Abstract

We studied the photoemission process in films of amorphous Ge deposited on silica substrates. We measured, for both polarizations and for several angles of incidence, with direct and back illumination (through the substrate), the reflectance, the transmittance, and the photoemissive yield of each film without exposure to air. We analyzed the possibility of deducing with minimum error, from the experimental results, the index of refraction, the thickness, and the escape probability of photoexcited electrons and we verified the validity of the model used for computation.

© 1971 Optical Society of America

Optical Properties of Aggregated Silver Films

Sadafumi Yoshida, Tomuo Yamaguchi, and Akira Kinbara
J. Opt. Soc. Am. 61(1) 62-69 (1971)

Optical Properties of Evaporated Rhodium Films Deposited at Various Substrate Temperatures in the Vacuum Ultraviolet from 150 to 2000 Å*

J. Thomas Cox, G. Hass, and W. R. Hunter
J. Opt. Soc. Am. 61(3) 360-364 (1971)

Methods for Determining Film Thickness and Optical Constants of Films and Substrates

M. Ruiz-Urbieta, E. M. Sparrow, and E. R. G. Eckert
J. Opt. Soc. Am. 61(3) 351-359 (1971)

Changes of the Optical Properties of Aggregated Silver Films after Deposition

Sadafumi Yoshida, Tomuo Yamaguchi, and Akira Kinbara
J. Opt. Soc. Am. 61(4) 463-469 (1971)

Optical and Photoelectric Properties of Thin Metallic Films in the Vacuum Ultraviolet*

W. C. Walker, O. P. Rustgi, and G. L. Weissler
J. Opt. Soc. Am. 49(5) 471-475 (1959)