Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Chinese Optics Letters
  • Vol. 7,
  • Issue 7,
  • pp. 643-645
  • (2009)

Contamination process and laser-induced damage of HfO2/SiO2 coatings in vacuum

Not Accessible

Your library or personal account may give you access

Abstract

The performances of HfO2/SiO2 single- and multi-layer coatings in vacuum influenced by contamination are studied. The surface morphology, the transmittance spectrum, and the laser-induced damage threshold are investigated. The results show that the contamination in vacuum mainly comes from the vacuum system and the contamination process is different for the HfO2 and SiO2 films. The laser-induced damage experiments at 1064 nm in vacuum show that the damage resistance of the coatings will decrease largely due to the organic contamination.

© 2009 Chinese Optics Letters

PDF Article
More Like This
Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm

Hongfei Jiao, Tao Ding, and Qian Zhang
Opt. Express 19(5) 4059-4066 (2011)

Picosecond laser-induced damage of HfO2-Al2O3 mixture-based mirror coatings in atmosphere and vacuum environments

Jun Shi, Meiping Zhu, Wenyun Du, Tianbao Liu, Li Zhou, Youen Jiang, Jian Sun, Jingping Li, and Jianda Shao
Opt. Mater. Express 13(3) 667-677 (2023)

Investigations on single and multiple pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 1064 nm

Wenwen Liu, Chaoyang Wei, Jianbo Wu, Zhenkun Yu, Hui Cui, Kui Yi, and Jianda Shao
Opt. Express 21(19) 22476-22487 (2013)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved