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Advances in lithography: introduction to the feature

Appl. Opt. 53(34), LI1-LI2 (2014)  View: HTML | PDF

Transport of intensity phase imaging in the presence of curl effects induced by strongly absorbing photomasks

Appl. Opt. 53(34), J1-J6 (2014)  View: HTML | PDF

Nodal line-scanning method for maskless optical lithography

Appl. Opt. 53(34), J7-J18 (2014)  View: HTML | PDF

Robust and efficient inverse mask synthesis with basis function representation

J. Opt. Soc. Am. A 31(12), B1-B9 (2014)  View: HTML | PDF

Efficient representation of mask transmittance functions for vectorial lithography simulations

J. Opt. Soc. Am. A 31(12), B10-B18 (2014)  View: HTML | PDF

Illumination source optimization in optical lithography via derivative-free optimization

J. Opt. Soc. Am. A 31(12), B19-B26 (2014)  View: HTML | PDF

Diffractive lens design for optimized focusing

J. Opt. Soc. Am. A 31(12), B27-B33 (2014)  View: HTML | PDF

Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

J. Opt. Soc. Am. A 31(12), B34-B43 (2014)  View: HTML | PDF

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