Abstract

A new process of magnetorheological figuring (MRF) based on the deliquescence theory is proposed to finish KDP crystals. A novel, non-aqueous, and abrasive-free magnetorheological (MR) fluid is explored, and polishing experiments are performed on a self-developed MRF machine. The removal mechanism is reckoned to be the result of a combination of dominant chemical etching and accessorial mechanical drag. The results indicate that the surface roughness of I plate KDP of 80×80 (mm) polished by MRF is 1.2 nm (root mean square (RMS)), and the tool marks are completely removed. The surface accuracy by MRF is 0.035\lambda (RMS), and the low/middle-frequency errors are significantly corrected after MRF.

© 2011 Chinese Optics Letters

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2009 (3)

F. Shi, Y. Dai, X. Peng, N. Kang, and Z. Liu, J. National Univ. Defense Technol. (in Chinese) 31, 25 (2009).

J. A. Menapace, P. R. Ehrmann, and R. C. Bickel, Proc. SPIE 7504, 750414 (2009).

F. Shi, Y. Dai, X. Peng, and C. Song, Opt. Precis. Eng. (in Chinese) 17, 1859 (2009).

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H. Wang, J. Wang, T. Sun, and L. Zhang, Acta Armamentarii (in Chinese) 27, 911 (2006).

2005 (1)

S. Dong, X. Zhang, and J. Wang, Tool Technol. (in Chinese) 39, 19 (2005).

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A. Shorey, W. Kordonski, and M. Tricard, Proc. SPIE 5533, 99 (2004).

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F. Yang, Opt. Tech. (in Chinese) 29, 649 (2003).

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V. I. Salo, V. F. Tkachenko, M. A. Rom, V. M. Puzikov, and M. I. Kolybayeva, Proc. SPIE 3359, 540 (1998).

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3266, 320 (1998).

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I. M. Thomas, M. R. Kozlowski, G. Edwards, K. Stanion, and B. Fuchs, Proc. SPIE 1642, 137 (1991).

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Baker, P. C.

Bickel, R. C.

J. A. Menapace, P. R. Ehrmann, and R. C. Bickel, Proc. SPIE 7504, 750414 (2009).

Dai, Y.

F. Shi, Y. Dai, X. Peng, and C. Song, Opt. Precis. Eng. (in Chinese) 17, 1859 (2009).

F. Shi, Y. Dai, X. Peng, N. Kang, and Z. Liu, J. National Univ. Defense Technol. (in Chinese) 31, 25 (2009).

Dong, S.

S. Dong, X. Zhang, and J. Wang, Tool Technol. (in Chinese) 39, 19 (2005).

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I. M. Thomas, M. R. Kozlowski, G. Edwards, K. Stanion, and B. Fuchs, Proc. SPIE 1642, 137 (1991).

Ehrmann, P. R.

J. A. Menapace, P. R. Ehrmann, and R. C. Bickel, Proc. SPIE 7504, 750414 (2009).

Fan, Z.

Fuchs, B.

I. M. Thomas, M. R. Kozlowski, G. Edwards, K. Stanion, and B. Fuchs, Proc. SPIE 1642, 137 (1991).

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Gao, H.

B.Wang, H. Gao, X. Teng, and R. Kang, J. Synth. Cryst. (in Chinese) 39, 29 (2010).

Hed, P. P.

Kang, N.

F. Shi, Y. Dai, X. Peng, N. Kang, and Z. Liu, J. National Univ. Defense Technol. (in Chinese) 31, 25 (2009).

Kang, R.

B.Wang, H. Gao, X. Teng, and R. Kang, J. Synth. Cryst. (in Chinese) 39, 29 (2010).

Kolybayeva, M. I.

V. I. Salo, V. F. Tkachenko, M. A. Rom, V. M. Puzikov, and M. I. Kolybayeva, Proc. SPIE 3359, 540 (1998).

Kordonski, W.

A. Shorey, W. Kordonski, and M. Tricard, Proc. SPIE 5533, 99 (2004).

Kozlowski, M. R.

I. M. Thomas, M. R. Kozlowski, G. Edwards, K. Stanion, and B. Fuchs, Proc. SPIE 1642, 137 (1991).

Li, X.

Liu, X.

Liu, Z.

F. Shi, Y. Dai, X. Peng, N. Kang, and Z. Liu, J. National Univ. Defense Technol. (in Chinese) 31, 25 (2009).

Menapace, J. A.

J. A. Menapace, P. R. Ehrmann, and R. C. Bickel, Proc. SPIE 7504, 750414 (2009).

Nakai, S.

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3244, 320 (1998).

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3266, 320 (1998).

Namba, Y.

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3266, 320 (1998).

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3244, 320 (1998).

Peng, X.

F. Shi, Y. Dai, X. Peng, N. Kang, and Z. Liu, J. National Univ. Defense Technol. (in Chinese) 31, 25 (2009).

F. Shi, Y. Dai, X. Peng, and C. Song, Opt. Precis. Eng. (in Chinese) 17, 1859 (2009).

Puzikov, V. M.

V. I. Salo, V. F. Tkachenko, M. A. Rom, V. M. Puzikov, and M. I. Kolybayeva, Proc. SPIE 3359, 540 (1998).

Rom, M. A.

