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Determination of the Properties of Films on Silicon by the Method of Ellipsometry

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Abstract

The use of exact reflection theory to interpret data allows the application of ellipsometry to the determination of the thicknesses and optical constants of surface films without the thickness limitations of approximate theory. Ellipsometer measurements as a function of the thicknesses and optical constants of a variety of different films on silicon substantiate the predictions of exact theory and yield the properties of the films.

© 1962 Optical Society of America

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