Abstract

Four kinds of Y2O3 stabilized ZrO2 (YSZ) thin films with different Y2O3 contents (from 0 to 12 mol%) are deposited on BK7 glass substrates by electron-beam evaporation method. The effects of different Y2O3 dopant contents on residual stress, structure, and optical properties of ZrO2 thin films are investigated. The results show that residual stress in YSZ thin films varies from tensile to compressive with the increase of Y2O3 molar content. The addition of Y2O3 is beneficial to the crystallization of YSZ thin film and transformation from amorphous to high temperature phase, and the refractive index decreases with the increase of Y2O3 molar content. Moreover, the variations of residual stress and the shifts of refractive index correspond to the evolution of structures induced by the addition of Y2O3.

© 2009 Chinese Optics Letters

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2006 (2)

G. Laukaitis, J. Dudonis, and D. Milcius, Thin Solid Films 515, 678 (2006).

S. Sprio, S. Guicciardi, A. Bellosi, and G. Pezzotti, Surf. Coat. Technol. 200, 4579 (2006).

2005 (1)

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

2004 (1)

2000 (1)

P. Gao, L. J. Meng, M. P. dos Santos, V. Teixeira, and M. Andritschky, Thin Solid Films 377, 557 (2000).

1999 (2)

M. Boulouz, L. Martin, A. Boulouz, and A. Boyer, Mater. Sci. Eng. B 67, 122 (1999).

J. Ullmann, A. J. Kellock, and J. E. E. Baglin, Thin Solid Films 341, 238 (1999).

1994 (1)

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

1992 (1)

M. G. Krishna, K. N. Rao, and S. Mohan, J. Vac. Sci. Technol. A 10, 3451 (1992).

1982 (1)

W. T. Pawlewicz and D. D. Hays, Thin Solid Films 94, 31 (1982).

1979 (1)

M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, Thin Solid Films 57, 173 (1979).

1976 (1)

J. C. Manifacier, J. Gasiot, and J. P. Fillard, J. Phys. E 9, 1002 (1976).

1968 (1)

E. Klockholm, J. Vac. Sci. Technol. 6, 138 (1968).

Andritschky, M.

P. Gao, L. J. Meng, M. P. dos Santos, V. Teixeira, and M. Andritschky, Thin Solid Films 377, 557 (2000).

Aoki, S.

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

Asano, T.

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

Baglin, J. E. E.

J. Ullmann, A. J. Kellock, and J. E. E. Baglin, Thin Solid Films 341, 238 (1999).

Bellosi, A.

S. Sprio, S. Guicciardi, A. Bellosi, and G. Pezzotti, Surf. Coat. Technol. 200, 4579 (2006).

Boulouz, A.

M. Boulouz, L. Martin, A. Boulouz, and A. Boyer, Mater. Sci. Eng. B 67, 122 (1999).

Boulouz, M.

M. Boulouz, L. Martin, A. Boulouz, and A. Boyer, Mater. Sci. Eng. B 67, 122 (1999).

Boyer, A.

M. Boulouz, L. Martin, A. Boulouz, and A. Boyer, Mater. Sci. Eng. B 67, 122 (1999).

Chang, J. T.

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

Chen, K. C.

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

Dudonis, J.

G. Laukaitis, J. Dudonis, and D. Milcius, Thin Solid Films 515, 678 (2006).

Fan, Z.

Fang, M.

Fillard, J. P.

J. C. Manifacier, J. Gasiot, and J. P. Fillard, J. Phys. E 9, 1002 (1976).

Fukutomi, M.

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

Gao, P.

P. Gao, L. J. Meng, M. P. dos Santos, V. Teixeira, and M. Andritschky, Thin Solid Films 377, 557 (2000).

Gasiot, J.

J. C. Manifacier, J. Gasiot, and J. P. Fillard, J. Phys. E 9, 1002 (1976).

Guicciardi, S.

S. Sprio, S. Guicciardi, A. Bellosi, and G. Pezzotti, Surf. Coat. Technol. 200, 4579 (2006).

Harris, M.

M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, Thin Solid Films 57, 173 (1979).

Hays, D. D.

W. T. Pawlewicz and D. D. Hays, Thin Solid Films 94, 31 (1982).

He, H.

He, J. L.

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

Kellock, A. J.

J. Ullmann, A. J. Kellock, and J. E. E. Baglin, Thin Solid Films 341, 238 (1999).

Klockholm, E.

E. Klockholm, J. Vac. Sci. Technol. 6, 138 (1968).

Komori, K.

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

Krishna, M. G.

M. G. Krishna, K. N. Rao, and S. Mohan, J. Vac. Sci. Technol. A 10, 3451 (1992).

Laukaitis, G.

G. Laukaitis, J. Dudonis, and D. Milcius, Thin Solid Films 515, 678 (2006).

Leyland, A.

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

Macleod, H. A.

M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, Thin Solid Films 57, 173 (1979).

Maeda, H.

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

Manifacier, J. C.

J. C. Manifacier, J. Gasiot, and J. P. Fillard, J. Phys. E 9, 1002 (1976).

Martin, L.

M. Boulouz, L. Martin, A. Boulouz, and A. Boyer, Mater. Sci. Eng. B 67, 122 (1999).

Matthews, A.

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

Meng, L. J.

P. Gao, L. J. Meng, M. P. dos Santos, V. Teixeira, and M. Andritschky, Thin Solid Films 377, 557 (2000).

Milcius, D.

G. Laukaitis, J. Dudonis, and D. Milcius, Thin Solid Films 515, 678 (2006).

Mohan, S.

M. G. Krishna, K. N. Rao, and S. Mohan, J. Vac. Sci. Technol. A 10, 3451 (1992).

Ogura, S.

M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, Thin Solid Films 57, 173 (1979).

Pawlewicz, W. T.

W. T. Pawlewicz and D. D. Hays, Thin Solid Films 94, 31 (1982).

Pelletier, E.

M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, Thin Solid Films 57, 173 (1979).

Pezzotti, G.

S. Sprio, S. Guicciardi, A. Bellosi, and G. Pezzotti, Surf. Coat. Technol. 200, 4579 (2006).

Rao, K. N.

M. G. Krishna, K. N. Rao, and S. Mohan, J. Vac. Sci. Technol. A 10, 3451 (1992).

Santos, M. P. dos

P. Gao, L. J. Meng, M. P. dos Santos, V. Teixeira, and M. Andritschky, Thin Solid Films 377, 557 (2000).

Shao, J.

Sprio, S.

S. Sprio, S. Guicciardi, A. Bellosi, and G. Pezzotti, Surf. Coat. Technol. 200, 4579 (2006).

Tanaka, Y.

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

Teixeira, V.

P. Gao, L. J. Meng, M. P. dos Santos, V. Teixeira, and M. Andritschky, Thin Solid Films 377, 557 (2000).

Ullmann, J.

J. Ullmann, A. J. Kellock, and J. E. E. Baglin, Thin Solid Films 341, 238 (1999).

Vidal, B.

M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, Thin Solid Films 57, 173 (1979).

Yeh, C. H.

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

Zhan, M.

Zhang, D.

Chin. Opt. Lett. (1)

J. Phys. E (1)

J. C. Manifacier, J. Gasiot, and J. P. Fillard, J. Phys. E 9, 1002 (1976).

J. Vac. Sci. Technol. (1)

E. Klockholm, J. Vac. Sci. Technol. 6, 138 (1968).

J. Vac. Sci. Technol. A (1)

M. G. Krishna, K. N. Rao, and S. Mohan, J. Vac. Sci. Technol. A 10, 3451 (1992).

Mater. Sci. Eng. B (1)

M. Boulouz, L. Martin, A. Boulouz, and A. Boyer, Mater. Sci. Eng. B 67, 122 (1999).

Surf. Coat. Technol. (2)

J. T. Chang, C. H. Yeh, J. L. He, K. C. Chen, A. Matthews, and A. Leyland, Surf. Coat. Technol. 200, 1401 (2005).

S. Sprio, S. Guicciardi, A. Bellosi, and G. Pezzotti, Surf. Coat. Technol. 200, 4579 (2006).

Thin Solid Films (6)

M. Fukutomi, S. Aoki, K. Komori, Y. Tanaka, T. Asano, and H. Maeda, Thin Solid Films 239, 123 (1994).

P. Gao, L. J. Meng, M. P. dos Santos, V. Teixeira, and M. Andritschky, Thin Solid Films 377, 557 (2000).

G. Laukaitis, J. Dudonis, and D. Milcius, Thin Solid Films 515, 678 (2006).

W. T. Pawlewicz and D. D. Hays, Thin Solid Films 94, 31 (1982).

M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, Thin Solid Films 57, 173 (1979).

J. Ullmann, A. J. Kellock, and J. E. E. Baglin, Thin Solid Films 341, 238 (1999).

Other (2)

J. Tang, P. Gu, X. Liu, and H. Li, Modern Optical Thin Films Technology (Zhejiang University Press, Hangzhou, 2006) p.244.

S. Wu, J. Shao, K. Yi, and Z. Fan, "Y2O3 stabilized ZrO2 vacuum coating material and its preparation" (in Chinese) Chinese Patent CN1696328 (2005).

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