Abstract
We propose a new technique for the multiorder dispersion engineering
of nanophotonic strip waveguides. Unlike other techniques, the method does
not require wafers with customized parameters and is fully compatible with
standard wafers used in nanophotonics. The dispersion management is based
on the application of nanometer-thick TiO<sub>2</sub> layer formed by atomic layer deposition.
The method is simple and reliable and allows good control of dispersion up
to the fourth-order terms. The additional advantages are the reduction of
propagation losses and partial compensation of fabrication tolerances.
© 2012 IEEE
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