Abstract

A considerable index-of-refraction modulation effect was found to occur in a negative photoresist when molecular-mass-diffusion is facilitated. This resist may then be used either as an autodeveloping index-modulation recording material, or as a surface-modulation recording material or both, depending on the procedure utilized for recording and developing. Surface and index modulation are studied in a thin resist film by recording a 100 l/mm grating on it and measuring its diffraction spectrum. An approximative though simple method for analyzing this spectrum used in finding out the corresponding grating transmission phase modulation is briefly exposed.

© 1977 Optical Society of America

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