N. P. van der Aa and R. M. M. Mattheij, “Computing shape parameter sensitivity of the field of one-dimensional surface-relief gratings by using an analytical approach based on RCWA,” J. Opt. Soc. Am. A 24, 2692–2700 (2007).

[CrossRef]

T. Schuster, J. Ruoff, N. Kerwien, S. Raffler, and W. Osten, “Normal vector method for convergence improvement using the RCWA for crossed gratings,” J. Opt. Soc. Am. A 24, 2880–2890 (2007).

[CrossRef]

C. Zhou and L. Li, “Formulation of the Fourier modal method for symmetric crossed gratings in symmetric mountings,” J. Opt. A 6, 43–50 (2004).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, “Specular spectroscopic scatterometry in DUV lithography,” Proc. SPIE 3677, 159–168 (1999).

[CrossRef]

L. Li, “New formulation of the Fourier modal method for crossed surface-relief gratings,” J. Opt. Soc. Am. A 14, 2758–2767(1997).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997).

[CrossRef]

C. J. Raymond, S. S. H. Naqvi, and J. R. McNeil, “Resist and etched line profile characterization using scatterometry,” Proc. SPIE 3050, 476–486 (1997).

[CrossRef]

E. J. Hinch, Perturbation Methods, Cambridge Texts in Applied Mathematics (Cambridge University, 1992).

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, “Specular spectroscopic scatterometry in DUV lithography,” Proc. SPIE 3677, 159–168 (1999).

[CrossRef]

J. Bischoff, K. Hehl, X. Niu, and W. Jin, “Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer,” U.S. Patent 7,630,873 (8 December 2009).

J. Bischoff, “Formulation of the normal vector RCWA for symmetric crossed gratings in symmetric mountings,” J. Opt. Soc. Am. A 27, pp. 1024–1031 (2010).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

J. Bischoff, K. Hehl, X. Niu, and W. Jin, “Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer,” U.S. Patent 7,630,873 (8 December 2009).

E. J. Hinch, Perturbation Methods, Cambridge Texts in Applied Mathematics (Cambridge University, 1992).

X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, “Specular spectroscopic scatterometry in DUV lithography,” Proc. SPIE 3677, 159–168 (1999).

[CrossRef]

J. Bischoff, K. Hehl, X. Niu, and W. Jin, “Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer,” U.S. Patent 7,630,873 (8 December 2009).

B. Bai and L. Li, “Group-theoretic approach to enhancing the Fourier modal method for crossed gratings with square symmetry,” J. Opt. Soc. Am. A 23, 572–580 (2006).

[CrossRef]

C. Zhou and L. Li, “Formulation of the Fourier modal method for symmetric crossed gratings in symmetric mountings,” J. Opt. A 6, 43–50 (2004).

[CrossRef]

L. Li, “New formulation of the Fourier modal method for crossed surface-relief gratings,” J. Opt. Soc. Am. A 14, 2758–2767(1997).

[CrossRef]

L. Li, “Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings,” J. Opt. Soc. Am. A 13, 1024–1035 (1996).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997).

[CrossRef]

C. J. Raymond, S. S. H. Naqvi, and J. R. McNeil, “Resist and etched line profile characterization using scatterometry,” Proc. SPIE 3050, 476–486 (1997).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997).

[CrossRef]

C. J. Raymond, S. S. H. Naqvi, and J. R. McNeil, “Resist and etched line profile characterization using scatterometry,” Proc. SPIE 3050, 476–486 (1997).

[CrossRef]

J. Bischoff, K. Hehl, X. Niu, and W. Jin, “Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer,” U.S. Patent 7,630,873 (8 December 2009).

X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, “Specular spectroscopic scatterometry in DUV lithography,” Proc. SPIE 3677, 159–168 (1999).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997).

[CrossRef]

C. J. Raymond, S. S. H. Naqvi, and J. R. McNeil, “Resist and etched line profile characterization using scatterometry,” Proc. SPIE 3050, 476–486 (1997).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, “Specular spectroscopic scatterometry in DUV lithography,” Proc. SPIE 3677, 159–168 (1999).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, “Specular spectroscopic scatterometry in DUV lithography,” Proc. SPIE 3677, 159–168 (1999).

[CrossRef]

C. Zhou and L. Li, “Formulation of the Fourier modal method for symmetric crossed gratings in symmetric mountings,” J. Opt. A 6, 43–50 (2004).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

C. Zhou and L. Li, “Formulation of the Fourier modal method for symmetric crossed gratings in symmetric mountings,” J. Opt. A 6, 43–50 (2004).

[CrossRef]

G. Granet, “Analysis of diffraction by surface-relief crossed gratings with the use of the Chandezon method: application to multilayer crossed gratings,” J. Opt. Soc. Am. A 15, 1121–1130(1998).

[CrossRef]

L. Li, “New formulation of the Fourier modal method for crossed surface-relief gratings,” J. Opt. Soc. Am. A 14, 2758–2767(1997).

[CrossRef]

L. Li, “Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings,” J. Opt. Soc. Am. A 13, 1024–1035 (1996).

[CrossRef]

M. G. Moharam, D. A. Pommet, and E. B. Grann, “Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. A 12, 1077–1086 (1995).

[CrossRef]

E. Popov and M. Nevière, “Maxwell equations in Fourier space: fast-converging formulation for diffraction by arbitrary shaped, periodic, anisotropic media,” J. Opt. Soc. Am. A 18, 2886–2894(2001).

[CrossRef]

B. Bai and L. Li, “Group-theoretic approach to enhancing the Fourier modal method for crossed gratings with square symmetry,” J. Opt. Soc. Am. A 23, 572–580 (2006).

[CrossRef]

N. P. van der Aa and R. M. M. Mattheij, “Computing shape parameter sensitivity of the field of one-dimensional surface-relief gratings by using an analytical approach based on RCWA,” J. Opt. Soc. Am. A 24, 2692–2700 (2007).

[CrossRef]

T. Schuster, J. Ruoff, N. Kerwien, S. Raffler, and W. Osten, “Normal vector method for convergence improvement using the RCWA for crossed gratings,” J. Opt. Soc. Am. A 24, 2880–2890 (2007).

[CrossRef]

J. Bischoff, “Formulation of the normal vector RCWA for symmetric crossed gratings in symmetric mountings,” J. Opt. Soc. Am. A 27, pp. 1024–1031 (2010).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. B 15, 361–368 (1997).

[CrossRef]

C. J. Raymond, S. S. H. Naqvi, and J. R. McNeil, “Resist and etched line profile characterization using scatterometry,” Proc. SPIE 3050, 476–486 (1997).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, “Specular spectroscopic scatterometry in DUV lithography,” Proc. SPIE 3677, 159–168 (1999).

[CrossRef]

J. Bischoff, K. Hehl, X. Niu, and W. Jin, “Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer,” U.S. Patent 7,630,873 (8 December 2009).

E. J. Hinch, Perturbation Methods, Cambridge Texts in Applied Mathematics (Cambridge University, 1992).