Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Journal of Lightwave Technology
  • Vol. 19,
  • Issue 10,
  • pp. 1527-
  • (2001)

Stitching-Error Reduction in Gratings by Shot-Shifted Electron-Beam Lithography

Not Accessible

Your library or personal account may give you access

Abstract

Calculations of the grating spatial-frequency spectrum and the filtering properties of multiple-pass electron-beam writing demonstrate a tradeoff between stitching-error suppression and minimum pitch separation. High-resolution measurements of optical-diffraction patterns show a 25-dB reduction in stitching-error side modes.

[IEEE ]

PDF Article
More Like This
Impact of electron-beam lithography irregularities across millimeter-scale resonant grating filter performances

Anne Talneau, Fabien Lemarchand, Anne-Laure Fehrembach, and Anne Sentenac
Appl. Opt. 49(4) 658-662 (2010)

Fabrication of a focusing grating mirror by electron beam lithography

Yoshikazu Hori, Fumihiro Sogawa, Hiroyuki Asakure, Makoto Kato, and Hiroyuki Serizawa
Appl. Opt. 29(17) 2522-2526 (1990)

Optimization of diffraction grating profiles in fabrication by electron-beam lithography

Masato Okano, Hisao Kikuta, Yoshihiko Hirai, Kazuya Yamamoto, and Tsutom Yotsuya
Appl. Opt. 43(27) 5137-5142 (2004)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved