Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Journal of Lightwave Technology
  • Vol. 27,
  • Issue 19,
  • pp. 4306-4310
  • (2009)

Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling

Not Accessible

Your library or personal account may give you access

Abstract

Focused-ion-beam directly milling strategy was used to fabricate photonic resonators on crystalline silicon-on-insulator substrate. In order to reduce damages such as implanting ions, amorphous layers and re-deposition process which are induced by the ions, a sacrificed silica layer was used as an etching mask and a silicon thermal oxidation process was performed. The transmission spectra of both photonic crystal cavities and micro-ring resonators were measured. The resulting data demonstrate that the Q factors are significantly improved after the oxidation treatment.

© 2009 IEEE

PDF Article
More Like This
a-SiOx<Er> active photonic crystal resonator membrane fabricated by focused Ga+ ion beam

David S. L. Figueira, Luis A. M. Barea, Felipe Vallini, Paulo F. Jarschel, Rossano Lang, and Newton C. Frateschi
Opt. Express 20(17) 18772-18783 (2012)

Micromachining structured optical fibers using focused ion beam milling

Cicero Martelli, Paolo Olivero, John Canning, Nathaniel Groothoff, Brant Gibson, and Shane Huntington
Opt. Lett. 32(11) 1575-1577 (2007)

Focused ion beam milling of gallium phosphide nanostructures for photonic applications

Eleonora De Luca, Reza Sanatinia, Srinivasan Anand, and Marcin Swillo
Opt. Mater. Express 6(2) 587-596 (2016)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved