Abstract

This paper reports on hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs) processed at 150 °C using plasma-enhanced chemical vapor deposition on polyethylene naphthalate (PEN) transparent plastic substrates. We examine the impact of RF deposition power on film stress of amorphous silicon nitride (a-SiN<sub><i>x</i></sub>:H), and resulting TFT performance. Transistors with the lowest stress nitride, yield the best performance in terms of device mobility (~1.1 cm<sup>2</sup>/V · S), ON/OFF current ratio (~10<sup>10</sup>), and gate leakage current (< 0.1 pA). Stable TFTs are demonstrated with a threshold voltage shift of less than 0.8 V following 10 hours of DC bias stress at 10 V.

© 2011 IEEE

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  1. Y. Kuo, Thin Film Transistors Materials and Processes. Volume 1: Amorphous Silicon Thin Film Transistors (Kluwer Academic, 2004).
  2. P. J. Slikkerveer, "Bending the rules," Inf. Displays 3, 20 (2003).
  3. W. A. MacDonald, J. Mater. Chem. 14, 4 (2004).
  4. I. Kobayashi, T. Ogawa, S. Hotta, "Plasma-enhanced chemical vapor deposition of silicon nitride," Jpn. J. Appl. Phys. 31, 336 (1992).
  5. H. Gleskova, I.-C. Cheng, S. Wagner, J. C. Sturm, Z. Suo, "Mechanics of thin-film transistors and solar cells on flexible substrates," Solar Energy 80, 687 (2006).
  6. K. Hiranaka, T. Yoshimura, T. Yamaguchi, "Influence of an a-SiNx:H gate insulator on an amorphous silicon thin-film transistor," J. Appl. Phys. 62, 2129 (1987).
  7. Y. Kuo, "Plasma etching and deposition for a-Si:H thin film transistors," J. Electrochem. Soc. 142, 186 (1995).
  8. M. Stutzmann, "Role of mechanical stress in the light-induced degradation of hydrogenated amorphous silicon," Appl. Phys. Lett. 47, 21 (1985).
  9. P. Servati, A. Nathan, "Modeling of the reverse characteristics of a-Si:H TFTs," IEEE Trans. Electron Devices 49, 812-819 (2002).
  10. K. Khakzar, E. H. Lueder, "Modeling of amorphous-silicon thin-film transistors for circuit simulations with SPICE," IEEE Trans. Electron Devices 39, 1428-1434 (1992).
  11. M. Shur, M. Hack, J. G. Shaw, "A new analytic model for amorphous silicon thin-film transistors," J. Appl. Phys. 66, 3371 (1989).
  12. R. A. Street, Hydrogenated Amorphous Silicon (Cambridge Univ. Press, 1991).
  13. H. Gleskova, S. Wagner, "Electron mobility in amorphous silicon thin-film transistors under compressive strain," Appl. Phys. Lett. 79, 3347 (2001).
  14. P. Servati, A. Nathan, "Orientation-dependent strain tolerance of amorphous silicon transistors and pixel circuits for elastic organic lightemitting diode displays," Appl. Phys. Lett. 86, 033504 (2005).

2006 (1)

H. Gleskova, I.-C. Cheng, S. Wagner, J. C. Sturm, Z. Suo, "Mechanics of thin-film transistors and solar cells on flexible substrates," Solar Energy 80, 687 (2006).

2005 (1)

P. Servati, A. Nathan, "Orientation-dependent strain tolerance of amorphous silicon transistors and pixel circuits for elastic organic lightemitting diode displays," Appl. Phys. Lett. 86, 033504 (2005).

2004 (1)

W. A. MacDonald, J. Mater. Chem. 14, 4 (2004).

2003 (1)

P. J. Slikkerveer, "Bending the rules," Inf. Displays 3, 20 (2003).

2002 (1)

P. Servati, A. Nathan, "Modeling of the reverse characteristics of a-Si:H TFTs," IEEE Trans. Electron Devices 49, 812-819 (2002).

2001 (1)

H. Gleskova, S. Wagner, "Electron mobility in amorphous silicon thin-film transistors under compressive strain," Appl. Phys. Lett. 79, 3347 (2001).

1995 (1)

Y. Kuo, "Plasma etching and deposition for a-Si:H thin film transistors," J. Electrochem. Soc. 142, 186 (1995).

1992 (2)

K. Khakzar, E. H. Lueder, "Modeling of amorphous-silicon thin-film transistors for circuit simulations with SPICE," IEEE Trans. Electron Devices 39, 1428-1434 (1992).

I. Kobayashi, T. Ogawa, S. Hotta, "Plasma-enhanced chemical vapor deposition of silicon nitride," Jpn. J. Appl. Phys. 31, 336 (1992).

1989 (1)

M. Shur, M. Hack, J. G. Shaw, "A new analytic model for amorphous silicon thin-film transistors," J. Appl. Phys. 66, 3371 (1989).

1987 (1)

K. Hiranaka, T. Yoshimura, T. Yamaguchi, "Influence of an a-SiNx:H gate insulator on an amorphous silicon thin-film transistor," J. Appl. Phys. 62, 2129 (1987).

1985 (1)

M. Stutzmann, "Role of mechanical stress in the light-induced degradation of hydrogenated amorphous silicon," Appl. Phys. Lett. 47, 21 (1985).

Appl. Phys. Lett. (3)

M. Stutzmann, "Role of mechanical stress in the light-induced degradation of hydrogenated amorphous silicon," Appl. Phys. Lett. 47, 21 (1985).

H. Gleskova, S. Wagner, "Electron mobility in amorphous silicon thin-film transistors under compressive strain," Appl. Phys. Lett. 79, 3347 (2001).

P. Servati, A. Nathan, "Orientation-dependent strain tolerance of amorphous silicon transistors and pixel circuits for elastic organic lightemitting diode displays," Appl. Phys. Lett. 86, 033504 (2005).

IEEE Trans. Electron Devices (2)

P. Servati, A. Nathan, "Modeling of the reverse characteristics of a-Si:H TFTs," IEEE Trans. Electron Devices 49, 812-819 (2002).

K. Khakzar, E. H. Lueder, "Modeling of amorphous-silicon thin-film transistors for circuit simulations with SPICE," IEEE Trans. Electron Devices 39, 1428-1434 (1992).

Inf. Displays (1)

P. J. Slikkerveer, "Bending the rules," Inf. Displays 3, 20 (2003).

J. Appl. Phys. (2)

M. Shur, M. Hack, J. G. Shaw, "A new analytic model for amorphous silicon thin-film transistors," J. Appl. Phys. 66, 3371 (1989).

K. Hiranaka, T. Yoshimura, T. Yamaguchi, "Influence of an a-SiNx:H gate insulator on an amorphous silicon thin-film transistor," J. Appl. Phys. 62, 2129 (1987).

J. Electrochem. Soc. (1)

Y. Kuo, "Plasma etching and deposition for a-Si:H thin film transistors," J. Electrochem. Soc. 142, 186 (1995).

J. Mater. Chem. (1)

W. A. MacDonald, J. Mater. Chem. 14, 4 (2004).

Jpn. J. Appl. Phys. (1)

I. Kobayashi, T. Ogawa, S. Hotta, "Plasma-enhanced chemical vapor deposition of silicon nitride," Jpn. J. Appl. Phys. 31, 336 (1992).

Solar Energy (1)

H. Gleskova, I.-C. Cheng, S. Wagner, J. C. Sturm, Z. Suo, "Mechanics of thin-film transistors and solar cells on flexible substrates," Solar Energy 80, 687 (2006).

Other (2)

R. A. Street, Hydrogenated Amorphous Silicon (Cambridge Univ. Press, 1991).

Y. Kuo, Thin Film Transistors Materials and Processes. Volume 1: Amorphous Silicon Thin Film Transistors (Kluwer Academic, 2004).

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