, and R. W. Boyd, "Implementation of sub-Rayleigh lithography using an N-photon absorber," J. Mod. Opt. 53, 2271-2277 (2006).

[Crossref]

M. D'Angelo, M. V. Chekhova, and Y. Shih, "Two-photon diffraction and quantum lithography," Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]
[PubMed]

M. D'Angelo, M. V. Chekhova, and Y. Shih, "Two-photon diffraction and quantum lithography," Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]
[PubMed]

B. Dayan, A. Peer, A. A. Friesem, and Y. Silberberg, "Nonlinear interactions with an ultrahigh flux of broadband entangled photons," Phys. Rev. Lett. 94, 043602 (2005).

[Crossref]
[PubMed]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

N. P. Georgiades, E. S. Polzik, K. Edamatsu, and H. J. Kimble, "Nonclassical excitation for atoms in a squeezed vacuum," Phys. Rev. Lett. 75, 3426-3429 (1995).

[Crossref]
[PubMed]

B. Dayan, A. Peer, A. A. Friesem, and Y. Silberberg, "Nonlinear interactions with an ultrahigh flux of broadband entangled photons," Phys. Rev. Lett. 94, 043602 (2005).

[Crossref]
[PubMed]

J. Gea-Banacloche, "Two-photon absorption of nonclassical light," Phys. Rev. Lett. 62, 1603-1606 (1989).

[Crossref]
[PubMed]

N. P. Georgiades, E. S. Polzik, K. Edamatsu, and H. J. Kimble, "Nonclassical excitation for atoms in a squeezed vacuum," Phys. Rev. Lett. 75, 3426-3429 (1995).

[Crossref]
[PubMed]

J. Javanainen and P. L. Gould, "Linear intensity dependence of a two-photon transition rate," Phys. Rev. A 41, 5088-5091 (1990).

[Crossref]
[PubMed]

C. K. Hong, Z. Y. Ou, and L. Mandel, "Measurement of subpicosecond time intervals between two photons by interference," Phys. Rev. Lett. 59, 2044-2046 (1987).

[Crossref]
[PubMed]

J. Javanainen and P. L. Gould, "Linear intensity dependence of a two-photon transition rate," Phys. Rev. A 41, 5088-5091 (1990).

[Crossref]
[PubMed]

N. P. Georgiades, E. S. Polzik, K. Edamatsu, and H. J. Kimble, "Nonclassical excitation for atoms in a squeezed vacuum," Phys. Rev. Lett. 75, 3426-3429 (1995).

[Crossref]
[PubMed]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

D. V. Korobkin and E. Yablonovitch, "Two-fold spatial resolution enhancement by two-photon exposure of photographic film," Opt. Eng. 41, 1729-17322002).

[Crossref]

C. K. Hong, Z. Y. Ou, and L. Mandel, "Measurement of subpicosecond time intervals between two photons by interference," Phys. Rev. Lett. 59, 2044-2046 (1987).

[Crossref]
[PubMed]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Parametric downconversion vs optical parametric amplification: a comparison of their quantum statistics," J. Mod. Opt. 49, 529-537 (2002).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Nonclassical two-photon interferometry and lithography with high-gain parametric amplifiers," Phys. Rev. A 64, 043802 (2001).

[Crossref]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, "Comment on 'Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit,"' Phys. Rev. Lett. 86, 1389-1389 (2001).

[Crossref]
[PubMed]

H. J. Chang, H. Shin, M. N. O'Sullivan-Hale, and R. W. Boyd, "Implementation of sub-Rayleigh lithography using an N-photon absorber," J. Mod. Opt. 53, 2271-2277 (2006).

[Crossref]

C. K. Hong, Z. Y. Ou, and L. Mandel, "Measurement of subpicosecond time intervals between two photons by interference," Phys. Rev. Lett. 59, 2044-2046 (1987).

[Crossref]
[PubMed]

B. Dayan, A. Peer, A. A. Friesem, and Y. Silberberg, "Nonlinear interactions with an ultrahigh flux of broadband entangled photons," Phys. Rev. Lett. 94, 043602 (2005).

[Crossref]
[PubMed]

J. Perina, B. E. A. Saleh, and M. C. Teich, "Multiphoton absorption cross section and virtual-state spectroscopy for the entangled n-photon state," Phys. Rev. A 57, 3972-3986 (1998).

[Crossref]

N. P. Georgiades, E. S. Polzik, K. Edamatsu, and H. J. Kimble, "Nonclassical excitation for atoms in a squeezed vacuum," Phys. Rev. Lett. 75, 3426-3429 (1995).

[Crossref]
[PubMed]

J. Perina, B. E. A. Saleh, and M. C. Teich, "Multiphoton absorption cross section and virtual-state spectroscopy for the entangled n-photon state," Phys. Rev. A 57, 3972-3986 (1998).