V. I. Salo, V. F. Tkachenko, M. A. Rom, V. M. Puzikov, and M. I. Kolybayeva, Proc. SPIE 3359, 540 (1998).

Salo, V. I.

V. I. Salo, V. F. Tkachenko, M. A. Rom, V. M. Puzikov, and M. I. Kolybayeva, Proc. SPIE 3359, 540 (1998).

Shao, J.

Shi, F.

F. Shi, Y. Dai, X. Peng, N. Kang, and Z. Liu, J. National Univ. Defense Technol. (in Chinese) 31, 25 (2009).

F. Shi, Y. Dai, X. Peng, and C. Song, Opt. Precis. Eng. (in Chinese) 17, 1859 (2009).

Shorey, A.

A. Shorey, W. Kordonski, and M. Tricard, Proc. SPIE 5533, 99 (2004).

Song, C.

F. Shi, Y. Dai, X. Peng, and C. Song, Opt. Precis. Eng. (in Chinese) 17, 1859 (2009).

Stanion, K.

I. M. Thomas, M. R. Kozlowski, G. Edwards, K. Stanion, and B. Fuchs, Proc. SPIE 1642, 137 (1991).

Sun, T.

H. Wang, J. Wang, T. Sun, and L. Zhang, Acta Armamentarii (in Chinese) 27, 911 (2006).

Teng, X.

B.Wang, H. Gao, X. Teng, and R. Kang, J. Synth. Cryst. (in Chinese) 39, 29 (2010).

Thomas, I. M.

I. M. Thomas, M. R. Kozlowski, G. Edwards, K. Stanion, and B. Fuchs, Proc. SPIE 1642, 137 (1991).

Tkachenko, V. F.

V. I. Salo, V. F. Tkachenko, M. A. Rom, V. M. Puzikov, and M. I. Kolybayeva, Proc. SPIE 3359, 540 (1998).

Tricard, M.

A. Shorey, W. Kordonski, and M. Tricard, Proc. SPIE 5533, 99 (2004).

Wang, H.

H. Wang, J. Wang, T. Sun, and L. Zhang, Acta Armamentarii (in Chinese) 27, 911 (2006).

Wang, J.

H. Wang, J. Wang, T. Sun, and L. Zhang, Acta Armamentarii (in Chinese) 27, 911 (2006).

S. Dong, X. Zhang, and J. Wang, Tool Technol. (in Chinese) 39, 19 (2005).

Yang, F.

F. Yang, Opt. Tech. (in Chinese) 29, 649 (2003).

Yoshida, H.

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3266, 320 (1998).

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3244, 320 (1998).

Yoshida, K.

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3244, 320 (1998).

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3266, 320 (1998).

Zhang, L.

H. Wang, J. Wang, T. Sun, and L. Zhang, Acta Armamentarii (in Chinese) 27, 911 (2006).

Zhang, X.

S. Dong, X. Zhang, and J. Wang, Tool Technol. (in Chinese) 39, 19 (2005).

Zhao, Y.

Acta Armamentarii (in Chinese) (1)

H. Wang, J. Wang, T. Sun, and L. Zhang, Acta Armamentarii (in Chinese) 27, 911 (2006).

Appl. Opt. (1)

Chin. Opt. Lett. (2)

J. National Univ. Defense Technol. (in Chinese) (1)

F. Shi, Y. Dai, X. Peng, N. Kang, and Z. Liu, J. National Univ. Defense Technol. (in Chinese) 31, 25 (2009).

J. Synth. Cryst. (in Chinese) (1)

B.Wang, H. Gao, X. Teng, and R. Kang, J. Synth. Cryst. (in Chinese) 39, 29 (2010).

Opt. Precis. Eng. (in Chinese) (1)

F. Shi, Y. Dai, X. Peng, and C. Song, Opt. Precis. Eng. (in Chinese) 17, 1859 (2009).

Opt. Tech. (in Chinese) (1)

F. Yang, Opt. Tech. (in Chinese) 29, 649 (2003).

Proc. SPIE (6)

V. I. Salo, V. F. Tkachenko, M. A. Rom, V. M. Puzikov, and M. I. Kolybayeva, Proc. SPIE 3359, 540 (1998).

I. M. Thomas, M. R. Kozlowski, G. Edwards, K. Stanion, and B. Fuchs, Proc. SPIE 1642, 137 (1991).

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3244, 320 (1998).

J. A. Menapace, P. R. Ehrmann, and R. C. Bickel, Proc. SPIE 7504, 750414 (2009).

Y. Namba, K. Yoshida, H. Yoshida, and S. Nakai, Proc. SPIE 3266, 320 (1998).

A. Shorey, W. Kordonski, and M. Tricard, Proc. SPIE 5533, 99 (2004).

Tool Technol. (in Chinese) (1)

S. Dong, X. Zhang, and J. Wang, Tool Technol. (in Chinese) 39, 19 (2005).

Other (1)

A. B. Shorey, "Mechanisms of material removal in magnetorheological finishing (MRF) of glass" PhD. Thesis (University of Rochester, Rochester, 2000).

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