Abstract

Recently, ArF immersion lithography has been considered as a promising method after ArF dry lithography by a factor of refractive index n of the liquid filled into the space between the bottom lens and wafer, in the case of 193-nm exposure tools, water (n = 1.44) has been found as the best liquid. We explore the NA?'s dependence of depth of focus (DOF) under 3/4 annular and 3/4 quasar illumination by resist imaging simulation. Line/space pairs of line-to-space ratios 1:1, 1:2, 1:4 on binary mask are considered. Finally, we explored the high NA's dependency of DOF and gave the explanation for the peak value of DOF through three-beam imaging process, MicroCruiser 2.0, Prolith version 8.0.2 and k_2 factor based on the Rayleigh equation.

© 2005 Chinese Optics Letters

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  1. S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).
  2. J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).
  3. C. A. Mack, Inside PROLITH^(TM), A Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies, Inc., Austin, Texas, USA, 1997).
  4. S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

2004 (2)

S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).

J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

2002 (1)

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Corcoran, N.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Dusa, M.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Eurlings, M.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Finders, J.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Flagello, D.

J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

Fungchen, J.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Grapner, P.

J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

Hsu, M.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Hsu, S. D.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Knose, W.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Laidig, T.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Microlithography, Journal of

J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).

Mulkens, J.

J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

Nagasaka, wa and H.

S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).

Roy, S.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Shi, X.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Socha, R. J.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Streefkerk, B.

J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

Wampler, K. E.

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

and Microsystems (2)

S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).

J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).

Proc. SPIE (1)

S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Other (1)

C. A. Mack, Inside PROLITH^(TM), A Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies, Inc., Austin, Texas, USA, 1997).

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