Abstract

A numerical approach has been developed for simulating the recording and erasure kinetics in photorefractive materials for high modulation of the light-intensity pattern. The recording kinetics for the fundamental grating strongly deviates from exponential behavior, and it is much slower than the kinetics inferred from a linearized solution. The harmonics of the grating show lower growth rates for higher Fourier orders and exhibit an initial delay time. On the other hand, in the optical erasure experiment (starting from the steady-state solution), the decay rate of the fundamental harmonic is exponential and closely matches the predictions of the linear approximation. Moreover, the decay rate of the harmonics are in good agreement with the value corresponding to a fundamental grating with the same k vector. This uncoupling of the Fourier components is no longer intact when erasure is started from a nonsaturated grating. The effect of the grating vector of the light pattern and an externally applied field on the growth and the erasure kinetics have also been investigated. The applied field modifies the kinetic behavior and introduces some differential features with regard to the linear solution.

© 1994 Optical Society of America

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