A. Talneau, L. Gouezigou, N. Bouadma, M. Kafesaki, C. M. Soukoulis, M. Agio, “Photonic-crystal ultrashort bends with improved transmission and low reflection at 1.55 μm,” Appl. Phys. Lett. 80, 547–549 (2002).

M. A. Kaliteevski, J. M. Martinez, D. Cassagne, J. P. Albert, “Appearance of photonic minibands in disordered photonic crystals,” J. Phys. Condens. Matter 15, 785–790 (2003).

T. Baba, N. Fukaya, J. Yonekura, “Observation of light propagation in photonic crystal optical waveguides with bends,” Electron. Lett. 35, 654–655 (1999).

C. A. Balanis, Advanced Engineering Electromagnetics (Wiley, New York, 1989), pp. 28–32.

S. C. Kitson, W. L. Barnes, J. R. Sambles, “The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry,” IEEE Photonics Technol. Lett. 8, 1662–1664 (1996).

[Crossref]

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

A. Talneau, L. Gouezigou, N. Bouadma, M. Kafesaki, C. M. Soukoulis, M. Agio, “Photonic-crystal ultrashort bends with improved transmission and low reflection at 1.55 μm,” Appl. Phys. Lett. 80, 547–549 (2002).

C. Xiaolan, S. H. Zaidi, S. R. J. Brueck, “Multiple exposure interference lithography—a novel approach to nanometer structures,” in Conference on Lasers and Electro-Optics, Vol. 9 of 1996 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1996), pp. 390–391.

S. D. Burns, G. M. Schmid, P. C. Tsiartas, C. G. Willson, L. Flanagin, “Advancements to the critical ionization dissolution model,” J. Vac. Sci. Technol. B 20, 537–543 (2002).

[Crossref]

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

K. Busch, S. John, “Photonic band gap formation in certain self-organizing systems,” Phys. Rev. E 58, 3896–3908 (1998).

[Crossref]

L. Z. Cai, X. L. Yang, Y. R. Wang, “All fourteen Bravais lattices can be formed by interference of four noncoplanar beams,” Opt. Lett. 27, 900–902 (2002).

[Crossref]

L. Z. Cai, X. L. Yang, Y. R. Wang, “Formation of three-dimensional periodic microstructures by interference of four noncoplanar beams,” J. Opt. Soc. Am. A 19, 2238–2244 (2002).

[Crossref]

M. A. Kaliteevski, J. M. Martinez, D. Cassagne, J. P. Albert, “Appearance of photonic minibands in disordered photonic crystals,” J. Phys. Condens. Matter 15, 785–790 (2003).

C. Cuisin, A. Chelnokov, J. M. Lourtioz, D. Decanini, Y. Chen, “Fabrication of three-dimensional photonic crystal structures with submicrometer resolution by x-ray lithography,” J. Vac. Sci. Technol. B 18, 3505–3509 (2000).

A. Mekis, J. C. Chen, I. Kurland, S. Fan, P. R. Villeneuve, J. D. Joannopoulos, “High transmission through sharp bends in photonic crystal waveguides,” Phys. Rev. Lett. 77, 3787–3790 (1996).

[PubMed]

C. Cuisin, A. Chelnokov, J. M. Lourtioz, D. Decanini, Y. Chen, “Fabrication of three-dimensional photonic crystal structures with submicrometer resolution by x-ray lithography,” J. Vac. Sci. Technol. B 18, 3505–3509 (2000).

D. R. Solli, C. F. McCormick, R. Y. Chiao, J. M. Hickmann, “Experimental observation of superluminal group velocities in bulk two-dimensional photonic bandgap crystals,” IEEE J. Sel. Top. Quantum Electron. 9, 40–42 (2003).

I. S. Maksymov, G. I. Churyumov, “2D computer modeling of waveguiding in 2D photonic crystals,” in Proceedings of Fourth Laser and Fiber Optical Networks Modeling Conference (Institute of Electrical and Electronics Engineers, New York, 2002), pp. 181–184.

J. M. Shaw, J. D. Gelorme, N. C. LaBianca, W. E. Conley, S. J. Holmes, “Negative photoresists for optical lithography,” IBM J. Res. Dev. 41, 81–94 (1997).

[Crossref]

C. Cuisin, A. Chelnokov, J. M. Lourtioz, D. Decanini, Y. Chen, “Fabrication of three-dimensional photonic crystal structures with submicrometer resolution by x-ray lithography,” J. Vac. Sci. Technol. B 18, 3505–3509 (2000).

C. Cuisin, A. Chelnokov, J. M. Lourtioz, D. Decanini, Y. Chen, “Fabrication of three-dimensional photonic crystal structures with submicrometer resolution by x-ray lithography,” J. Vac. Sci. Technol. B 18, 3505–3509 (2000).

B. Denecker, F. Olyslager, D. Zutter, L. Klinkenbusch, L. Knockaert, “Efficient analysis of photonic crystal structures using a novel FDTD-technique,” IEEE Trans. Antennas Propag. 4, 344–347 (2002).

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

S. Dey, R. Mittra, “A conformal finite-difference time-domain technique for modeling cylindrical dielectric resonators,” IEEE Trans. Microwave Theory Tech. 47, 1737–1739 (1999).

[Crossref]

S. Dey, R. Mittra, “A locally conformal finite-difference time-domain algorithm for modeling three-dimensional perfectly conducting objects,” IEEE Microwave Guid. Wave Lett. 7, 273–275 (1997).

[Crossref]

S. Dey, R. Mittra, “A modified locally conformal finite-difference time-domain algorithm for modeling three-dimensional perfectly conducting objects,” IEEE Microwave Opt. Tech. Lett. 17, 349–352 (1997).

[Crossref]

F. H. Dill, A. R. Neureuther, J. A. Tuttle, E. J. Walker, “Modeling projection printing of positive photoresists,” IEEE Trans. Electron Devices 22, 456–464 (1975).

[Crossref]

M. J. A. Dood, A. Polman, J. G. Fleming, “Modified spontaneous emission from erbium-doped, photonic, layer-by-layer crystals,” Phys. Rev. B 67, 115106 (2003).

R. E. Jewett, P. I. Hagouel, A. R. Neureuther, T. Duzer, “Line-profile resist development simulation techniques,” Polym. Eng. Sci. 17, 381–384 (1977).

[Crossref]

Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama, N. Nomura, “Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system),” IEEE Trans. Comput.-Aided Des. 10, 802–807 (1991).

[Crossref]

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

A. Erdmann, N. Kachwala, “Enhancements in rigorous simulation of light diffraction from phase shift masks,” in Optical Microlithography XV, A. Yen, ed., Proc. SPIE4691, 1156–1167 (2002).

[Crossref]

A. Erdmann, C. Kalus, T. Schmoller, A. Wolter, “Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques,” in Emerging Lithographic Technologies VII, R. L. Engelstad, ed., Proc. SPIE5037, 482–493 (2003).

[Crossref]

A. Erdmann, W. Henke, S. Robertson, E. Richter, B. Tollkuhn, W. Hoppe, “Comparison of simulation approaches for chemically amplified resists,” in Lithography for Semiconductor Manufacturing II, C. A. Mack, T. Stevenson, eds., Proc. SPIE4404, 99–110 (2001).

[Crossref]

A. Vial, A. Erdmann, T. Schmoeller, C. Kalus, “Modification of boundary conditions in the FDTD algorithm for EUV masks modeling,” in Photomask and Next-Generation Lithography Mask Technology IX, H. Kawahira, ed., Proc. SPIE4754, 890–899 (2002).

[Crossref]

A. Mekis, J. C. Chen, I. Kurland, S. Fan, P. R. Villeneuve, J. D. Joannopoulos, “High transmission through sharp bends in photonic crystal waveguides,” Phys. Rev. Lett. 77, 3787–3790 (1996).

[PubMed]

S. Fan, P. R. Villeneuve, J. D. Joannopoulos, “Theoretical investigation of fabrication-related disorder on the properties of photonic crystals,” J. Appl. Phys. 78, 1415–1418 (1995).

[Crossref]

S. D. Burns, G. M. Schmid, P. C. Tsiartas, C. G. Willson, L. Flanagin, “Advancements to the critical ionization dissolution model,” J. Vac. Sci. Technol. B 20, 537–543 (2002).

[Crossref]

M. J. A. Dood, A. Polman, J. G. Fleming, “Modified spontaneous emission from erbium-doped, photonic, layer-by-layer crystals,” Phys. Rev. B 67, 115106 (2003).

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

T. Baba, N. Fukaya, J. Yonekura, “Observation of light propagation in photonic crystal optical waveguides with bends,” Electron. Lett. 35, 654–655 (1999).

J. M. Shaw, J. D. Gelorme, N. C. LaBianca, W. E. Conley, S. J. Holmes, “Negative photoresists for optical lithography,” IBM J. Res. Dev. 41, 81–94 (1997).

[Crossref]

A. Talneau, L. Gouezigou, N. Bouadma, M. Kafesaki, C. M. Soukoulis, M. Agio, “Photonic-crystal ultrashort bends with improved transmission and low reflection at 1.55 μm,” Appl. Phys. Lett. 80, 547–549 (2002).

A. Taflove, S. C. Hagness, Computational Electrodynamics: the Finite-Difference Time-Domain Method, 2nd ed. (Artech House, Norwood, Mass., 2000).

I. Karafyllidis, P. I. Hagouel, A. Thanailakis, A. R. Neureuther, “An efficient photoresist development simulator based on cellular automata with experimental verification,” IEEE Trans. Semicond. Manuf. 13, 61–75 (2000).

[Crossref]

R. E. Jewett, P. I. Hagouel, A. R. Neureuther, T. Duzer, “Line-profile resist development simulation techniques,” Polym. Eng. Sci. 17, 381–384 (1977).

[Crossref]

Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama, N. Nomura, “Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system),” IEEE Trans. Comput.-Aided Des. 10, 802–807 (1991).

[Crossref]

A. Erdmann, W. Henke, S. Robertson, E. Richter, B. Tollkuhn, W. Hoppe, “Comparison of simulation approaches for chemically amplified resists,” in Lithography for Semiconductor Manufacturing II, C. A. Mack, T. Stevenson, eds., Proc. SPIE4404, 99–110 (2001).

[Crossref]

D. R. Solli, C. F. McCormick, R. Y. Chiao, J. M. Hickmann, “Experimental observation of superluminal group velocities in bulk two-dimensional photonic bandgap crystals,” IEEE J. Sel. Top. Quantum Electron. 9, 40–42 (2003).

Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama, N. Nomura, “Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system),” IEEE Trans. Comput.-Aided Des. 10, 802–807 (1991).

[Crossref]

J. M. Shaw, J. D. Gelorme, N. C. LaBianca, W. E. Conley, S. J. Holmes, “Negative photoresists for optical lithography,” IBM J. Res. Dev. 41, 81–94 (1997).

[Crossref]

A. Erdmann, W. Henke, S. Robertson, E. Richter, B. Tollkuhn, W. Hoppe, “Comparison of simulation approaches for chemically amplified resists,” in Lithography for Semiconductor Manufacturing II, C. A. Mack, T. Stevenson, eds., Proc. SPIE4404, 99–110 (2001).

[Crossref]

S. Robertson, E. Pavelchek, W. Hoppe, R. Wildfeuer, “Improved notch model for resist dissolution in lithography simulation,” in Advances in Resist Technology and Processing XVIII, F. M. Houlihan, ed., Proc. SPIE4345, 912–920 (2001).

[Crossref]

Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama, N. Nomura, “Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system),” IEEE Trans. Comput.-Aided Des. 10, 802–807 (1991).

[Crossref]

Y. Ono, K. Ikemoto, “Fabrication of three-dimensional photonic crystals by holographic lithography,” in Diffractive Optics and Micro-Optics, Vol. 75 of OSA Technical Digest Series (Optical Society of America, Washington, D.C., 2002), pp. 205–207.

Y. Ono, K. Ikemoto, “Fabrication of arbitrary three-dimensional photonic crystals by four plane-waves interference,” in Micromachining Technology for Micro-optics and Nano-optics, E. G. Johnson, ed., Proc. SPIE4984, 70–78 (2003).

[Crossref]

R. E. Jewett, P. I. Hagouel, A. R. Neureuther, T. Duzer, “Line-profile resist development simulation techniques,” Polym. Eng. Sci. 17, 381–384 (1977).

[Crossref]

Z. Ling, K. Lian, L. Jian, “Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters,” in Advances in Resist Technology and Processing XVII, F. M. Houlihan, ed., Proc. SPIE3999, 1019–1027 (2000).

[Crossref]

C. Luo, S. G. Johnson, J. D. Joannopoulos, “Negative refraction without negative index in metallic photonic crystals,” Opt. Express 11, 746–754 (2003).

[PubMed]

A. Mekis, J. C. Chen, I. Kurland, S. Fan, P. R. Villeneuve, J. D. Joannopoulos, “High transmission through sharp bends in photonic crystal waveguides,” Phys. Rev. Lett. 77, 3787–3790 (1996).

[PubMed]

S. Fan, P. R. Villeneuve, J. D. Joannopoulos, “Theoretical investigation of fabrication-related disorder on the properties of photonic crystals,” J. Appl. Phys. 78, 1415–1418 (1995).

[Crossref]

K. Busch, S. John, “Photonic band gap formation in certain self-organizing systems,” Phys. Rev. E 58, 3896–3908 (1998).

[Crossref]

S. John, “Strong localization of photons in certain disordered dielectric superlattices,” Phys. Rev. Lett. 58, 2486–2489 (1987).

[PubMed]

T. J. Suleski, B. Baggett, W. F. Delaney, C. Koehler, E. G. Johnson, “Fabrication of high-spatial-frequency gratings through computer-generated near-field holography,” Opt. Lett. 24, 602–604 (1999).

R. C. Rumpf, E. G. Johnson, “Micro-photonic systems utilizing SU-8,” in MOEMS and Miniaturized Systems IV, A. El-Fatatry, ed., Proc. SPIE5346, 64–72 (2004).

[Crossref]

A. Erdmann, N. Kachwala, “Enhancements in rigorous simulation of light diffraction from phase shift masks,” in Optical Microlithography XV, A. Yen, ed., Proc. SPIE4691, 1156–1167 (2002).

[Crossref]

A. Talneau, L. Gouezigou, N. Bouadma, M. Kafesaki, C. M. Soukoulis, M. Agio, “Photonic-crystal ultrashort bends with improved transmission and low reflection at 1.55 μm,” Appl. Phys. Lett. 80, 547–549 (2002).

M. A. Kaliteevski, J. M. Martinez, D. Cassagne, J. P. Albert, “Appearance of photonic minibands in disordered photonic crystals,” J. Phys. Condens. Matter 15, 785–790 (2003).

A. Erdmann, C. Kalus, T. Schmoller, A. Wolter, “Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques,” in Emerging Lithographic Technologies VII, R. L. Engelstad, ed., Proc. SPIE5037, 482–493 (2003).

[Crossref]

A. Vial, A. Erdmann, T. Schmoeller, C. Kalus, “Modification of boundary conditions in the FDTD algorithm for EUV masks modeling,” in Photomask and Next-Generation Lithography Mask Technology IX, H. Kawahira, ed., Proc. SPIE4754, 890–899 (2002).

[Crossref]

J. Malov, C. K. Kalus, H. Mullerke, T. Schmoller, R. Wildfeuer, “Accuracy of new analytical models for resist formation lithography,” in Optical Microlithography XV, A. Yen, ed., Proc. SPIE4691, 1254–1265 (2002).

[Crossref]

I. Karafyllidis, P. I. Hagouel, A. Thanailakis, A. R. Neureuther, “An efficient photoresist development simulator based on cellular automata with experimental verification,” IEEE Trans. Semicond. Manuf. 13, 61–75 (2000).

[Crossref]

S. C. Kitson, W. L. Barnes, J. R. Sambles, “The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry,” IEEE Photonics Technol. Lett. 8, 1662–1664 (1996).

[Crossref]

B. Denecker, F. Olyslager, D. Zutter, L. Klinkenbusch, L. Knockaert, “Efficient analysis of photonic crystal structures using a novel FDTD-technique,” IEEE Trans. Antennas Propag. 4, 344–347 (2002).

B. Denecker, F. Olyslager, D. Zutter, L. Klinkenbusch, L. Knockaert, “Efficient analysis of photonic crystal structures using a novel FDTD-technique,” IEEE Trans. Antennas Propag. 4, 344–347 (2002).

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

A. Mekis, J. C. Chen, I. Kurland, S. Fan, P. R. Villeneuve, J. D. Joannopoulos, “High transmission through sharp bends in photonic crystal waveguides,” Phys. Rev. Lett. 77, 3787–3790 (1996).

[PubMed]

J. M. Shaw, J. D. Gelorme, N. C. LaBianca, W. E. Conley, S. J. Holmes, “Negative photoresists for optical lithography,” IBM J. Res. Dev. 41, 81–94 (1997).

[Crossref]

Z. Ling, K. Lian, L. Jian, “Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters,” in Advances in Resist Technology and Processing XVII, F. M. Houlihan, ed., Proc. SPIE3999, 1019–1027 (2000).

[Crossref]

Z. Ling, K. Lian, L. Jian, “Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters,” in Advances in Resist Technology and Processing XVII, F. M. Houlihan, ed., Proc. SPIE3999, 1019–1027 (2000).

[Crossref]

C. Cuisin, A. Chelnokov, J. M. Lourtioz, D. Decanini, Y. Chen, “Fabrication of three-dimensional photonic crystal structures with submicrometer resolution by x-ray lithography,” J. Vac. Sci. Technol. B 18, 3505–3509 (2000).

I. S. Maksymov, G. I. Churyumov, “2D computer modeling of waveguiding in 2D photonic crystals,” in Proceedings of Fourth Laser and Fiber Optical Networks Modeling Conference (Institute of Electrical and Electronics Engineers, New York, 2002), pp. 181–184.

J. Malov, C. K. Kalus, H. Mullerke, T. Schmoller, R. Wildfeuer, “Accuracy of new analytical models for resist formation lithography,” in Optical Microlithography XV, A. Yen, ed., Proc. SPIE4691, 1254–1265 (2002).

[Crossref]

J. G. Proakis, D. G. Manolakis, Digital Signal Processing (Prentice Hall, Englewood Cliffs, N.J., 1996), pp. 425–433.

M. A. Kaliteevski, J. M. Martinez, D. Cassagne, J. P. Albert, “Appearance of photonic minibands in disordered photonic crystals,” J. Phys. Condens. Matter 15, 785–790 (2003).

D. R. Solli, C. F. McCormick, R. Y. Chiao, J. M. Hickmann, “Experimental observation of superluminal group velocities in bulk two-dimensional photonic bandgap crystals,” IEEE J. Sel. Top. Quantum Electron. 9, 40–42 (2003).

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

A. Mekis, J. C. Chen, I. Kurland, S. Fan, P. R. Villeneuve, J. D. Joannopoulos, “High transmission through sharp bends in photonic crystal waveguides,” Phys. Rev. Lett. 77, 3787–3790 (1996).

[PubMed]

Y. V. Miklyaev, D. C. Meisel, A. Blanco, G. Freymann, K. Busch, W. Kock, C. Enkrich, M. Deubel, M. Wegener, “Three-dimensional face-centered-cubic photonic crystal templates by laser holography: fabrication, optical characterization, and band-structure calculations,” Appl. Phys. Lett. 82, 1284–1286 (2003).

S. Dey, R. Mittra, “A conformal finite-difference time-domain technique for modeling cylindrical dielectric resonators,” IEEE Trans. Microwave Theory Tech. 47, 1737–1739 (1999).

[Crossref]

S. Dey, R. Mittra, “A modified locally conformal finite-difference time-domain algorithm for modeling three-dimensional perfectly conducting objects,” IEEE Microwave Opt. Tech. Lett. 17, 349–352 (1997).

[Crossref]

S. Dey, R. Mittra, “A locally conformal finite-difference time-domain algorithm for modeling three-dimensional perfectly conducting objects,” IEEE Microwave Guid. Wave Lett. 7, 273–275 (1997).

[Crossref]

J. Malov, C. K. Kalus, H. Mullerke, T. Schmoller, R. Wildfeuer, “Accuracy of new analytical models for resist formation lithography,” in Optical Microlithography XV, A. Yen, ed., Proc. SPIE4691, 1254–1265 (2002).

[Crossref]

I. Karafyllidis, P. I. Hagouel, A. Thanailakis, A. R. Neureuther, “An efficient photoresist development simulator based on cellular automata with experimental verification,” IEEE Trans. Semicond. Manuf. 13, 61–75 (2000).

