Abstract

Samples with nodular defects grown from gold nanoparticles are prepared, and laser-induced damage tests are conducted on them. Nodular defects, which are in critical state of damage, are cross-sectioned by focusing on the ion beam and by imaging using a field emission scanning electron microscope. The crosssectional profile shows that cracks are generated and propagated along the nodular boundaries and the HfO2/SiO2 interface, or are even melted. The thermomechanical process induced by the heated seed region is analyzed based on the calculations of temperature increase and thermal stress. The numerical results give the critical temperature of the seed region and the thermal stress for crack generation, irradiated with threshold fluence. The numerical results are in good agreement with the experimental ones.

© 2011 Chinese Optics Letters

PDF Article

References

  • View by:
  • |
  • |
  • |

  1. C. J. Stolz, M. D. Feit, and T. V. Pistor, Appl. Opt. 45, 1594 (2006).
  2. Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).
  3. C. J. Stolz, S. Hafeman, and T. V. Pistor, Appl. Opt. 47, C162 (2008).
  4. J. R. Milward, K. L. Lewis, K. Sheach, and R. A. Heinecke, Proc. SPIE 2114, 309 (1993).
  5. J. F. DeFord and M. R. Kozlowski, Proc. SPIE 1848, 455 (1992).
  6. X. Liu, D. Li, Y. Zhao, and X. Li, Appl. Opt. 49, 1774 (2010).
  7. X. Liu, D. Li, Y. Zhao, X. Li, and J. Shao, Appl. Surf. Sci. 256, 3783 (2010).
  8. X. Liu, D. Li, Y. Zhao, X. Li, X. Ling, and J. Shao, Chin. Opt. Lett. 8, 41 (2010).
  9. X. Ling, J. Shao, and Z. Fan, J. Vac. Sci. Technol. A 27, 183 (2009).
  10. J. Dijon, M. Poulingue, and J. Hue, Proc. SPIE 3578, 387 (1999).
  11. R. Sawicki, C. Shang, and T. Swatloski, Proc. SPIE 2428, 333 (1994).
  12. Y. Shan, H. He, C. Wei, S. Li, M. Zhou, D. Li, and Y. Zhao, Appl. Opt. 49, 4290 (2010).
  13. C. H. Chan, Appl. Phys. Lett. 26, 628 (1975).
  14. C. Wei, J. Shao, H. He, K. Yi, and Z. Fan, Opt. Express 16, 3376 (2008).
  15. Y. Takeuti, Thermal Stress (in Chinese) (Science, Beijing, 1977).
  16. M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).
  17. J. Dijon, G. Ravel, and B. Andre, Proc. SPIE 3578, 398 (1999).
  18. T. Spalvins and W. A. Brainard, J. Vac. Sci. Technol. 11, 1186 (1974).
  19. F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).
  20. C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

2010 (4)

2009 (1)

X. Ling, J. Shao, and Z. Fan, J. Vac. Sci. Technol. A 27, 183 (2009).

2008 (2)

2007 (1)

Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).

2006 (1)

2004 (1)

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

1999 (3)

M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).

J. Dijon, G. Ravel, and B. Andre, Proc. SPIE 3578, 398 (1999).

J. Dijon, M. Poulingue, and J. Hue, Proc. SPIE 3578, 387 (1999).

1997 (1)

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

1994 (1)

R. Sawicki, C. Shang, and T. Swatloski, Proc. SPIE 2428, 333 (1994).

1993 (1)

J. R. Milward, K. L. Lewis, K. Sheach, and R. A. Heinecke, Proc. SPIE 2114, 309 (1993).

1992 (1)

J. F. DeFord and M. R. Kozlowski, Proc. SPIE 1848, 455 (1992).

1975 (1)

C. H. Chan, Appl. Phys. Lett. 26, 628 (1975).

1974 (1)

T. Spalvins and W. A. Brainard, J. Vac. Sci. Technol. 11, 1186 (1974).

Andre, B.

J. Dijon, G. Ravel, and B. Andre, Proc. SPIE 3578, 398 (1999).

Anzellotti, J.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Bertron, I.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Bertussi, B.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Bevis, R.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Bonneau, F.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Brainard, W. A.

T. Spalvins and W. A. Brainard, J. Vac. Sci. Technol. 11, 1186 (1974).

Chan, C. H.

C. H. Chan, Appl. Phys. Lett. 26, 628 (1975).

Chen, W.

Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).

Combis, P.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Commandre, M.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

DeFord, J. F.

J. F. DeFord and M. R. Kozlowski, Proc. SPIE 1848, 455 (1992).

Dijon, J.

J. Dijon, G. Ravel, and B. Andre, Proc. SPIE 3578, 398 (1999).

M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).

J. Dijon, M. Poulingue, and J. Hue, Proc. SPIE 3578, 387 (1999).

Donohue, J. T.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Fan, Z.

X. Ling, J. Shao, and Z. Fan, J. Vac. Sci. Technol. A 27, 183 (2009).

C. Wei, J. Shao, H. He, K. Yi, and Z. Fan, Opt. Express 16, 3376 (2008).

Feit, M. D.

Gallais, L.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Genin, F.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Gu, P.

Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).

Gunten, M.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Hafeman, S.

He, H.

Heinecke, R. A.

J. R. Milward, K. L. Lewis, K. Sheach, and R. A. Heinecke, Proc. SPIE 2114, 309 (1993).

Hue, J.

