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Optica Publishing Group
  • Journal of Lightwave Technology
  • Vol. 28,
  • Issue 13,
  • pp. 1938-1943
  • (2010)

Submicron Etched Beam Splitters Based on Total Internal Reflection in GaAs–AlGaAs Waveguides

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Abstract

Submicron etched beam splitters are designed, fabricated and characterized in Al$_{0.9}$Ga$_{0.1}$As–GaAs waveguides. Beam splitter transmission and reflection characteristics show clear dependence on gap dimension and angle of incidence. It is possible to obtain 8 to 30% power transmission by adjusting the gap dimension and angle of incidence. The experimental results agree well with three-dimensional (3-D) finite difference time domain (FDTD) simulations. The effect of imperfections, mainly the slope of etched sidewalls and variations in etch depth are investigated using 3-D FDTD. Design guidelines for low loss etched beam splitters are also given.

© 2010 IEEE

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