Abstract

We investigate reactive fluorine atom spectroscopic characterization in atmospheric pressure of He/SF6 plasma using atomic emission spectrometry. As input radio frequency (RF) power levels are raised from 140 to 220 W, the emission spectra of 685.60 (3p4D-3s4P transition) and 739.87 nm (3p4P-3s4P transition) increase significantly. Moreover, an optimal value of SF6 volume concentration in the production of fluorine radicals, which is 0.8% is achieved. Addition of certain amounts of O2 into He/SF6 plasma results in the promotion of SF6 dissociation. Emission intensities of fluorine atoms show the maximum at the O<sub>2</sub>/SF<sub>6</sub> ratio of 0.4.

© 2011 Chinese Optics Letters

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  1. Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).
  2. Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).
  3. Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).
  4. B. Wang, J. Zhang, and S. Dong, Chin. Opt. Lett. 7, 537 (2009).
  5. K. Yamamura, S. Shimada, and Y. Mori, CIRP Annals-Manufacturing Technol. 57, 567 (2008).
  6. C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).
  7. R. Xin, Plasma Emission Spectroscopy Analysis (in Chinese) (Chemical Industry Press, Beijing, 2005).
  8. The National Institute of Standards and Technology (NIST), "Handbook of Basic Atomic Spectroscopic Data", http://www.nist.gov/pml/data/handbook/index.cfm (October 18, 2010).
  9. Y. Ke and H. Dong, Analytical Chemistry Manual (III): Spectral Analysis (in Chinese) (Chemical Industry Press, Beijing, 1998).
  10. F. Placido and D. Gibson, Chin. Opt. Lett. 8, (sup.) 49 (2010).

2010 (1)

F. Placido and D. Gibson, Chin. Opt. Lett. 8, (sup.) 49 (2010).

2009 (2)

Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).

B. Wang, J. Zhang, and S. Dong, Chin. Opt. Lett. 7, 537 (2009).

2008 (1)

K. Yamamura, S. Shimada, and Y. Mori, CIRP Annals-Manufacturing Technol. 57, 567 (2008).

2006 (2)

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

2005 (1)

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Berrett, J. W.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Carr, J.

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Chang, A. K.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Dong, S.

Endo, K.

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Fanara, C.

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Futtere, K.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Gardopee, G. J.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Gibson, D.

F. Placido and D. Gibson, Chin. Opt. Lett. 8, (sup.) 49 (2010).

Goto, H.

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Kakiuchi, H.

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Kelley, J.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Kyler, T.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Lee, J.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Lyford, N.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Mimura, H.

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Mori, Y.

Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).

K. Yamamura, S. Shimada, and Y. Mori, CIRP Annals-Manufacturing Technol. 57, 567 (2008).

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Nicholls, J. R.

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Placido, F.

F. Placido and D. Gibson, Chin. Opt. Lett. 8, (sup.) 49 (2010).

Proscia, D.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Sano, Y.

Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Shimada, S.

K. Yamamura, S. Shimada, and Y. Mori, CIRP Annals-Manufacturing Technol. 57, 567 (2008).

Shore, P.

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Sommer, P.

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Verma, Y.

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Wang, B.

Yamamura, K.

Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).

K. Yamamura, S. Shimada, and Y. Mori, CIRP Annals-Manufacturing Technol. 57, 567 (2008).

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Yamauchi, K.

Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Yasutake, K.

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Zhang, J.

Adv. Eng. Mater. (1)

C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).

Chin. Opt. Lett. (2)

B. Wang, J. Zhang, and S. Dong, Chin. Opt. Lett. 7, 537 (2009).

F. Placido and D. Gibson, Chin. Opt. Lett. 8, (sup.) 49 (2010).

CIRP Annals-Manufacturing Technol. (1)

K. Yamamura, S. Shimada, and Y. Mori, CIRP Annals-Manufacturing Technol. 57, 567 (2008).

J. Cryst. Growth (1)

Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).

Proc. SPIE (1)

Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).

Rev. Sci. Instru. (1)

Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).

Other (3)

R. Xin, Plasma Emission Spectroscopy Analysis (in Chinese) (Chemical Industry Press, Beijing, 2005).

The National Institute of Standards and Technology (NIST), "Handbook of Basic Atomic Spectroscopic Data", http://www.nist.gov/pml/data/handbook/index.cfm (October 18, 2010).

Y. Ke and H. Dong, Analytical Chemistry Manual (III): Spectral Analysis (in Chinese) (Chemical Industry Press, Beijing, 1998).

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