Abstract

A promising maskless surface-plasmon-interference nanoscale lithographic technique is proposed and demonstrated experimentally in this paper. One-dimensional (grating-type) and two-dimensional (pillar-type) nanocale features were patterned on the photoresist layer using a 364nm illumination wavelength source with a single exposure, by employing a custom-made prism layer configuration. Large-area patterns of grating lines and pillars with feature size 90nm were realized experimentally using this configuration.

© 2009 Optical Society of America

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