Abstract

We report on the fabrication and characterization of optical channel waveguide in <i>x</i>-cut KTiOAsO<sub>4</sub> crystal produced by photographic masking and following direct O<sup>+</sup>ion implantation at energy of 3.0 MeV and fluence of 5 × 10<sup>13</sup> ions/cm<sup>2</sup>. Positive changes of both <i>n<sub>x</sub></i> and <i>n<sub>y</sub></i> refractive indices (corresponding TM and TE polarized light respectively) in the waveguide region are responsible for light waveguiding. After annealing treatment, the propagation losses of the waveguide could be reduced to 1.2 dB/cm, exhibiting acceptable guiding properties.

© 2011 IEEE

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription