Abstract

Far-field multicolor patterns and characters are emitted effectively in a relatively wide and deep spatial region by plastic diffractive micro-optics elements (DMOEs), which are illuminated directly by common Gaussian lasers in the visible range. Phase-only DMOEs are composed of a large number of fine step-shaped phase microstructures distributed sequentially over the plastic wafer selected. The initial DMOEs in silicon wafer are fabricated by an innovative technique with a combination of a single-mask ultraviolet photolithography and low-cost and rapid wet KOH etching. The fabricated silicon DMOEs are further converted into a nickel mask by the conventional electrochemical method, and they are finally transferred onto the surface of the plastic wafer through mature hot embossing. Morphological measurements show that the surface roughness of the plastic DMOEs is in the nanometer range, and the feature height of the phase steps in diffractive elements is in the submicrometer scale, which can be designed and adjusted flexibly according to requirements. The dimensions of the DMOEs can be changed from the order of millimeters to centimeters. A large number of pixel phase microstructures with a square microappearance employed to construct the phase-only DMOEs are created by the Gerchberg–Saxton algorithm, according to the target patterns and characters and common Gaussian lasers manipulated by the DMOEs fabricated.

© 2011 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
Alignment method combining interference lithography with anisotropic wet etch technique for fabrication of high aspect ratio silicon gratings

Yanchang Zheng, Keqiang Qiu, Huoyao Chen, Yong Chen, Zhengkun Liu, Ying Liu, Xiangdong Xu, and Yilin Hong
Opt. Express 22(19) 23592-23604 (2014)

Semiellipsoid microlens fabrication method using UV proximity printing

Chien-Hsin Hung, Shih-Yu Hung, Ming-Ho Shen, and Hsiharng Yang
Appl. Opt. 51(8) 1122-1130 (2012)

Maskless lithography using silicon oxide etch-stop layer induced by megahertz repetition femtosecond laser pulses

Amirkianoosh Kiani, Krishnan Venkatakrishnan, Bo Tan, and Venkat Venkataramanan
Opt. Express 19(11) 10834-10842 (2011)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (8)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Tables (1)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (6)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription