Abstract

A new, rigorous model for solving three-dimensional light-scattering problems in the optical lithography process of semiconductor manufacturing is introduced. The new model employs a hybrid approach to solve Maxwell’s equations in the spatial frequency domain with the use of vector potentials. The model extends a successful two-dimensional lithography model and has been applied to the simulation of the patterning of light by three-dimensional (3-D) photomasks. The theory behind the new model is presented, and examples are given of the model’s results and computational efficiency on an engineering workstation. The efficiency is highest for fully symmetric structures where the paraxial partial-coherence approximation is valid. The model can easily be extended to the efficient simulation of light scattering in 3-D optical alignment and photosensitive polymer problems.

© 1996 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
Finite-element model for three-dimensional optical scattering problems

Xiuhong Wei, Arthur J. Wachters, and H. Paul Urbach
J. Opt. Soc. Am. A 24(3) 866-881 (2007)

Efficient representation of mask transmittance functions for vectorial lithography simulations

Xinjiang Zhou, Chuanwei Zhang, Hao Jiang, Haiqing Wei, and Shiyuan Liu
J. Opt. Soc. Am. A 31(12) B10-B18 (2014)

Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography

Raymond C. Rumpf and Eric G. Johnson
J. Opt. Soc. Am. A 21(9) 1703-1713 (2004)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (11)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Tables (1)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (116)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription