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K. Edee, P. Schiavone, and G. Granet, “Analysis of defect in extreme UV lithography mask using a modal method based on nodal B-spline expansion,” Jpn. J. Appl. Phys. 44, 6458–6462 (2005).

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[CrossRef]

J. Schuller, E. Barnard, W. Cai, Y. Jun, J. White, and M. Brongersma, “Plasmonics for extreme light concentration and manipulation,” Nat. Mater. 9, 193–204 (2010).

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