Abstract

The ability to improve the limited resolving power of optical imaging systems while approaching the theoretical diffraction limit has been an attractive discipline with growing interest over the last years due to its benefits in many applied optics systems. This paper presents a new approach to achieve transverse superresolution in far-field imaging systems, with direct application in both digital microscopy and digital holographic microscopy. Theoretical analysis and computer simulations show the validity of the presented approach.

© 2008 Optical Society of America

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