Abstract

Evaporated metal layers with a high uniformity may be obtained by using a system of parallel wires as evaporation source. The distribution of the film thickness is discussed for a simple system of two parallel wires. If the two wires are properly spaced with respect to the receiving surface a maximally flat distribution of film thickness may be obtained. A special example of a system with 12 parallel wires is treated in detail. The method has been used for producing thin films for precision microwave attenuators as well as for semi-transparent and dissipative devices in the microwave range.

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