Evaporated metal layers with a high uniformity may be obtained by using a system of parallel wires as evaporation source. The distribution of the film thickness is discussed for a simple system of two parallel wires. If the two wires are properly spaced with respect to the receiving surface a maximally flat distribution of film thickness may be obtained. A special example of a system with 12 parallel wires is treated in detail. The method has been used for producing thin films for precision microwave attenuators as well as for semitransparent and dissipative devices in the microwave range.
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