[Crossref]

E. W. Scheckler, N. N. Tam, A. K. Pfau, A. R. Neureuther, “An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification,” IEEE Trans. Comput.-Aided Des. 12, 1345–1356 (1993).

[Crossref]

R. E. Jewett, P. I. Hagouel, A. R. Neureuther, T. Duzer, “Line-profile resist development simulation techniques,” Polym. Eng. Sci. 17, 381–384 (1977).

[Crossref]

F. H. Dill, A. R. Neureuther, J. A. Tuttle, E. J. Walker, “Modeling projection printing of positive photoresists,” IEEE Trans. Electron Devices 22, 456–464 (1975).

[Crossref]

Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama, N. Nomura, “Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system),” IEEE Trans. Comput.-Aided Des. 10, 802–807 (1991).

[Crossref]

B. Denecker, F. Olyslager, D. Zutter, L. Klinkenbusch, L. Knockaert, “Efficient analysis of photonic crystal structures using a novel FDTD-technique,” IEEE Trans. Antennas Propag. 4, 344–347 (2002).

Y. Ono, K. Ikemoto, “Fabrication of three-dimensional photonic crystals by holographic lithography,” in Diffractive Optics and Micro-Optics, Vol. 75 of OSA Technical Digest Series (Optical Society of America, Washington, D.C., 2002), pp. 205–207.

Y. Ono, K. Ikemoto, “Fabrication of arbitrary three-dimensional photonic crystals by four plane-waves interference,” in Micromachining Technology for Micro-optics and Nano-optics, E. G. Johnson, ed., Proc. SPIE4984, 70–78 (2003).

[Crossref]

S. Robertson, E. Pavelchek, W. Hoppe, R. Wildfeuer, “Improved notch model for resist dissolution in lithography simulation,” in Advances in Resist Technology and Processing XVIII, F. M. Houlihan, ed., Proc. SPIE4345, 912–920 (2001).

[Crossref]

E. W. Scheckler, N. N. Tam, A. K. Pfau, A. R. Neureuther, “An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification,” IEEE Trans. Comput.-Aided Des. 12, 1345–1356 (1993).

[Crossref]

M. J. A. Dood, A. Polman, J. G. Fleming, “Modified spontaneous emission from erbium-doped, photonic, layer-by-layer crystals,” Phys. Rev. B 67, 115106 (2003).

J. G. Proakis, D. G. Manolakis, Digital Signal Processing (Prentice Hall, Englewood Cliffs, N.J., 1996), pp. 425–433.

A. Erdmann, W. Henke, S. Robertson, E. Richter, B. Tollkuhn, W. Hoppe, “Comparison of simulation approaches for chemically amplified resists,” in Lithography for Semiconductor Manufacturing II, C. A. Mack, T. Stevenson, eds., Proc. SPIE4404, 99–110 (2001).

[Crossref]

R. M. Ridder, R. Stoffer, “Finite-difference time-domain modeling of photonic crystal structures,” in Proceedings of 2001 Third International Conference on Transparent Optical Networks (Institute of Electrical and Electronics Engineers, New York, 2001), pp. 22–25.

S. Robertson, E. Pavelchek, W. Hoppe, R. Wildfeuer, “Improved notch model for resist dissolution in lithography simulation,” in Advances in Resist Technology and Processing XVIII, F. M. Houlihan, ed., Proc. SPIE4345, 912–920 (2001).

[Crossref]

A. Erdmann, W. Henke, S. Robertson, E. Richter, B. Tollkuhn, W. Hoppe, “Comparison of simulation approaches for chemically amplified resists,” in Lithography for Semiconductor Manufacturing II, C. A. Mack, T. Stevenson, eds., Proc. SPIE4404, 99–110 (2001).

[Crossref]

R. C. Rumpf, E. G. Johnson, “Micro-photonic systems utilizing SU-8,” in MOEMS and Miniaturized Systems IV, A. El-Fatatry, ed., Proc. SPIE5346, 64–72 (2004).

[Crossref]

S. C. Kitson, W. L. Barnes, J. R. Sambles, “The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry,” IEEE Photonics Technol. Lett. 8, 1662–1664 (1996).

[Crossref]

Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama, N. Nomura, “Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system),” IEEE Trans. Comput.-Aided Des. 10, 802–807 (1991).

[Crossref]

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[Crossref]

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