Abstract

The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With the oxygen ratio increasing, the reflectivity of the as-deposited films decreased, and optical band gap increased. Thermogravimetric analysis (TGA) showed that the decompose temperature of the films was above 250 Celsius degrees. After annealed at 400 Celsius degrees, only films deposited at 5% O2/Ar ratio showed high optical contrast which was about 52%. Scanning electron microscope (SEM) results revealed that the changes of surface morphology were responsible for the optical property variations of the films after annealing. Its thermal stability and high optical contrast before and after annealing made it a good potential write-once optical recording medium.

© 2006 Chinese Optics Letters

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  1. T. Ohta, M. Takenaga, N. Akahira, and T. Yamashita, J. Appl. Phys. 53, 8497 (1983).
  2. H. Seki, Appl. Phys. Lett. 43, 1000 (1983).
  3. F. Vega and C. N. Afonso, Appl. Phys. B 62, 235 (1996).
  4. P. S. Patil and L. D. Kadam, Appl. Surf. Sci. 199, 211 (2002).
  5. H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).
  6. A. Iida and R. Nishikawa, Jpn. J. Appl. Phys. 33, 3952 (1994).
  7. I. Hotovy, J. Huran, J. Janik, and A. P. Kobzev, Vacuum 51, 157 (1998).
  8. Y.-C. Her and C.-L. Wu, Jpn. J. Appl. Phys. 43, 1013 (2004).
  9. J.-W. Seong, S.-M. Kim, D. Choi, and K. H. Yoon, Appl. Surf. Sci. 249, 60 (2005).
  10. S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).
  11. Y. M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films 420-421, 54 (2002).
  12. F. Demichelis, G. Kanidakis, A. Tagliferro, and E. Tresso, Appl. Opt. 9, 1737 (1987).
  13. J. Herrero and C. Guillen, J. Appl. Phys. 69, 429 (1991).
  14. R. Hong, J. Shao, H. He, and Z. Fan, Chin. Opt. Lett. 3, 428 (2005).
  15. A. A. Othman, M. A. Osman, H. H Amer, and A. Dahshan, Thin Solid Films 457, 253 (2004).
  16. A. A. Al-Ghamdi, Vacuum 80, 400 (2006).

2006 (1)

A. A. Al-Ghamdi, Vacuum 80, 400 (2006).

2005 (3)

R. Hong, J. Shao, H. He, and Z. Fan, Chin. Opt. Lett. 3, 428 (2005).

J.-W. Seong, S.-M. Kim, D. Choi, and K. H. Yoon, Appl. Surf. Sci. 249, 60 (2005).

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

2004 (2)

Y.-C. Her and C.-L. Wu, Jpn. J. Appl. Phys. 43, 1013 (2004).

A. A. Othman, M. A. Osman, H. H Amer, and A. Dahshan, Thin Solid Films 457, 253 (2004).

2002 (3)

S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).

Y. M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films 420-421, 54 (2002).

P. S. Patil and L. D. Kadam, Appl. Surf. Sci. 199, 211 (2002).

1998 (1)

I. Hotovy, J. Huran, J. Janik, and A. P. Kobzev, Vacuum 51, 157 (1998).

1996 (1)

F. Vega and C. N. Afonso, Appl. Phys. B 62, 235 (1996).

1994 (1)

A. Iida and R. Nishikawa, Jpn. J. Appl. Phys. 33, 3952 (1994).

1991 (1)

J. Herrero and C. Guillen, J. Appl. Phys. 69, 429 (1991).

1987 (1)

F. Demichelis, G. Kanidakis, A. Tagliferro, and E. Tresso, Appl. Opt. 9, 1737 (1987).

1983 (2)

T. Ohta, M. Takenaga, N. Akahira, and T. Yamashita, J. Appl. Phys. 53, 8497 (1983).

H. Seki, Appl. Phys. Lett. 43, 1000 (1983).

Afonso, C. N.

F. Vega and C. N. Afonso, Appl. Phys. B 62, 235 (1996).

Akahira, N.

T. Ohta, M. Takenaga, N. Akahira, and T. Yamashita, J. Appl. Phys. 53, 8497 (1983).

Al-Ghamdi, A. A.

A. A. Al-Ghamdi, Vacuum 80, 400 (2006).

Amer, H. H

A. A. Othman, M. A. Osman, H. H Amer, and A. Dahshan, Thin Solid Films 457, 253 (2004).

Cai, X. M.

S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).

Chang, H.-L.

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

Chen, J.-P.

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

Choi, D.

J.-W. Seong, S.-M. Kim, D. Choi, and K. H. Yoon, Appl. Surf. Sci. 249, 60 (2005).

Chuang, H. C.

Y. M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films 420-421, 54 (2002).

Dahshan, A.

A. A. Othman, M. A. Osman, H. H Amer, and A. Dahshan, Thin Solid Films 457, 253 (2004).

Demichelis, F.

F. Demichelis, G. Kanidakis, A. Tagliferro, and E. Tresso, Appl. Opt. 9, 1737 (1987).

Fan, Z.

Feng, B. X.

S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).

Guillen, C.

J. Herrero and C. Guillen, J. Appl. Phys. 69, 429 (1991).

He, H.

Her, Y.-C.

Y.-C. Her and C.-L. Wu, Jpn. J. Appl. Phys. 43, 1013 (2004).

Herrero, J.

J. Herrero and C. Guillen, J. Appl. Phys. 69, 429 (1991).

Hong, R.

Hotovy, I.

I. Hotovy, J. Huran, J. Janik, and A. P. Kobzev, Vacuum 51, 157 (1998).

Huang, D.

