Abstract

An optimized dual fiber Bragg grating (FBG) is proposed for 980-nm semiconductor lasers without thermoelectric coolers to restrict temperature-induced wavelength shift. The mathematical model of the temperature-induced wavelength shift of the laser with the dual FBG is built using the external cavity feedback rate equations. The external cavity parameters are optimized for achieving the stability mode-locking laser output. The spectral characteristics of the dual FBG stabilized laser are measured to range from 0 to 70 oC. The side mode suppression ratio (SMSR) is more than 45 dB, while the full-width at half-maximum (FWHM) is less than 1 nm. The peak wavelength shift is less than 0.1 nm. The dual FBG wavelength shift proportional coefficient is between 0.1086 and 0.4342.

© 2011 Chinese Optics Letters

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2010 (2)

K. Ni, H. Xu, X. Dong, and Y. Jin, Acta Opt. Sin. (in Chinese) 30, 2104 (2010).

Z. Long, X. Xin, R. Zhou, Z. Zhang, and D. Xu, Chin. Opt. Lett. 8, 642 (2010).

2009 (9)

S. Hu, Y. Li, Q. Jiang, B. Wu, X. Yu, and H. Wang, Proc. SPIE 7278, 72781L (2009).

K. Li, Z. Zhou, and A. Liu, Chin. Opt. Lett. 7, 121 (2009).

Q. Ma, L. Xia, B. Lu, W. Xiong, Y. Zhang, X. Zhou, and X. Chen, Chin. Opt. Lett. 7, 46 (2009).

K. Li and Z. Zhou, Chin. Opt. Lett. 7, 191 (2009).

D. Bimberg, C. Meuer, M. L¨ammlin, S. Liebich, J. Kim, E. Varene, A. Kovsh, I. Krestnikov, and G. Eisenstein, Chin. Opt. Lett. 7, 266 (2009).

Y. Zhu, H. Mei, T. Zhu, J. Zhang, and S. Yin, Chin. Opt. Lett. 7, 675 (2009).

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, and H. Wang, Chinese J. Lasers (in Chinese) 36, 799 (2009).

S. Li, X. Liu, Y. Li, S. Yang, and C. Liu, Front. Optoelectron. China 2, 233 (2009).

2008 (4)

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

J. M. Noriega, A. Valle, and L. Pesquera, Opt. Quantum Electron. 40, 119 (2008).

B. Wu, Y. Li, S. Hu, Q. Jiang, X. Yu, and H. Wang, Proc. SPIE 7135, 71353A (2008).

S. Hu, Y. Li, Q. Jiang, and B. Wu, Chinese J. Lasers (in Chinese) 35, 44 (2008).

2007 (1)

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

2004 (1)

X. Qiao, Z. Jia, H. Fu, M. Li, and H. Zhou, Acta Phys. Sin. (in Chinese) 53, 494 (2004).

2003 (2)

Z. Jia, X. Qiao, and H. Fu, J. Optoelectron. Laser (in Chinese) 14, 453 (2003).

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

2001 (3)

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

M. Liang, Q. Fang, and Y. Wang, J. Optoelectron. Laser (in Chinese) 12, 821 (2001).

C. H. L. Quay, I. Z. Maxwell, and J. A. Hudgings, J. Appl. Phys. 90, 5856 (2001).

1999 (2)

J. S. Lawrence and D. M. Kane, Opt. Commun. 167, 273 (1999).

S. Fukuchi, S.-Y. Ye, and J. Ohtsubo, Opt. Rev. 6, 365 (1999).

1996 (1)

I. Fischer, G. H. M. van Tartwijk, A. M. Levine, W. Els¨asser, E. G¨obel, and D. Lenstra, Phys. Rev. Lett. 76, 220 (1996).

Achtenhagen, M.

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

Arteaga, M. A.

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

Baik, S.-J.

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

Bimberg, D.

Chen, X.

Choi, D.-S.

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

Dong, X.

K. Ni, H. Xu, X. Dong, and Y. Jin, Acta Opt. Sin. (in Chinese) 30, 2104 (2010).

Eisenstein, G.

Els¨asser, W.

