Abstract

The reflectance and optical constants of evaporated osmium films were measured in the wavelength region from 300 to 2000 Å. The films were evaporated by electron bombardment in an ion-titanium-pumped vacuum system and deposited at a rate of about 50 Å/s onto glass and super-polished quartz substrates that were at 40 and 300 °C. The optical constants were determined from reflectance measurements made at several angles of incidence. Reflectance losses during extended exposure to air were rather small, indicating that oxide films formed at room temperature are very thin. Films made on substrates at 300 °C had only slightly higher reflectances than those made at 40 °C. Owing to interference effects, semitransparent films 150–250 Å thick on glass or quartz substrates showed higher reflectances than opaque films, throughout most of the vacuum-ultraviolet region. Osmium films prepared under optimum conditions had a reflectance of 34% at 584 Å. The fact that high reflectance can be obtained with films deposited onto unheated substrates makes osmium a very useful coating material for replica gratings, which cannot be heated.

© 1973 Optical Society of America

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References

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1972 (1)

1969 (2)

1967 (1)

1966 (1)

1965 (1)

1963 (1)

1959 (1)

1951 (1)

1939 (1)

Bennett, J. M.

Canfield, L. R.

Cox, J. T.

Dietz, R. W.

Hass, G.

Hunter, W. R.

Jacobus, G. F.

Kaszynski, F.

F. Kaszynski (private communication).

Madden, R. P.

Mass, G.

Powell, C. J.

Ramsey, J. B.

Simon, I.

Tolansky, S.

S. Tolansky, Multiple Beam Interferometry of Films and Surfaces (Clarendon, Oxford, England, 1948).

Tousey, R.

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Figures (6)

F. 1
F. 1

The transmittance of evaporated Os films on glass at 5461 Å as a function of interferometrically determined film thickness for films deposited at 300 °C.

F. 2
F. 2

Os film thickness required to reduce the transmittance to 0.1%.

F. 3
F. 3

Optical constants and normal-incidence reflectance of evaporated Os.

F. 4
F. 4

Real and imaginary parts of the complex dielectric constant, = 1+2, and the electronic loss function, 2nk/ (n2+k2)2, of evaporated Os.

F. 5
F. 5

Reflectance of evaporated Os films deposited on superpolished fused-quartz substrates. Upper curve, t=170 Å; lower curve, t=580 Å.

F. 6
F. 6

Calculated reflectance of Os films on glass as a function of film thickness for various wavelengths in the vacuum ultraviolet.

Tables (2)

Tables Icon

Table I Optical constants and normal-incidence reflectance of evaporated Os deposited at 300 °C.

Tables Icon

Table II Reflectance of osmium films deposited on glass at 300 °C as a function of thickness and transmittance at 5461 Å for various wavelengths in the vacuum ultraviolet.