Abstract

We present a model with which to describe and predict the formation of gratings during exposure in holographic photopolymers. This model combines the action of photopolymerization and of free-monomer diffusion during holographic exposures. We consider the free-monomer density to be spatially varying, during exposure, with a single first-harmonic term out of phase with respect to the intensity interference pattern. Examples of behavior predicted by the model include the variation of the saturation diffraction efficiency with recording exposure intensity and with beam intensity modulation, as well as the variation of recorded grating modulation during dark diffusion transient. The model is supported by experiments carried out by exposure of DuPont HRF-150-38 holographic photopolymers.

© 2000 Optical Society of America

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