I. Fischer, G. H. M. van Tartwijk, A. M. Levine, W. Els¨asser, E. G¨obel, and D. Lenstra, Phys. Rev. Lett. 76, 220 (1996).

Fang, Q.

M. Liang, Q. Fang, and Y. Wang, J. Optoelectron. Laser (in Chinese) 12, 821 (2001).

Feng, S.

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

Fischer, I.

I. Fischer, G. H. M. van Tartwijk, A. M. Levine, W. Els¨asser, E. G¨obel, and D. Lenstra, Phys. Rev. Lett. 76, 220 (1996).

Fu, H.

X. Qiao, Z. Jia, H. Fu, M. Li, and H. Zhou, Acta Phys. Sin. (in Chinese) 53, 494 (2004).

Z. Jia, X. Qiao, and H. Fu, J. Optoelectron. Laser (in Chinese) 14, 453 (2003).

Fukuchi, S.

S. Fukuchi, S.-Y. Ye, and J. Ohtsubo, Opt. Rev. 6, 365 (1999).

G¨obel, E.

I. Fischer, G. H. M. van Tartwijk, A. M. Levine, W. Els¨asser, E. G¨obel, and D. Lenstra, Phys. Rev. Lett. 76, 220 (1996).

Gauthier-Lafaye, O.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Gentner, J. L.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Grillot, F.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Han, J.-M.

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

Harder, C. S.

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

Hardy, A.

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

Hern'andez, J.

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

Hu, S.

B. Wu, Y. Li, S. Hu, Q. Jiang, and H. Wang, Chinese J. Lasers (in Chinese) 36, 799 (2009).

S. Hu, Y. Li, Q. Jiang, B. Wu, X. Yu, and H. Wang, Proc. SPIE 7278, 72781L (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, X. Yu, and H. Wang, Proc. SPIE 7135, 71353A (2008).

S. Hu, Y. Li, Q. Jiang, and B. Wu, Chinese J. Lasers (in Chinese) 35, 44 (2008).

Hudgings, J. A.

C. H. L. Quay, I. Z. Maxwell, and J. A. Hudgings, J. Appl. Phys. 90, 5856 (2001).

Im, K.

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

Jeong, J.-Y.

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

Jia, Z.

X. Qiao, Z. Jia, H. Fu, M. Li, and H. Zhou, Acta Phys. Sin. (in Chinese) 53, 494 (2004).

Z. Jia, X. Qiao, and H. Fu, J. Optoelectron. Laser (in Chinese) 14, 453 (2003).

Jian, S.

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

Jiang, Q.

S. Hu, Y. Li, Q. Jiang, B. Wu, X. Yu, and H. Wang, Proc. SPIE 7278, 72781L (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, and H. Wang, Chinese J. Lasers (in Chinese) 36, 799 (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, X. Yu, and H. Wang, Proc. SPIE 7135, 71353A (2008).

S. Hu, Y. Li, Q. Jiang, and B. Wu, Chinese J. Lasers (in Chinese) 35, 44 (2008).

Jin, Y.

K. Ni, H. Xu, X. Dong, and Y. Jin, Acta Opt. Sin. (in Chinese) 30, 2104 (2010).

Kane, D. M.

J. S. Lawrence and D. M. Kane, Opt. Commun. 167, 273 (1999).

Kim, J.

Koltys, K.

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

Kovsh, A.

Krestnikov, I.

L¨ammlin, M.

Lafragette, J. L.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Lawrence, J. S.

J. S. Lawrence and D. M. Kane, Opt. Commun. 167, 273 (1999).

Lenstra, D.

I. Fischer, G. H. M. van Tartwijk, A. M. Levine, W. Els¨asser, E. G¨obel, and D. Lenstra, Phys. Rev. Lett. 76, 220 (1996).

Levine, A. M.

I. Fischer, G. H. M. van Tartwijk, A. M. Levine, W. Els¨asser, E. G¨obel, and D. Lenstra, Phys. Rev. Lett. 76, 220 (1996).

Li, K.

Li, M.

X. Qiao, Z. Jia, H. Fu, M. Li, and H. Zhou, Acta Phys. Sin. (in Chinese) 53, 494 (2004).

Li, S.

S. Li, X. Liu, Y. Li, S. Yang, and C. Liu, Front. Optoelectron. China 2, 233 (2009).

Li, Y.

S. Li, X. Liu, Y. Li, S. Yang, and C. Liu, Front. Optoelectron. China 2, 233 (2009).

S. Hu, Y. Li, Q. Jiang, B. Wu, X. Yu, and H. Wang, Proc. SPIE 7278, 72781L (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, and H. Wang, Chinese J. Lasers (in Chinese) 36, 799 (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, X. Yu, and H. Wang, Proc. SPIE 7135, 71353A (2008).

S. Hu, Y. Li, Q. Jiang, and B. Wu, Chinese J. Lasers (in Chinese) 35, 44 (2008).

Liang, M.

M. Liang, Q. Fang, and Y. Wang, J. Optoelectron. Laser (in Chinese) 12, 821 (2001).

Liebich, S.

Liu, A.

Liu, C.

S. Li, X. Liu, Y. Li, S. Yang, and C. Liu, Front. Optoelectron. China 2, 233 (2009).

Liu, X.

S. Li, X. Liu, Y. Li, S. Yang, and C. Liu, Front. Optoelectron. China 2, 233 (2009).

Long, Z.

L'opez-Amo, M.

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

Lu, B.

Lu, S.

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

Ma, Q.

Mao, X.

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

Martineau, M. F.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Matuschek, N.

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

Maxwell, I. Z.

C. H. L. Quay, I. Z. Maxwell, and J. A. Hudgings, J. Appl. Phys. 90, 5856 (2001).

Mei, H.

Meuer, C.

Mohrdiek, S.

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

Moon, H.-M.

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

Ni, K.

K. Ni, H. Xu, X. Dong, and Y. Jin, Acta Opt. Sin. (in Chinese) 30, 2104 (2010).

Ning, T.

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

Noh, H.-R.

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

Noriega, J. M.

J. M. Noriega, A. Valle, and L. Pesquera, Opt. Quantum Electron. 40, 119 (2008).

Ohtsubo, J.

S. Fukuchi, S.-Y. Ye, and J. Ohtsubo, Opt. Rev. 6, 365 (1999).

Panajotov, K.

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

Pesquera, L.

J. M. Noriega, A. Valle, and L. Pesquera, Opt. Quantum Electron. 40, 119 (2008).

Pliska, T.

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

Qiao, X.

X. Qiao, Z. Jia, H. Fu, M. Li, and H. Zhou, Acta Phys. Sin. (in Chinese) 53, 494 (2004).

Z. Jia, X. Qiao, and H. Fu, J. Optoelectron. Laser (in Chinese) 14, 453 (2003).

Quay, C. H. L.

C. H. L. Quay, I. Z. Maxwell, and J. A. Hudgings, J. Appl. Phys. 90, 5856 (2001).

Silvestre, L.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Tabaka, A.

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

Tartwijk, G. H. M. van

I. Fischer, G. H. M. van Tartwijk, A. M. Levine, W. Els¨asser, E. G¨obel, and D. Lenstra, Phys. Rev. Lett. 76, 220 (1996).

Thedrez, B.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Thienpont, H.

M. A. Arteaga, M. L'opez-Amo, J. Hern'andez, K. Koltys, A. Tabaka, H. Thienpont, and K. Panajotov, Opt. Quantum Electron. 40, 69 (2008).

Valle, A.

J. M. Noriega, A. Valle, and L. Pesquera, Opt. Quantum Electron. 40, 119 (2008).

Varene, E.

Voiriot, V.

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

Wang, H.

S. Hu, Y. Li, Q. Jiang, B. Wu, X. Yu, and H. Wang, Proc. SPIE 7278, 72781L (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, and H. Wang, Chinese J. Lasers (in Chinese) 36, 799 (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, X. Yu, and H. Wang, Proc. SPIE 7135, 71353A (2008).

Wang, Y.

M. Liang, Q. Fang, and Y. Wang, J. Optoelectron. Laser (in Chinese) 12, 821 (2001).

Wu, B.

