Abstract

The impurities in two kinds of HfO<sub>2</sub> materials and in their corresponding single layer thin films were determined through glow discharge mass spectrum technology and secondary ion mass spectrometry (SIMS) equipment respectively. It was found that ZrO<sub>2</sub> was the main impurity in the two kinds of HfO<sub>2</sub> either in the original HfO<sub>2</sub> materials or in the electron beam deposited films. In addition, the difference of Zr content in the two kinds of HfO<sub>2</sub> single layer films was much larger than that of the other impurities such as Ti and Fe, which showed that it was just ZrO<sub>2</sub> that made the difference between the optical performance of the film products including the two kinds of HfO<sub>2</sub>. With these two kinds of HfO<sub>2</sub> and the same kind of SiO<sub>2</sub>, we deposited HfO<sub>2</sub>/SiO<sub>2</sub> multilayer reflective coatings at the wavelength of 266 nm. Experimental results showed that the reflectances of these two mirrors were about 99.85% and 99.15% respectively, which agreed well with the designed results what were based on the optical constants obtained from the corresponding single layer thin films.

© 2008 Chinese Optics Letters

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription