Abstract

For the purpose of a mechanical evaluation of a metal-cladding polarizer, a precise characterization of SiO2-x-Al thin-film succession fabricated on a LiNbO3 substrate was made as well as an experimental optimization of the SiO2-x-Al polarizer for the Ti: LiNbO3 waveguide. A 10-nm-thick SiO_SiO2-x was selected as the optimized underlay of a SiO2-x-Al polarizer for the Ti: LiNbO3 waveguide using a wavelength of =1.55 m. Results of scratch testing show that the adhesive strength of SiO2-x-Al films was almost the same level as that of Ti-Au films on a thick SiO2 layer, commonly used for metallic underlay of Au-plated electrodes. From observing SiO2-x-Al film using a transmission electron microscope, it was confirmed that the 10-nm-thick SiO2-x underlay stratified well without serious thickness fluctuation.

[IEEE ]

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription