Abstract

Most of the optical axes in modern systems are bent for optomechanical considerations. Antireflection (AR) coatings for polarized light at oblique incidence are widely used in optical surfaces like prisms or multiform lenses to suppress undesirable reflections. The optimal design and fabrication method for AR coatings with large-angle range (68°–74°) for a P-polarized 193 nm laser beam is discussed in detail. Experimental results showed that after coating, the reflection loss of a P-polarized laser beam at large angles of incidence on the optical surfaces is reduced dramatically, which could greatly improve the output efficiency of the optical components in the deep ultraviolet vacuum range.

© 2013 Optical Society of America

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K. Yang, X. Long, Y. Huang, and S. Wu, “Design and fabrication of ultra-high precision thin-film polarizing beam splitter,” Opt. Commun. 284, 4650–4653 (2011).
[CrossRef]

2010

2009

2008

2007

2006

2005

M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005).
[CrossRef]

2002

C. Görling, U. Leinhos, and K. Mann, “Comparative studies of absorptance behaviour of alkaline-earth fluorides at 193 nm and 157 nm,” Appl. Phys. B 74, 339–346 (2002).
[CrossRef]

2000

P. Kadkhoda, H. Blaschke, J. Kohlhaas, and D. Ristau, “DUV/VUV spectrophotometry for high-precision spectral characterization,” Proc. SPIE 4099, 311–318 (2000).
[CrossRef]

1996

E. Eva and K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).

1976

Apfel, J. H.

Azzam, R. M. A.

Bashara, N. M.

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1987).

Basting, D.

D. Basting, G. Marowsky, and U. Brinkmann, Excimer Laser Technology (Springer, 2005).

Bischoff, M.

Blaschke, H.

P. Kadkhoda, H. Blaschke, J. Kohlhaas, and D. Ristau, “DUV/VUV spectrophotometry for high-precision spectral characterization,” Proc. SPIE 4099, 311–318 (2000).
[CrossRef]

Brinkmann, U.

D. Basting, G. Marowsky, and U. Brinkmann, Excimer Laser Technology (Springer, 2005).

Chuvilin, A.

DeBell, G. W.

Eva, E.

E. Eva and K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).

Furman, S. A.

S. A. Furman and A. V. Tikhonravov, Basics of Optics of Multilayer Systems (Editions Frontieres, 1992), p. 64.

Gäbler, D.

Görling, C.

C. Görling, U. Leinhos, and K. Mann, “Comparative studies of absorptance behaviour of alkaline-earth fluorides at 193 nm and 157 nm,” Appl. Phys. B 74, 339–346 (2002).
[CrossRef]

Huang, Y.

K. Yang, X. Long, Y. Huang, and S. Wu, “Design and fabrication of ultra-high precision thin-film polarizing beam splitter,” Opt. Commun. 284, 4650–4653 (2011).
[CrossRef]

Kadkhoda, P.

P. Kadkhoda, H. Blaschke, J. Kohlhaas, and D. Ristau, “DUV/VUV spectrophotometry for high-precision spectral characterization,” Proc. SPIE 4099, 311–318 (2000).
[CrossRef]

Kaiser, N.

Kaiser, U.

Kaneko, M.

M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005).
[CrossRef]

Kohlhaas, J.

P. Kadkhoda, H. Blaschke, J. Kohlhaas, and D. Ristau, “DUV/VUV spectrophotometry for high-precision spectral characterization,” Proc. SPIE 4099, 311–318 (2000).
[CrossRef]

Kuschnereit, R.

R. Kuschnereit and H. Paul, “Antireflection coating for ultraviolet light at large angles of incidence,” U.S. patent6,697,194B2 (February24, 2004).

Lee, C. C.

M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005).
[CrossRef]

Leinhos, U.

C. Görling, U. Leinhos, and K. Mann, “Comparative studies of absorptance behaviour of alkaline-earth fluorides at 193 nm and 157 nm,” Appl. Phys. B 74, 339–346 (2002).
[CrossRef]

Liu, M. C.

M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005).
[CrossRef]

Long, X.

K. Yang, X. Long, Y. Huang, and S. Wu, “Design and fabrication of ultra-high precision thin-film polarizing beam splitter,” Opt. Commun. 284, 4650–4653 (2011).
[CrossRef]

Mann, K.

C. Görling, U. Leinhos, and K. Mann, “Comparative studies of absorptance behaviour of alkaline-earth fluorides at 193 nm and 157 nm,” Appl. Phys. B 74, 339–346 (2002).
[CrossRef]

E. Eva and K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).

Marowsky, G.

D. Basting, G. Marowsky, and U. Brinkmann, Excimer Laser Technology (Springer, 2005).

Nakahira, K.

M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005).
[CrossRef]

Paul, H.

R. Kuschnereit and H. Paul, “Antireflection coating for ultraviolet light at large angles of incidence,” U.S. patent6,697,194B2 (February24, 2004).

Ristau, D.

P. Kadkhoda, H. Blaschke, J. Kohlhaas, and D. Ristau, “DUV/VUV spectrophotometry for high-precision spectral characterization,” Proc. SPIE 4099, 311–318 (2000).
[CrossRef]

Stenzel, O.

Takano, Y.

M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005).
[CrossRef]

Tikhonravov, A. V.

Trubetskov, M. K.

Tünnermann, A.

Wilbrandt, S.

Wu, S.

K. Yang, X. Long, Y. Huang, and S. Wu, “Design and fabrication of ultra-high precision thin-film polarizing beam splitter,” Opt. Commun. 284, 4650–4653 (2011).
[CrossRef]

Yang, K.

K. Yang, X. Long, Y. Huang, and S. Wu, “Design and fabrication of ultra-high precision thin-film polarizing beam splitter,” Opt. Commun. 284, 4650–4653 (2011).
[CrossRef]

Appl. Opt.

Appl. Phys. A

E. Eva and K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).

Appl. Phys. B

C. Görling, U. Leinhos, and K. Mann, “Comparative studies of absorptance behaviour of alkaline-earth fluorides at 193 nm and 157 nm,” Appl. Phys. B 74, 339–346 (2002).
[CrossRef]

Opt. Commun.

K. Yang, X. Long, Y. Huang, and S. Wu, “Design and fabrication of ultra-high precision thin-film polarizing beam splitter,” Opt. Commun. 284, 4650–4653 (2011).
[CrossRef]

Opt. Express

Opt. Lett.

Proc. SPIE

P. Kadkhoda, H. Blaschke, J. Kohlhaas, and D. Ristau, “DUV/VUV spectrophotometry for high-precision spectral characterization,” Proc. SPIE 4099, 311–318 (2000).
[CrossRef]

Thin Solid Films

M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005).
[CrossRef]

Other

S. A. Furman and A. V. Tikhonravov, Basics of Optics of Multilayer Systems (Editions Frontieres, 1992), p. 64.

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1987).

D. Basting, G. Marowsky, and U. Brinkmann, Excimer Laser Technology (Springer, 2005).

R. Kuschnereit and H. Paul, “Antireflection coating for ultraviolet light at large angles of incidence,” U.S. patent6,697,194B2 (February24, 2004).

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