Abstract

Plasmonic field enhancement in a fully coated dielectric near field scanning optical microscope (NSOM) probe under radial polarization illumination is analyzed using an axially symmetric three-dimensional (3D) finite element method (FEM) model. The enhancement factor strongly depends on the illumination spot size, taper angle of the probe, and the metal film thickness. The tolerance of the alignment angle is investigated. Probe designs with different metal coatings and their enhancement performance are studied as well. The nanometric spot size at the tip apex and high field enhancement of the apertureless NSOM probe have important potential application in semiconductor metrology.

© 2007 Chinese Optics Letters

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  1. D. W. Pohl, W. Denk, and M. Lanz, Appl. Phys. Lett. 44, 651 (1984).
  2. A. Lewis, M. Isaacson, A. Harootunian, and A. Muray, Ultramicrosc. 13, 227 (1984).
  3. A. Bouhelier, J. Renger, M. R. Beversluis, and L. Novotny, J. Microscopy 210, 220 (2003).
  4. H. Frey, C. Bolwien, A. Brandenburg, R. Ros, and D. Anselmetti, Nanotechnology 17, 3105 (2006).
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  6. W. Chen and Q. Zhan, Proc. SPIE 6450, 64500D (2007).
  7. W. Chen and Q. Zhan, Opt. Express 15, 4106 (2007).
  8. Q. Zhan and J. R. Leger, Opt. Express 10, 324 (2002).

2007 (2)

W. Chen and Q. Zhan, Proc. SPIE 6450, 64500D (2007).

W. Chen and Q. Zhan, Opt. Express 15, 4106 (2007).

2006 (1)

H. Frey, C. Bolwien, A. Brandenburg, R. Ros, and D. Anselmetti, Nanotechnology 17, 3105 (2006).

2003 (2)

L. Vaccaro, L. Aeschimann, U. Staufer, H. P. Herzig, and R. Dandliker, Appl. Phys. Lett. 83, 584 (2003).

A. Bouhelier, J. Renger, M. R. Beversluis, and L. Novotny, J. Microscopy 210, 220 (2003).

2002 (1)

1984 (2)

D. W. Pohl, W. Denk, and M. Lanz, Appl. Phys. Lett. 44, 651 (1984).

A. Lewis, M. Isaacson, A. Harootunian, and A. Muray, Ultramicrosc. 13, 227 (1984).

Appl. Phys. Lett. (2)

D. W. Pohl, W. Denk, and M. Lanz, Appl. Phys. Lett. 44, 651 (1984).

L. Vaccaro, L. Aeschimann, U. Staufer, H. P. Herzig, and R. Dandliker, Appl. Phys. Lett. 83, 584 (2003).

J. Microscopy (1)

A. Bouhelier, J. Renger, M. R. Beversluis, and L. Novotny, J. Microscopy 210, 220 (2003).

Nanotechnology (1)

H. Frey, C. Bolwien, A. Brandenburg, R. Ros, and D. Anselmetti, Nanotechnology 17, 3105 (2006).

Opt. Express (2)

Proc. SPIE (1)

W. Chen and Q. Zhan, Proc. SPIE 6450, 64500D (2007).

Ultramicrosc. (1)

A. Lewis, M. Isaacson, A. Harootunian, and A. Muray, Ultramicrosc. 13, 227 (1984).

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