Abstract

We report on a new wet etching/ion implantation method for fabricating ridge waveguide on $z$-cut LiNbO$_{3}$. The ridge structures are produced on LiNbO$_{3}$ crystal by anisotropic wet etching via minus $z$ face. Mode guiding at wavelength of 632.8nm has been realized by using direct 4.5 MeV oxygen implantation without any implantation mask. The ridge waveguide shows a reduced propagation loss of 1.3 dB/cm after the thermal annealing process.

© 2010 IEEE

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