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Ultrahigh-Vacuum Measurement of the Optical Properties of Copper

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Abstract

An ultrahigh-vacuum system has been designed and built in which metallic films may be evaporated and their optical properties measured in situ. This system has been used in the formation of copper films and the study of their aging histories. A control sample formed and held at 10−5 Torr displayed a relatively constant value for the dielectric constant with time. Samples held at 10−8 Torr showed a sharp decrease in this parameter during the first 5 h after evaporation.

© 1964 Optical Society of America

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