J. Dijon, M. Poulingue, and J. Hue, Proc. SPIE 3578, 387 (1999).

Ignat, M.

M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).

Kozlowski, M. R.

J. F. DeFord and M. R. Kozlowski, Proc. SPIE 1848, 455 (1992).

Leplan, H.

M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).

Lewis, K. L.

J. R. Milward, K. L. Lewis, K. Sheach, and R. A. Heinecke, Proc. SPIE 2114, 309 (1993).

Li, D.

Li, S.

Li, X.

Ling, X.

X. Liu, D. Li, Y. Zhao, X. Li, X. Ling, and J. Shao, Chin. Opt. Lett. 8, 41 (2010).

X. Ling, J. Shao, and Z. Fan, J. Vac. Sci. Technol. A 27, 183 (2009).

Liu, X.

X. Liu, D. Li, Y. Zhao, X. Li, X. Ling, and J. Shao, Chin. Opt. Lett. 8, 41 (2010).

X. Liu, D. Li, Y. Zhao, X. Li, and J. Shao, Appl. Surf. Sci. 256, 3783 (2010).

X. Liu, D. Li, Y. Zhao, and X. Li, Appl. Opt. 49, 1774 (2010).

Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).

Malaise, F.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Milward, J. R.

J. R. Milward, K. L. Lewis, K. Sheach, and R. A. Heinecke, Proc. SPIE 2114, 309 (1993).

Molau, N.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Ntoli, J. Y.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Pinot, B.

M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).

Pistor, T. V.

Poulingue, M.

M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).

J. Dijon, M. Poulingue, and J. Hue, Proc. SPIE 3578, 387 (1999).

Ravel, G.

J. Dijon, G. Ravel, and B. Andre, Proc. SPIE 3578, 398 (1999).

Reitter, T.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Rullier, J. L.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Sawicki, R.

R. Sawicki, C. Shang, and T. Swatloski, Proc. SPIE 2428, 333 (1994).

Shan, Y.

Shang, C.

R. Sawicki, C. Shang, and T. Swatloski, Proc. SPIE 2428, 333 (1994).

Shao, J.

X. Liu, D. Li, Y. Zhao, X. Li, and J. Shao, Appl. Surf. Sci. 256, 3783 (2010).

X. Liu, D. Li, Y. Zhao, X. Li, X. Ling, and J. Shao, Chin. Opt. Lett. 8, 41 (2010).

X. Ling, J. Shao, and Z. Fan, J. Vac. Sci. Technol. A 27, 183 (2009).

C. Wei, J. Shao, H. He, K. Yi, and Z. Fan, Opt. Express 16, 3376 (2008).

Sheach, K.

J. R. Milward, K. L. Lewis, K. Sheach, and R. A. Heinecke, Proc. SPIE 2114, 309 (1993).

Smith, D.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Spalvins, T.

T. Spalvins and W. A. Brainard, J. Vac. Sci. Technol. 11, 1186 (1974).

Stolz, C.

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

Stolz, C. J.

Swatloski, T.

R. Sawicki, C. Shang, and T. Swatloski, Proc. SPIE 2428, 333 (1994).

Vierne, J.

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Wang, Y.

Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).

Wei, C.

Yi, K.

Zhang, Y.

Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).

Zhao, Y.

Zhou, M.

Appl. Opt. (4)

Appl. Phys. B (1)

F. Bonneau, P. Combis, J. L. Rullier, J. Vierne, B. Bertussi, M. Commandre, L. Gallais, J. Y. Ntoli, I. Bertron, F. Malaise, and J. T. Donohue, Appl. Phys. B 78, 447 (2004).

Appl. Phys. Lett. (1)

C. H. Chan, Appl. Phys. Lett. 26, 628 (1975).

Appl. Surf. Sci. (1)

X. Liu, D. Li, Y. Zhao, X. Li, and J. Shao, Appl. Surf. Sci. 256, 3783 (2010).

Chin. Opt. Lett. (1)

J. Vac. Sci. Technol. (1)

T. Spalvins and W. A. Brainard, J. Vac. Sci. Technol. 11, 1186 (1974).

J. Vac. Sci. Technol. A (1)

X. Ling, J. Shao, and Z. Fan, J. Vac. Sci. Technol. A 27, 183 (2009).

Opt. Commun. (1)

Y. Wang, Y. Zhang, X. Liu, W. Chen, and P. Gu, Opt. Commun. 278, 317 (2007).

Opt. Express (1)

Proc. SPIE (7)

C. Stolz, F. Genin, T. Reitter, N. Molau, R. Bevis, M. Gunten, D. Smith, and J. Anzellotti, Proc. SPIE 2966, 265 (1997).

M. Poulingue, J. Dijon, M. Ignat, H. Leplan, and B. Pinot, Proc. SPIE 3578, 370 (1999).

J. Dijon, G. Ravel, and B. Andre, Proc. SPIE 3578, 398 (1999).

J. R. Milward, K. L. Lewis, K. Sheach, and R. A. Heinecke, Proc. SPIE 2114, 309 (1993).

J. F. DeFord and M. R. Kozlowski, Proc. SPIE 1848, 455 (1992).

J. Dijon, M. Poulingue, and J. Hue, Proc. SPIE 3578, 387 (1999).

R. Sawicki, C. Shang, and T. Swatloski, Proc. SPIE 2428, 333 (1994).

Other (1)

Y. Takeuti, Thermal Stress (in Chinese) (Science, Beijing, 1977).

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.