Abstract

The design of advanced diffraction gratings that produce spot arrays is highly influenced by the computational capabilities that are available to the designer. This is due to the increased pattern complexity that is required for larger spot arrays or higher efficiencies. Symmetries that lead to a significant reduction in the design complexity can be incorporated into the grating pattern. In addition, a translational symmetry leads to the highly desired result of even-numbered spot arrays. We examine the symmetries that can be applied to both general-and discrete-level design parameterization.

© 1992 Optical Society of America

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