[Crossref]

M. D'Angelo, M. V. Chekhova, and Y. Shih, "Two-photon diffraction and quantum lithography," Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]
[PubMed]

H. J. Chang, H. Shin, M. N. O'Sullivan-Hale, and R. W. Boyd, "Implementation of sub-Rayleigh lithography using an N-photon absorber," J. Mod. Opt. 53, 2271-2277 (2006).

[Crossref]

B. Dayan, A. Peer, A. A. Friesem, and Y. Silberberg, "Nonlinear interactions with an ultrahigh flux of broadband entangled photons," Phys. Rev. Lett. 94, 043602 (2005).

[Crossref]
[PubMed]

J. Perina, B. E. A. Saleh, and M. C. Teich, "Multiphoton absorption cross section and virtual-state spectroscopy for the entangled n-photon state," Phys. Rev. A 57, 3972-3986 (1998).

[Crossref]

E. Yablonovitch and R. B. Vrijen, "Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure," Opt. Eng. 38, 334-338 (1999).

[Crossref]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

D. V. Korobkin and E. Yablonovitch, "Two-fold spatial resolution enhancement by two-photon exposure of photographic film," Opt. Eng. 41, 1729-17322002).

[Crossref]

E. Yablonovitch and R. B. Vrijen, "Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure," Opt. Eng. 38, 334-338 (1999).

[Crossref]

R. W. Boyd and S. J. Bentley, "Recent progress in quantum and nonlinear optical lithography," J. Mod. Opt. 53, 713-718 (2006).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Parametric downconversion vs optical parametric amplification: a comparison of their quantum statistics," J. Mod. Opt. 49, 529-537 (2002).

[Crossref]

H. J. Chang, H. Shin, M. N. O'Sullivan-Hale, and R. W. Boyd, "Implementation of sub-Rayleigh lithography using an N-photon absorber," J. Mod. Opt. 53, 2271-2277 (2006).

[Crossref]

E. Yablonovitch and R. B. Vrijen, "Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure," Opt. Eng. 38, 334-338 (1999).

[Crossref]

D. V. Korobkin and E. Yablonovitch, "Two-fold spatial resolution enhancement by two-photon exposure of photographic film," Opt. Eng. 41, 1729-17322002).

[Crossref]

J. K. Ranka, A. L. Gaeta, A. Baltuska, M. Pshenichnikov, and D. A. Wiersma, "Autocorrelation measurement of 6-fs pulses based on the two-photon-induced photocurrent in a GaAsP photodiode," Opt. Lett. 22, 1344-1346 (1997).

[Crossref]

P. S. Westbrook, S. Wielandy, and M. Fishteyn, "Two-photon fourth-order polarimetery," Opt. Lett. 30, 655-657 (2005).

[Crossref]
[PubMed]

J. M. Roth, T. E. Murphy, and C. Xu, "Ultrasensitive and high-dynamic-range two-photon absorption in a GaAs photomultiplier tube," Opt. Lett. 27, 2076-2078 (2002).

[Crossref]

J. Javanainen and P. L. Gould, "Linear intensity dependence of a two-photon transition rate," Phys. Rev. A 41, 5088-5091 (1990).

[Crossref]
[PubMed]

J. Perina, B. E. A. Saleh, and M. C. Teich, "Multiphoton absorption cross section and virtual-state spectroscopy for the entangled n-photon state," Phys. Rev. A 57, 3972-3986 (1998).

[Crossref]

E. M. Nagasako, S. J. Bentley, R. W. Boyd, and G. S. Agarwal, "Nonclassical two-photon interferometry and lithography with high-gain parametric amplifiers," Phys. Rev. A 64, 043802 (2001).

[Crossref]

J. Gea-Banacloche, "Two-photon absorption of nonclassical light," Phys. Rev. Lett. 62, 1603-1606 (1989).

[Crossref]
[PubMed]

G. S. Agarwal, R. W. Boyd, E. M. Nagasako, and S. J. Bentley, "Comment on 'Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit,"' Phys. Rev. Lett. 86, 1389-1389 (2001).

[Crossref]
[PubMed]

A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling, "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit," Phys. Rev. Lett. 85, 2733-2736 (2000).

[Crossref]
[PubMed]

M. D'Angelo, M. V. Chekhova, and Y. Shih, "Two-photon diffraction and quantum lithography," Phys. Rev. Lett. 87, 013602 (2001).

[Crossref]
[PubMed]

N. P. Georgiades, E. S. Polzik, K. Edamatsu, and H. J. Kimble, "Nonclassical excitation for atoms in a squeezed vacuum," Phys. Rev. Lett. 75, 3426-3429 (1995).

[Crossref]
[PubMed]

B. Dayan, A. Peer, A. A. Friesem, and Y. Silberberg, "Nonlinear interactions with an ultrahigh flux of broadband entangled photons," Phys. Rev. Lett. 94, 043602 (2005).

[Crossref]
[PubMed]

C. K. Hong, Z. Y. Ou, and L. Mandel, "Measurement of subpicosecond time intervals between two photons by interference," Phys. Rev. Lett. 59, 2044-2046 (1987).

[Crossref]
[PubMed]