Abstract

A unit magnification system is described which is free from Seidel aberrations and which can be used at very high aperture. The leading higher order aberrations are derived.

A method using this system for reproducing photographically small groups of lines with a spacing of 6000 lines/in. is described.

Several other possible applications of the system are outlined.

© 1959 Optical Society of America

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References

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  1. C. R. Burch, Proc. Phys. Soc. (London) 59, 41–6 (1947).
    [Crossref]

1947 (1)

C. R. Burch, Proc. Phys. Soc. (London) 59, 41–6 (1947).
[Crossref]

Burch, C. R.

C. R. Burch, Proc. Phys. Soc. (London) 59, 41–6 (1947).
[Crossref]

Proc. Phys. Soc. (London) (1)

C. R. Burch, Proc. Phys. Soc. (London) 59, 41–6 (1947).
[Crossref]

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Figures (3)

F. 1
F. 1

Unit magnification system with ray paths.

F. 2
F. 2

Ray paths near the image plane.

F. 3
F. 3

6000 line/in. grating, photographed on Kodak “maximun resolution” plate in white light. The black and white lines were of equal width on the original.

Equations (10)

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R / r = μ / ( μ 1 ) .
θ = μ ( μ 1 ) h 3 / r 3 .
x = h / cos α ,
d x = h sin α d α cos 2 α .
d x = μ ( μ 1 ) h 4 sin α r 3 cos 2 α ,
d x = μ ( μ 1 ) x 4 sin α cos 2 α r 3 .
s = μ ( μ 1 ) x 4 cos 3 α r 3 .
s = μ ( μ 1 ) x 4 r 3 ( 1 3 α 2 2 + ) .
P a = μ 2 ( μ 1 ) x 4 r 3 ( α 2 2 3 α 4 8 + ) .
R tchr = μ r / ( 4 d μ ) ,