S. Hu, Y. Li, Q. Jiang, B. Wu, X. Yu, and H. Wang, Proc. SPIE 7278, 72781L (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, and H. Wang, Chinese J. Lasers (in Chinese) 36, 799 (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, X. Yu, and H. Wang, Proc. SPIE 7135, 71353A (2008).

S. Hu, Y. Li, Q. Jiang, and B. Wu, Chinese J. Lasers (in Chinese) 35, 44 (2008).

Xia, L.

Xin, X.

Xiong, W.

Xu, D.

Xu, H.

K. Ni, H. Xu, X. Dong, and Y. Jin, Acta Opt. Sin. (in Chinese) 30, 2104 (2010).

Xu, O.

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

Yang, S.

S. Li, X. Liu, Y. Li, S. Yang, and C. Liu, Front. Optoelectron. China 2, 233 (2009).

Ye, S.-Y.

S. Fukuchi, S.-Y. Ye, and J. Ohtsubo, Opt. Rev. 6, 365 (1999).

Yin, S.

Yu, X.

S. Hu, Y. Li, Q. Jiang, B. Wu, X. Yu, and H. Wang, Proc. SPIE 7278, 72781L (2009).

B. Wu, Y. Li, S. Hu, Q. Jiang, X. Yu, and H. Wang, Proc. SPIE 7135, 71353A (2008).

Zhang, J.

Zhang, Y.

Zhang, Z.

Zhou, H.

X. Qiao, Z. Jia, H. Fu, M. Li, and H. Zhou, Acta Phys. Sin. (in Chinese) 53, 494 (2004).

Zhou, R.

Zhou, X.

Zhou, Z.

Zhu, T.

Zhu, Y.

Acta Opt. Sin. (in Chinese) (1)

K. Ni, H. Xu, X. Dong, and Y. Jin, Acta Opt. Sin. (in Chinese) 30, 2104 (2010).

Acta Phys. Sin. (in Chinese) (1)

X. Qiao, Z. Jia, H. Fu, M. Li, and H. Zhou, Acta Phys. Sin. (in Chinese) 53, 494 (2004).

Chin. Opt. Lett. (6)

Chinese J. Lasers (in Chinese) (2)

S. Hu, Y. Li, Q. Jiang, and B. Wu, Chinese J. Lasers (in Chinese) 35, 44 (2008).

B. Wu, Y. Li, S. Hu, Q. Jiang, and H. Wang, Chinese J. Lasers (in Chinese) 36, 799 (2009).

Front. Optoelectron. China (1)

S. Li, X. Liu, Y. Li, S. Yang, and C. Liu, Front. Optoelectron. China 2, 233 (2009).

IEEE Photon. Technol. Lett. (2)

F. Grillot, B. Thedrez, O. Gauthier-Lafaye, M. F. Martineau, V. Voiriot, J. L. Lafragette, J. L. Gentner, and L. Silvestre, IEEE Photon. Technol. Lett. 15, 9 (2003).

M. Achtenhagen, S. Mohrdiek, T. Pliska, N. Matuschek, C. S. Harder, and A. Hardy, IEEE Photon. Technol. Lett. 13, 415 (2001).

J. Appl. Phys. (1)

C. H. L. Quay, I. Z. Maxwell, and J. A. Hudgings, J. Appl. Phys. 90, 5856 (2001).

J. Optoelectron. Laser (in Chinese) (2)

M. Liang, Q. Fang, and Y. Wang, J. Optoelectron. Laser (in Chinese) 12, 821 (2001).

Z. Jia, X. Qiao, and H. Fu, J. Optoelectron. Laser (in Chinese) 14, 453 (2003).

Opt. Commun. (1)

J. S. Lawrence and D. M. Kane, Opt. Commun. 167, 273 (1999).

Opt. Laser Technol. (2)

J.-M. Han, S.-J. Baik, J.-Y. Jeong, K. Im, H.-M. Moon, H.-R. Noh, and D.-S. Choi, Opt. Laser Technol. 39, 313 (2007).

S. Feng, O. Xu, S. Lu, X. Mao, T. Ning, and S. Jian, Opt. Laser Technol. 41, 264 (2009).

Opt. Quantum Electron. (2)

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