Abstract

A unit magnification system is described which is free from Seidel aberrations and which can be used at very high aperture. The leading higher order aberrations are derived.

A method using this system for reproducing photographically small groups of lines with a spacing of 6000 lines/in. is described.

Several other possible applications of the system are outlined.

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References

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  1. C. R. Burch, Proc. Phys. Soc. (London) 59, 41โ€“6 (1947).

Burch, C. R.

C. R. Burch, Proc. Phys. Soc. (London) 59, 41โ€“6 (1947).

Other (1)

C. R. Burch, Proc. Phys. Soc. (London) 59, 41โ€“6 (1947).

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