Abstract

A considerable index-of-refraction modulation effect was found to occur in a negative photoresist when molecular-mass-diffusion is facilitated. This resist may then be used either as an autodeveloping indexmodulation recording material, or as a surface-modulation recording material or both, depending on the procedure utilized for recording and developing. Surface and index modulation are studied in a thin resist film by recording a 100 <i>I</i>/mm grating on it and measuring its diffraction spectrum. An approximative though simple method for analyzing this spectrum used in finding out the corresponding grating transmission phase modulation is briefly exposed.

© 1978 Optical Society of America

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  1. W. S. Colburn and K. A. Haines, "Volume Hologram Formation in Photopolymer Materials," Appl. Opt. 10, 1636 (1971).
  2. R. Wopschall and T. Pampalone, "Dry Photopolymer Film for Recording Holograms," Appl. Opt. 11, 2096 (1972).
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  5. J. J. Clair, J. Frejlich, J. M. Jonathan, and L. H. Torres, "Negative Photoresists and Integrated Optics, " Nouv. Rev. Opt. 6, 303 (1975).
  6. J. J. Clair, J. Frejlich, J. M. Jonathan, J. M. Van Haecke, and J. Rosiu in "Proceedings of the Electro-optics/Laser Interactional '76 UK Conference" (IPC Science and Technology Press, London, 1976).
  7. J. Frejlich and J. J. Clair, "A simple mathematical model for negative photoresist behavior," J. Opt. Soc. Am. 67, 92 (1977).
  8. In fact, some very slight index modulation appeared before developing, even when mass diffusion was not facilitated.
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  10. W. J. Tomlinson, E. W. Chandross, H. P. Weber, and G. D. Aumiller, "Multicomponent Photopolymer Systems for Volume Phase Holograms and Grating Devices," Appl. Opt. 15, 534 (1976).
  11. J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill, New York, 1968), pp. 69–70.

1977

1976

1975

B. Booth, "Photopolymer Material for Holography," Appl. Opt. 14, 593 (1975).

J. J. Clair, J. Frejlich, J. M. Jonathan, and L. H. Torres, "Negative Photoresists and Integrated Optics, " Nouv. Rev. Opt. 6, 303 (1975).

1972

1971

1970

Aumiller, G. D.

Booth, B.

Chandross, E. W.

Clair, J. J.

J. Frejlich and J. J. Clair, "A simple mathematical model for negative photoresist behavior," J. Opt. Soc. Am. 67, 92 (1977).

J. J. Clair, J. Frejlich, J. M. Jonathan, and L. H. Torres, "Negative Photoresists and Integrated Optics, " Nouv. Rev. Opt. 6, 303 (1975).

J. J. Clair, J. Frejlich, J. M. Jonathan, J. M. Van Haecke, and J. Rosiu in "Proceedings of the Electro-optics/Laser Interactional '76 UK Conference" (IPC Science and Technology Press, London, 1976).

Colburn, W. S.

Frejlich, J.

J. Frejlich and J. J. Clair, "A simple mathematical model for negative photoresist behavior," J. Opt. Soc. Am. 67, 92 (1977).

J. J. Clair, J. Frejlich, J. M. Jonathan, and L. H. Torres, "Negative Photoresists and Integrated Optics, " Nouv. Rev. Opt. 6, 303 (1975).

J. J. Clair, J. Frejlich, J. M. Jonathan, J. M. Van Haecke, and J. Rosiu in "Proceedings of the Electro-optics/Laser Interactional '76 UK Conference" (IPC Science and Technology Press, London, 1976).

Friesem, A. A.

Goodman, J. W.

J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill, New York, 1968), pp. 69–70.

Haines, K. A.

Jenney, J.

Jonathan, J. M.

J. J. Clair, J. Frejlich, J. M. Jonathan, and L. H. Torres, "Negative Photoresists and Integrated Optics, " Nouv. Rev. Opt. 6, 303 (1975).

J. J. Clair, J. Frejlich, J. M. Jonathan, J. M. Van Haecke, and J. Rosiu in "Proceedings of the Electro-optics/Laser Interactional '76 UK Conference" (IPC Science and Technology Press, London, 1976).

Pampalone, T.

Rav-Noy, Z.

Reich, S.

Rosiu, J.

J. J. Clair, J. Frejlich, J. M. Jonathan, J. M. Van Haecke, and J. Rosiu in "Proceedings of the Electro-optics/Laser Interactional '76 UK Conference" (IPC Science and Technology Press, London, 1976).

Tomlinson, W. J.

Torres, L. H.

J. J. Clair, J. Frejlich, J. M. Jonathan, and L. H. Torres, "Negative Photoresists and Integrated Optics, " Nouv. Rev. Opt. 6, 303 (1975).

Van Haecke, J. M.

J. J. Clair, J. Frejlich, J. M. Jonathan, J. M. Van Haecke, and J. Rosiu in "Proceedings of the Electro-optics/Laser Interactional '76 UK Conference" (IPC Science and Technology Press, London, 1976).

Weber, H. P.

Wopschall, R.

Appl. Opt.

J. Opt. Soc. Am.

Nouv. Rev. Opt.

J. J. Clair, J. Frejlich, J. M. Jonathan, and L. H. Torres, "Negative Photoresists and Integrated Optics, " Nouv. Rev. Opt. 6, 303 (1975).

Other

J. J. Clair, J. Frejlich, J. M. Jonathan, J. M. Van Haecke, and J. Rosiu in "Proceedings of the Electro-optics/Laser Interactional '76 UK Conference" (IPC Science and Technology Press, London, 1976).

In fact, some very slight index modulation appeared before developing, even when mass diffusion was not facilitated.

J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill, New York, 1968), pp. 69–70.

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