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

Huran, J.

I. Hotovy, J. Huran, J. Janik, and A. P. Kobzev, Vacuum 51, 157 (1998).

Hwang, W. S.

Y. M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films 420-421, 54 (2002).

Iida, A.

A. Iida and R. Nishikawa, Jpn. J. Appl. Phys. 33, 3952 (1994).

Janik, J.

I. Hotovy, J. Huran, J. Janik, and A. P. Kobzev, Vacuum 51, 157 (1998).

Jeng, T.-R.

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

Jiang, S. R.

S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).

Ju, J.-J.

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

Kadam, L. D.

P. S. Patil and L. D. Kadam, Appl. Surf. Sci. 199, 211 (2002).

Kanidakis, G.

F. Demichelis, G. Kanidakis, A. Tagliferro, and E. Tresso, Appl. Opt. 9, 1737 (1987).

Kim, S.-M.

J.-W. Seong, S.-M. Kim, D. Choi, and K. H. Yoon, Appl. Surf. Sci. 249, 60 (2005).

Kobzev, A. P.

I. Hotovy, J. Huran, J. Janik, and A. P. Kobzev, Vacuum 51, 157 (1998).

Lu, Y. M.

Y. M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films 420-421, 54 (2002).

Nishikawa, R.

A. Iida and R. Nishikawa, Jpn. J. Appl. Phys. 33, 3952 (1994).

Ohta, T.

T. Ohta, M. Takenaga, N. Akahira, and T. Yamashita, J. Appl. Phys. 53, 8497 (1983).

Osman, M. A.

A. A. Othman, M. A. Osman, H. H Amer, and A. Dahshan, Thin Solid Films 457, 253 (2004).

Othman, A. A.

A. A. Othman, M. A. Osman, H. H Amer, and A. Dahshan, Thin Solid Films 457, 253 (2004).

Patil, P. S.

P. S. Patil and L. D. Kadam, Appl. Surf. Sci. 199, 211 (2002).

Seki, H.

H. Seki, Appl. Phys. Lett. 43, 1000 (1983).

Seong, J.-W.

J.-W. Seong, S.-M. Kim, D. Choi, and K. H. Yoon, Appl. Surf. Sci. 249, 60 (2005).

Shao, J.

Tagliferro, A.

F. Demichelis, G. Kanidakis, A. Tagliferro, and E. Tresso, Appl. Opt. 9, 1737 (1987).

Takenaga, M.

T. Ohta, M. Takenaga, N. Akahira, and T. Yamashita, J. Appl. Phys. 53, 8497 (1983).

Tresso, E.

F. Demichelis, G. Kanidakis, A. Tagliferro, and E. Tresso, Appl. Opt. 9, 1737 (1987).

Vega, F.

F. Vega and C. N. Afonso, Appl. Phys. B 62, 235 (1996).

Wang, J.

S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).

Wu, C.-L.

Y.-C. Her and C.-L. Wu, Jpn. J. Appl. Phys. 43, 1013 (2004).

Yamashita, T.

T. Ohta, M. Takenaga, N. Akahira, and T. Yamashita, J. Appl. Phys. 53, 8497 (1983).

Yan, P. X.

S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).

Yang, J. S.

Y. M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films 420-421, 54 (2002).

Yen, P.

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

Yen, W.-H.

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

Yoon, K. H.

J.-W. Seong, S.-M. Kim, D. Choi, and K. H. Yoon, Appl. Surf. Sci. 249, 60 (2005).

Appl. Opt. (1)

F. Demichelis, G. Kanidakis, A. Tagliferro, and E. Tresso, Appl. Opt. 9, 1737 (1987).

Appl. Phys. B (1)

F. Vega and C. N. Afonso, Appl. Phys. B 62, 235 (1996).

Appl. Phys. Lett. (1)

H. Seki, Appl. Phys. Lett. 43, 1000 (1983).

Appl. Surf. Sci. (2)

J.-W. Seong, S.-M. Kim, D. Choi, and K. H. Yoon, Appl. Surf. Sci. 249, 60 (2005).

P. S. Patil and L. D. Kadam, Appl. Surf. Sci. 199, 211 (2002).

Chin. Opt. Lett. (1)

J. Appl. Phys. (2)

J. Herrero and C. Guillen, J. Appl. Phys. 69, 429 (1991).

T. Ohta, M. Takenaga, N. Akahira, and T. Yamashita, J. Appl. Phys. 53, 8497 (1983).

Jpn. J. Appl. Phys. (3)

H.-L. Chang, T.-R. Jeng, J.-P. Chen, W.-H. Yen, P. Yen, D. Huang, and J.-J. Ju, Jpn. J. Appl. Phys. 44, 6109 (2005).

A. Iida and R. Nishikawa, Jpn. J. Appl. Phys. 33, 3952 (1994).

Y.-C. Her and C.-L. Wu, Jpn. J. Appl. Phys. 43, 1013 (2004).

Mater. Chem. Phys. (1)

S. R. Jiang, P. X. Yan, B. X. Feng, X. M. Cai, and J. Wang, Mater. Chem. Phys. 77, 384 (2002).

Thin Solid Films (2)

Y. M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films 420-421, 54 (2002).

A. A. Othman, M. A. Osman, H. H Amer, and A. Dahshan, Thin Solid Films 457, 253 (2004).

Vacuum (2)

A. A. Al-Ghamdi, Vacuum 80, 400 (2006).

I. Hotovy, J. Huran, J. Janik, and A. P. Kobzev, Vacuum 51, 157 (1998).

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