Optical metrology and instrumentation is the backbone of measurement science. The ability to measure precisely with high dynamic range and accuracy allows the measurement of features on the atomic scale, in fields like lithography, all the way to the cosmic scale where gravitational waves can be detected. While the uses of optical metrology are numerous, the fundamental techniques are quite limited and it is only when surrounded with specific instrumentation that truly novel science is enabled. The purpose of this feature issue is to highlight how research in a variety of fields is impacted by relatively few fundamental optical metrology techniques. We welcome contributions on developments in optical metrology and the associated instrumentation that advance measurement science.
Topics of interest include but are not limited to the following areas:
All papers need to present original, previously unpublished work, and will be subject to the normal standards and peer-review process of the journal. Manuscripts must be prepared according to the usual guidelines for submission to JOSA A and must be uploaded through OSA's electronic submission system. When submitting, please specify that the manuscript is for the Advances in Optical Metrology and Instrumentation feature issue (choose from the drop-down menu).
Jonathan D. Ellis, University of Arizona, United States (Lead Editor)
Han Haitjema, KU Leuven, Belgium
Xiangqian (Jane) Jiang, University of Huddersfield, United Kingdom
Ki-Nam Joo, Chosun University, South Korea
Richard Leach, University of Nottingham, United Kingdom