Abstract

Methods are described for measuring accurately the half-widths of frustrated total reflection niters (see reference 1) of very narrow pass bands, and for detecting extremely small non-uniformities in the spacer layers of these filters. The latter method, permitting observation and measurement of thin film non-uniformities appreciably less than one unit cell provides a very sensitive means of studying thin film structures and the mechanism of formation.

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References

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  1. P. Leurgans, and A. F. Turner, "Frustrated total reflection interference filters," J. Opt. Soc. Am. 37, 983A (1947).
  2. Harry D. Polster, J. Opt. Soc. Am. 39, 1038 (1949).

1947 (1)

P. Leurgans, and A. F. Turner, "Frustrated total reflection interference filters," J. Opt. Soc. Am. 37, 983A (1947).

Leurgans, P.

P. Leurgans, and A. F. Turner, "Frustrated total reflection interference filters," J. Opt. Soc. Am. 37, 983A (1947).

Polster, Harry D.

Harry D. Polster, J. Opt. Soc. Am. 39, 1038 (1949).

Turner, A. F.

P. Leurgans, and A. F. Turner, "Frustrated total reflection interference filters," J. Opt. Soc. Am. 37, 983A (1947).

J. Opt. Soc. Am. (1)

P. Leurgans, and A. F. Turner, "Frustrated total reflection interference filters," J. Opt. Soc. Am. 37, 983A (1947).

Other (1)

Harry D. Polster, J. Opt. Soc. Am. 39, 1038 (1949).

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