Abstract

We report on the use of several complementary techniques for the optical characterization of semiconductor waveguides for parametric generation. Grating-assisted distributed coupling, x-ray reflectometry, and surface-emitting second-harmonic generation allowed us to evaluate the effective indices of the guided modes, the thickness of each constituent layer, and the modal birefringences of a multilayer AlGaAs/AlAs waveguide, respectively. With the experimental accuracy afforded by these techniques we could precisely infer the bulk refractive indices of various films to comply with the strict requirements for phase-matched guided-wave devices.

© 2002 Optical Society of America

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