Abstract

A novel nanopolycrystalline structure of vanadium dioxide thin films is deposited on silicon or fused silica substrates by reactive ion sputtering and followed by an annealing. The characteristic analysis shows that the films have a columnar nanostructure with an average grain of 8 nm. The resistivities as a function of ambient temperatures tested by four-point probes for as-deposited films present that the transition temperature for nanostructure of vanadium dioxide films is near 35 Celsius degree which lowers about 33 Celsius degree in comparison with the transition temperature at 68 Celsius degree in its microstructure.

© 2005 Chinese Optics Letters

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  1. F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).
  2. S. H. Chen, X. J. Yi, and H. Ma, Opt. and Quantum Electron. 35, 1351 (2003).
  3. B. E. Cole, R. E. Higashi, and R. A. Wood, Proceedings of the IEEE 86, 1679 (1998).
  4. R. A. Wood, in Uncooled Infrared Imaging Arrays and Systems P. Kruse and D. Skatrud (eds.) (Academic Press, New York, 1997) chap.3, pp.43-121.
  5. C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).
  6. M. A. Richardson and J. A. Coath, Opt. & Laser Technol. 30, 137 (1998).
  7. M. H. Lee, Sol. Energy Mater. and Sol. Cells 71, 537 (2002).
  8. M. H. Lee and J. S. Cho, Thin Solid Films 365, 5 (2000).
  9. V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).
  10. L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).
  11. G. V. Jorgenson and J. C. Lee, Sol. Energy Mater. 14, 205 (1986).
  12. S. Lu, L. Hou, and F. Gan, Thin Solid Films 353, 40 (1999).

2004

F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).

2003

S. H. Chen, X. J. Yi, and H. Ma, Opt. and Quantum Electron. 35, 1351 (2003).

2002

M. H. Lee, Sol. Energy Mater. and Sol. Cells 71, 537 (2002).

2001

L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).

C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).

2000

M. H. Lee and J. S. Cho, Thin Solid Films 365, 5 (2000).

1999

S. Lu, L. Hou, and F. Gan, Thin Solid Films 353, 40 (1999).

1998

V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).

M. A. Richardson and J. A. Coath, Opt. & Laser Technol. 30, 137 (1998).

B. E. Cole, R. E. Higashi, and R. A. Wood, Proceedings of the IEEE 86, 1679 (1998).

1986

G. V. Jorgenson and J. C. Lee, Sol. Energy Mater. 14, 205 (1986).

Almeide, L. A. L. de

L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).

Chen, C.

C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).

Chen, S. H.

S. H. Chen, X. J. Yi, and H. Ma, Opt. and Quantum Electron. 35, 1351 (2003).

Cho, J. S.

M. H. Lee and J. S. Cho, Thin Solid Films 365, 5 (2000).

Chudnovskii, F. A.

V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).

Coath, J. A.

M. A. Richardson and J. A. Coath, Opt. & Laser Technol. 30, 137 (1998).

Cole, B. E.

B. E. Cole, R. E. Higashi, and R. A. Wood, Proceedings of the IEEE 86, 1679 (1998).

Cros, F.

F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).

Deep, G. S.

L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).

Freire, R. C. S.

L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).

Galperin, V. L.

V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).

Gan, F.

S. Lu, L. Hou, and F. Gan, Thin Solid Films 353, 40 (1999).

Gavarri, J. R.

F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).

Gninneton, F.

F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).

Higashi, R. E.

B. E. Cole, R. E. Higashi, and R. A. Wood, Proceedings of the IEEE 86, 1679 (1998).

Hou, L.

S. Lu, L. Hou, and F. Gan, Thin Solid Films 353, 40 (1999).

Jorgenson, G. V.

G. V. Jorgenson and J. C. Lee, Sol. Energy Mater. 14, 205 (1986).

Khakhaev, I. A.

V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).

Lee, J. C.

G. V. Jorgenson and J. C. Lee, Sol. Energy Mater. 14, 205 (1986).

Lee, M. H.

M. H. Lee, Sol. Energy Mater. and Sol. Cells 71, 537 (2002).

M. H. Lee and J. S. Cho, Thin Solid Films 365, 5 (2000).

Lima, A. M. N.

L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).

Lu, S.

S. Lu, L. Hou, and F. Gan, Thin Solid Films 353, 40 (1999).

Ma, H.

S. H. Chen, X. J. Yi, and H. Ma, Opt. and Quantum Electron. 35, 1351 (2003).

Neff, H. F.

L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).

Richardson, M. A.

M. A. Richardson and J. A. Coath, Opt. & Laser Technol. 30, 137 (1998).

Sauques, L.

F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).

Shadrin, E. B.

V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).

Valmalette, J.-C.

F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).

Wood, R. A.

B. E. Cole, R. E. Higashi, and R. A. Wood, Proceedings of the IEEE 86, 1679 (1998).

Yi, X.

C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).

Yi, X. J.

S. H. Chen, X. J. Yi, and H. Ma, Opt. and Quantum Electron. 35, 1351 (2003).

Zhang, J.

C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).

Zhao, X.

C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).

IEEE Trans. Instrumentation and Measurement

L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).

Infrared Phys. & Technol.

C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).

Opt. & Laser Technol.

M. A. Richardson and J. A. Coath, Opt. & Laser Technol. 30, 137 (1998).

Opt. and Quantum Electron.

S. H. Chen, X. J. Yi, and H. Ma, Opt. and Quantum Electron. 35, 1351 (2003).

Proceedings of the IEEE

B. E. Cole, R. E. Higashi, and R. A. Wood, Proceedings of the IEEE 86, 1679 (1998).

Sol. Energy Mater.

G. V. Jorgenson and J. C. Lee, Sol. Energy Mater. 14, 205 (1986).

Sol. Energy Mater. and Sol. Cells

M. H. Lee, Sol. Energy Mater. and Sol. Cells 71, 537 (2002).

Sov. Phys. Tech. Phys.

V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).

Thin Solid Films

F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).

M. H. Lee and J. S. Cho, Thin Solid Films 365, 5 (2000).

S. Lu, L. Hou, and F. Gan, Thin Solid Films 353, 40 (1999).

Other

R. A. Wood, in Uncooled Infrared Imaging Arrays and Systems P. Kruse and D. Skatrud (eds.) (Academic Press, New York, 1997) chap.3, pp.43-121.

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